Eynon; Ben
Patent Applications and Registrations
Patent applications and USPTO patent grants for Eynon; Ben.The latest application filed is for "fused silica pellicle in intimate contact with the surface of a photomask".
- Eynon; Ben - Round Rock TX
- Eynon; Ben - Rand Rock TX
| Patent | Date |
|---|---|
| Films for prevention of crystal growth on fused silica substrates for semiconductor lithography Grant 7,604,906 - Volk , et al. October 20, 2 | 2009-10-20 |
| Fused silica pellicle in intimate contact with the surface of a photomask Grant 7,351,503 - Eynon April 1, 2 | 2008-04-01 |
| Fused silica pellicle in intimate contact with the surface of a photomask App 20040121248 - Eynon, Ben | 2004-06-24 |
| Fused silica pellicle Grant 6,686,103 - Eynon February 3, 2 | 2004-02-03 |
| Fused silica pellicle App 20030124440 - Eynon, Ben | 2003-07-03 |
| Fused silica pellicle Grant 6,524,754 - Eynon February 25, 2 | 2003-02-25 |
| Fused silica pellicle App 20020098420 - Eynon, Ben | 2002-07-25 |
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