Falk; Gertrud

Patent Applications and Registrations

Patent applications and USPTO patent grants for Falk; Gertrud.The latest application filed is for "process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity".

Company Profile

0.8.7

Falk; Gertrud - Erlangen DE
Falk; Gertrud - Rottenbach DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity Grant 7,018,784 - Rottstegge , et al. March 28, 2	2006-03-28
Negative resist process with simultaneous development and aromatization of resist structures Grant 6,946,236 - Rottstegge , et al. September 20, 2	2005-09-20
Process for modifying resist structures and resist films from the aqueous phase Grant 6,899,997 - Yip , et al. May 31, 2	2005-05-31
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size Grant 6,893,972 - Rottstegge , et al. May 17, 2	2005-05-17
Photoresist compound and method for structuring a photoresist layer Grant 6,841,332 - Falk , et al. January 11, 2	2005-01-11
Negative resist process with simultaneous development and silylation Grant 6,770,423 - Rottstegge , et al. August 3, 2	2004-08-03
Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity App 20040043330 - Rottstegge, Jorg ; et al.	2004-03-04
Process for modifying resist structures and resist films from the aqueous phase App 20030211422 - Yip, Siew Siew ; et al.	2003-11-13
Silylating process for photoresists in the UV region App 20030096194 - Rottstegge, Jorg ; et al.	2003-05-22
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size App 20030091936 - Rottstegge, Jorg ; et al.	2003-05-15
Negative resist process with simultaneous development and silylation App 20030082488 - Rottstegge, Jorg ; et al.	2003-05-01
Negative resist process with simultaneous development and aromatization of resist structures App 20030073037 - Rottstegge, Jorg ; et al.	2003-04-17
Photoresist compound and method for structuring a photoresist layer App 20030022111 - Falk, Gertrud ; et al.	2003-01-30
Photolithographic structure generation process Grant 6,042,993 - Leuschner , et al. March 28, 2	2000-03-28
Spectrometry plasma burner Grant 4,551,609 - Falk November 5, 1	1985-11-05

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