Eschbaumer; Christian

Patent Applications and Registrations

Patent applications and USPTO patent grants for Eschbaumer; Christian.The latest application filed is for "silicon resist for photolithography at short exposure wavelengths and process for making photoresists".

Company Profile

0.10.11

Eschbaumer; Christian - Schwaig DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Silicon-containing resist for photolithography Grant 7,052,820 - Rottstegge , et al. May 30, 2	2006-05-30
Process for silylating photoresists in the UV range Grant 7,045,273 - Ferbitz , et al. May 16, 2	2006-05-16
Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography Grant 7,041,426 - Eschbaumer , et al. May 9, 2	2006-05-09
Photoresists with reaction anchors for chemical consolidation of resist structures for exposures at 157 nm Grant 7,033,740 - Rottstegge , et al. April 25, 2	2006-04-25
Silicon resist for photolithography at short exposure wavelengths and process for making photoresists Grant 6,974,655 - Rottstegge , et al. December 13, 2	2005-12-13
Negative resist process with simultaneous development and aromatization of resist structures Grant 6,946,236 - Rottstegge , et al. September 20, 2	2005-09-20
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size Grant 6,893,972 - Rottstegge , et al. May 17, 2	2005-05-17
Chemically Amplified Photoresist And Process For Structuring Substituents Using Transparency Enhancement Of Resist Copolymers For 157 Nm Photolithography Through The Use Of Fluorinated Cinnamic Acid Derivatives Grant 6,806,027 - Hohle , et al. October 19, 2	2004-10-19
Negative resist process with simultaneous development and silylation Grant 6,770,423 - Rottstegge , et al. August 3, 2	2004-08-03
Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers Grant 6,759,184 - Rottstegge , et al. July 6, 2	2004-07-06
Silicon resist for photolithography at short exposure wavelengths and process for making photoresists App 20030148219 - Rottstegge, Jorg ; et al.	2003-08-07
Process for silylating photoresists in the UV range App 20030124468 - Ferbitz, Jens ; et al.	2003-07-03
Silicon-containing resist for photolithography App 20030108812 - Rottstegge, Jorg ; et al.	2003-06-12
Silylating process for photoresists in the UV region App 20030096194 - Rottstegge, Jorg ; et al.	2003-05-22
Chemically amplified photoresist and process for structuring substituents using transparency enhancement of resist copolymers for 157 NM photolithography through the use of fluorinated cinnamic acid derivatives App 20030096190 - Hohle, Christoph ; et al.	2003-05-22
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size App 20030091936 - Rottstegge, Jorg ; et al.	2003-05-15
Negative resist process with simultaneous development and silylation App 20030082488 - Rottstegge, Jorg ; et al.	2003-05-01
Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography App 20030082480 - Eschbaumer, Christian ; et al.	2003-05-01
Chemically amplified photoresist and process for structuring substrates having resist copolymers with enhanced transparency resulting from fluorinating the photochemically cleavable leaving groups and being applicable to 157 nm photolithography App 20030082483 - Hohle, Christoph ; et al.	2003-05-01
Negative resist process with simultaneous development and aromatization of resist structures App 20030073037 - Rottstegge, Jorg ; et al.	2003-04-17
Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers App 20030073043 - Rottstegge, Jorg ; et al.	2003-04-17

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