loadpatents
Patent applications and USPTO patent grants for Evans; Allen L..The latest application filed is for "low-h plasma treatment with n2 anneal for electronic memory devices".
Patent | Date |
---|---|
Low-H plasma treatment with N.sub.2 anneal for electronic memory devices Grant 8,202,810 - Nickel , et al. June 19, 2 | 2012-06-19 |
Low-h Plasma Treatment With N2 Anneal For Electronic Memory Devices App 20090176369 - Nickel; Alexander H. ;   et al. | 2009-07-09 |
Control mechanism for matching process parameters in a multi-chamber process tool Grant 6,684,122 - Christian , et al. January 27, 2 | 2004-01-27 |
Method and apparatus for reducing deposition variation by modeling post-clean chamber performance Grant 6,512,991 - Davis , et al. January 28, 2 | 2003-01-28 |
Method and apparatus for determining measurement frequency based on hardware age and usage Grant 6,469,518 - Davis , et al. October 22, 2 | 2002-10-22 |
Feedback control of deposition thickness based on polish planarization Grant 6,291,253 - Lansford , et al. September 18, 2 | 2001-09-18 |
Monolithic CMOS low power digital level shifter Grant 4,486,670 - Chan , et al. December 4, 1 | 1984-12-04 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.