EUV LLC.

Patent Applications and Registrations

Patent applications and USPTO patent grants for EUV LLC..The latest application filed is for "vacuum compatible, high-speed, 2-d mirror tilt stage".

Company Profile

0.58.3

EUV LLC. - Santa Clara CA
EUV LLC - Santa Clara CA
EUV LLC. -
EUV LLC - Livermore CA
EUV, L.L.C. - Livermore CA
Euv, L.L.C - Livermore CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for the protection of extreme ultraviolet lithography optics Grant 7,740,916 - Grunow , et al. June 22, 2	2010-06-22
Figure correction of multilayer coated optics Grant 7,662,263 - Chapman , et al. February 16, 2	2010-02-16
Adhesive particle shielding Grant 7,473,301 - Klebanoff , et al. January 6, 2	2009-01-06
Vacuum compatible, high-speed, 2-D mirror tilt stage Grant 7,273,289 - Denham September 25, 2	2007-09-25
Condenser optic with sacrificial reflective surface Grant 7,239,443 - Tichenor , et al. July 3, 2	2007-07-03
Reticle stage based linear dosimeter Grant 7,196,771 - Berger March 27, 2	2007-03-27
Method for in-situ cleaning of carbon contaminated surfaces Grant 7,147,722 - Klebanoff , et al. December 12, 2	2006-12-12
Vacuum compatible, high-speed, 2-D mirror tilt stage App 20060262435 - Denham; Paul E.	2006-11-23
Condenser optic with sacrificial reflective surface Grant 7,081,992 - Tichenor , et al. July 25, 2	2006-07-25
EUV lithography reticles fabricated without the use of a patterned absorber Grant 7,049,033 - Stearns , et al. May 23, 2	2006-05-23
Fluid jet electric discharge source Grant 7,034,322 - Bender April 25, 2	2006-04-25
Diffractive optical element for extreme ultraviolet wavefront control Grant 7,027,226 - Goldberg , et al. April 11, 2	2006-04-11
Extended surface parallel coating inspection method Grant 7,016,030 - Naulleau March 21, 2	2006-03-21
Method and apparatus for debris mitigation for an electrical discharge source Grant 6,989,629 - Klebanoff , et al. January 24, 2	2006-01-24
Reticle stage based linear dosimeter App 20050206870 - Berger, Kurt W.	2005-09-22
Holographic illuminator for synchrotron-based projection lithography systems Grant 6,927,887 - Naulleau August 9, 2	2005-08-09
Reticle stage based linear dosimeter Grant 6,906,781 - Berger June 14, 2	2005-06-14
Method and apparatus for debris mitigation for an electrical discharge source Grant 6,888,297 - Klebanoff , et al. May 3, 2	2005-05-03
Method of fabricating reflection-mode EUV diffusers Grant 6,861,273 - Anderson , et al. March 1, 2	2005-03-01
Apparatus for generating partially coherent radiation Grant 6,859,263 - Naulleau February 22, 2	2005-02-22
Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces Grant 6,847,463 - Malinowski January 25, 2	2005-01-25
Compliant layer chucking surface Grant 6,835,415 - Blaedel , et al. December 28, 2	2004-12-28
Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography Grant 6,821,682 - Stearns , et al. November 23, 2	2004-11-23
Compensation of flare-induced CD changes EUVL Grant 6,815,129 - Bjorkholm , et al. November 9, 2	2004-11-09
Apparatus for in-situ cleaning of carbon contaminated surfaces App 20040211448 - Klebanoff, Leonard E. ; et al.	2004-10-28
Apparatus for generating partially coherent radiation Grant 6,798,494 - Naulleau September 28, 2	2004-09-28
Universal EUV in-band intensity detector Grant 6,781,135 - Berger August 24, 2	2004-08-24
Optimized capping layers for EUV multilayers Grant 6,780,496 - Bajt , et al. August 24, 2	2004-08-24
Apparatus for in situ cleaning of carbon contaminated surfaces Grant 6,772,776 - Klebanoff , et al. August 10, 2	2004-08-10
Synchrotron-based EUV lithography illuminator simulator Grant 6,768,567 - Naulleau July 27, 2	2004-07-27
In-vacuum exposure shutter Grant 6,744,493 - Johnson , et al. June 1, 2	2004-06-01
Portable outgas detection apparatus Grant 6,734,422 - Haney , et al. May 11, 2	2004-05-11
Discharge source with gas curtain for protecting optics from particles Grant 6,714,624 - Fornaciari , et al. March 30, 2	2004-03-30
EUV mirror based absolute incident flux detector Grant 6,710,351 - Berger March 23, 2	2004-03-23
Condenser for photolithography system Grant 6,700,644 - Sweatt March 2, 2	2004-03-02
Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths Grant 6,673,525 - Wheeler January 6, 2	2004-01-06
Self-cleaning optic for extreme ultraviolet lithography Grant 6,664,554 - Klebanoff , et al. December 16, 2	2003-12-16
Capillary discharge source Grant 6,654,446 - Bender, III November 25, 2	2003-11-25
Photoimageable composition Grant 6,645,696 - Simison , et al. November 11, 2	2003-11-11
Mask-to-wafer alignment system Grant 6,642,995 - Sweatt , et al. November 4, 2	2003-11-04
Electrode configuration for extreme-UV electrical discharge source Grant 6,498,832 - Spence , et al. December 24, 2	2002-12-24
Diffraction spectral filter for use in extreme-UV lithography condenser Grant 6,469,827 - Sweatt , et al. October 22, 2	2002-10-22
Illumination system having a plurality of movable sources Grant 6,396,068 - Sweatt , et al. May 28, 2	2002-05-28
Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer Grant 6,368,942 - Cardinale April 9, 2	2002-04-09
Extreme-UV scanning wafer and reticle stages Grant 6,353,271 - Williams March 5, 2	2002-03-05
Extreme-UV lithography vacuum chamber zone seal Grant 6,333,775 - Haney , et al. December 25, 2	2001-12-25
Low thermal distortion extreme-UV lithography reticle Grant 6,316,150 - Gianoulakis , et al. November 13, 2	2001-11-13
Condenser for extreme-UV lithography with discharge source Grant 6,285,737 - Sweatt , et al. September 4, 2	2001-09-04
Diffractive element in extreme-UV lithography condenser Grant 6,285,497 - Sweatt , et al. September 4, 2	2001-09-04
Method for protection of lithographic components from particle contamination Grant 6,253,464 - Klebanoff , et al. July 3, 2	2001-07-03
Method for mask repair using defect compensation Grant 6,235,434 - Sweeney , et al. May 22, 2	2001-05-22
Process for producing radiation-induced self-terminating protective coatings on a substrate Grant 6,231,930 - Klebanoff May 15, 2	2001-05-15
Projection lithography with distortion compensation using reticle chuck contouring Grant 6,229,871 - Tichenor May 8, 2	2001-05-08
Extreme-UV lithography system Grant 6,225,027 - Replogle , et al. May 1, 2	2001-05-01
Wafer chamber having a gas curtain for extreme-UV lithography Grant 6,198,792 - Kanouff , et al. March 6, 2	2001-03-06
Electrostatically screened, voltage-controlled electrostatic chuck Grant 6,169,652 - Klebanoff January 2, 2	2001-01-02
Protection of lithographic components from particle contamination Grant 6,153,044 - Klebanoff , et al. November 28, 2	2000-11-28
Diffractive element in extreme-UV lithography condenser Grant 6,118,577 - Sweatt , et al. September 12, 2	2000-09-12
Thermophoretic vacuum wand Grant 6,072,157 - Klebanoff , et al. June 6, 2	2000-06-06
Extreme ultraviolet lithography machine Grant 6,031,598 - Tichenor , et al. February 29, 2	2000-02-29
Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources Grant 6,011,267 - Kubiak , et al. January 4, 2	2000-01-04