Fairbairn; Kevin
Patent Applications and Registrations
Patent applications and USPTO patent grants for Fairbairn; Kevin.The latest application filed is for "spatial monitoring and control of plasma processing environments".
Company Profile
14.42.16
- Fairbairn; Kevin - Los Gatos CA
- Fairbairn; Kevin - Saratoga CA
Patent Activity
| Patent | Date |
|---|---|
| Spatial Monitoring And Control Of Plasma Processing Environments App 20220285131 - Shaw; Denis ; et al. | 2022-09-08 |
| Spatial monitoring and control of plasma processing environments Grant 11,437,221 - Carter , et al. September 6, 2 | 2022-09-06 |
| Spatial monitoring and control of plasma processing environments Grant 11,282,677 - Shaw , et al. March 22, 2 | 2022-03-22 |
| Application of modulating supplies in a plasma processing system Grant 11,264,209 - Van Zyl , et al. March 1, 2 | 2022-03-01 |
| Spatial Monitoring And Control Of Plasma Processing Environments App 20210241996 - Carter; Daniel ; et al. | 2021-08-05 |
| Synchronization Between An Excitation Source And A Substrate Bias Supply App 20210134562 - Fairbairn; Kevin ; et al. | 2021-05-06 |
| Application Of Modulating Supplies In A Plasma Processing System App 20210074513 - Van Zyl; Gideon ; et al. | 2021-03-11 |
| Synchronization between an excitation source and a substrate bias supply Grant 10,896,807 - Fairbairn , et al. January 19, 2 | 2021-01-19 |
| Spatial Monitoring And Control Of Plasma Processing Environments App 20210005428 - Shaw; Denis ; et al. | 2021-01-07 |
| Application of modulating supplies in a plasma processing system Grant 10,811,227 - Van Zyl , et al. October 20, 2 | 2020-10-20 |
| Synchronization with a bias supply in a plasma processing system Grant 10,811,229 - Van Zyl , et al. October 20, 2 | 2020-10-20 |
| Control of plasma processing systems that include plasma modulating supplies Grant 10,811,228 - Van Zyl , et al. October 20, 2 | 2020-10-20 |
| Spatial and temporal control of ion bias voltage for plasma processing Grant 10,707,055 - Shaw , et al. | 2020-07-07 |
| Synchronization Between An Excitation Source And A Substrate Bias Supply App 20200203128 - Fairbairn; Kevin ; et al. | 2020-06-25 |
| Synchronized pulsing of plasma processing source and substrate bias Grant 10,607,813 - Fairbairn , et al. | 2020-03-31 |
| Synchronization With A Bias Supply In A Plasma Processing System App 20190172685 - Van Zyl; Gideon ; et al. | 2019-06-06 |
| Spatial And Temporal Control Of Ion Bias Voltage For Plasma Processing App 20190157043 - Shaw; Denis ; et al. | 2019-05-23 |
| Control Of Plasma Processing Systems That Include Plasma Modulating Supplies App 20190157042 - Van Zyl; Gideon ; et al. | 2019-05-23 |
| Application Of Modulating Supplies In A Plasma Processing System App 20190157041 - Zyl; Gideon Van ; et al. | 2019-05-23 |
| Synchronized Pulsing Of Plasma Processing Source And Substrate Bias App 20190157040 - Fairbairn; Kevin ; et al. | 2019-05-23 |
| Tandem process chamber Grant 7,655,092 - Fairbairn , et al. February 2, 2 | 2010-02-02 |
| Tandem process chamber App 20080105202 - Fairbairn; Kevin ; et al. | 2008-05-08 |
| Method of depositing an amorphous carbon layer Grant 7,335,462 - Fairbairn , et al. February 26, 2 | 2008-02-26 |
| Method Of Depositing An Amorphous Carbon Layer App 20070128538 - FAIRBAIRN; KEVIN ; et al. | 2007-06-07 |
| Method of depositing an amorphous carbon layer Grant 7,223,526 - Fairbairn , et al. May 29, 2 | 2007-05-29 |
| Method of depositing an amrphous carbon layer App 20050112509 - Fairbairn, Kevin ; et al. | 2005-05-26 |
| Method of depositing an amorphous carbon layer Grant 6,841,341 - Fairbairn , et al. January 11, 2 | 2005-01-11 |
| Tandem process chamber App 20040069225 - Fairbairn, Kevin ; et al. | 2004-04-15 |
| Tandem process chamber Grant 6,635,115 - Fairbairn , et al. October 21, 2 | 2003-10-21 |
| Method for depositing an amorphous carbon layer Grant 6,573,030 - Fairbairn , et al. June 3, 2 | 2003-06-03 |
| Method of depositing an amorphous carbon layer App 20030091938 - Fairbairn, Kevin ; et al. | 2003-05-15 |
| Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions Grant 6,517,913 - Cheung , et al. February 11, 2 | 2003-02-11 |
| Load-lock with external staging area Grant 6,486,444 - Fairbairn , et al. November 26, 2 | 2002-11-26 |
| Mixed frequency CVD process Grant 6,358,573 - Raoux , et al. March 19, 2 | 2002-03-19 |
| Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing Grant 6,354,241 - Tanaka , et al. March 12, 2 | 2002-03-12 |
| Apparatus and methods for upgraded substrate processing system with microwave plasma source Grant 6,230,652 - Tanaka , et al. May 15, 2 | 2001-05-15 |
| High density plasma CVD reactor with combined inductive and capacitive coupling Grant 6,220,201 - Nowak , et al. April 24, 2 | 2001-04-24 |
| Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions Grant 6,187,072 - Cheung , et al. February 13, 2 | 2001-02-13 |
| Multideck wafer processing system Grant 6,176,667 - Fairbairn , et al. January 23, 2 | 2001-01-23 |
| Tandem process chamber Grant 6,152,070 - Fairbairn , et al. November 28, 2 | 2000-11-28 |
| Mixed frequency CVD apparatus Grant 6,098,568 - Raoux , et al. August 8, 2 | 2000-08-08 |
| Front end wafer staging with wafer cassette turntables and on-the-fly wafer center finding Grant 6,082,950 - Altwood , et al. July 4, 2 | 2000-07-04 |
| Process chamber exhaust system Grant 6,077,157 - Fairbairn , et al. June 20, 2 | 2000-06-20 |
| Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment Grant 6,045,618 - Raoux , et al. April 4, 2 | 2000-04-04 |
| Apparatus and methods for upgraded substrate processing system with microwave plasma source Grant 6,039,834 - Tanaka , et al. March 21, 2 | 2000-03-21 |
| High density plasma CVD and etching reactor Grant 5,976,308 - Fairbairn , et al. November 2, 1 | 1999-11-02 |
| Gas delivery system Grant 5,911,834 - Fairbairn , et al. June 15, 1 | 1999-06-15 |
| Single loadlock chamber with wafer cooling function Grant 5,902,088 - Fairbairn , et al. May 11, 1 | 1999-05-11 |
| High density plasma CVD reactor with combined inductive and capacitive coupling Grant 5,865,896 - Nowak , et al. February 2, 1 | 1999-02-02 |
| Ultra high throughput wafer vacuum processing system Grant 5,855,681 - Maydan , et al. January 5, 1 | 1999-01-05 |
| CVD processing chamber Grant 5,853,607 - Zhao , et al. December 29, 1 | 1998-12-29 |
| Remote plasma source Grant 5,844,195 - Fairbairn , et al. December 1, 1 | 1998-12-01 |
| Dual blade robot Grant 5,838,121 - Fairbairn , et al. November 17, 1 | 1998-11-17 |
| Wafer tray and ceramic blade for semiconductor processing apparatus Grant 5,636,964 - Somekh , et al. June 10, 1 | 1997-06-10 |
| High density plasma CVD and etching reactor Grant 5,614,055 - Fairbairn , et al. March 25, 1 | 1997-03-25 |
| Wafer tray and ceramic blade for semiconductor processing apparatus Grant 5,570,994 - Somekh , et al. November 5, 1 | 1996-11-05 |
| CVD Processing chamber Grant 5,558,717 - Zhao , et al. September 24, 1 | 1996-09-24 |
| Wafer tray and ceramic blade for semiconductor processing apparatus Grant 5,556,147 - Somekh , et al. September 17, 1 | 1996-09-17 |
Company Registrations
| SEC | 0001237232 | FAIRBAIRN KEVIN |
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