loadpatents
Patent applications and USPTO patent grants for Epsilon Technology, Inc..The latest application filed is for "substrate supporting apparatus".
Patent | Date |
---|---|
Substrate supporting apparatus Grant 5,318,634 - deBoer , et al. * June 7, 1 | 1994-06-07 |
Reaction chambers for CVD systems Grant 5,261,960 - Ozias * November 16, 1 | 1993-11-16 |
Gas injectors for reaction chambers in CVD systems Grant 5,221,556 - Hawkins , et al. June 22, 1 | 1993-06-22 |
Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Grant 5,198,034 - deBoer , et al. March 30, 1 | 1993-03-30 |
Method for improving the reactant gas flow in a reaction chamber Grant 5,096,534 - Ozias March 17, 1 | 1992-03-17 |
Substrate loading apparatus for a CVD process Grant 5,092,728 - Crabb , et al. March 3, 1 | 1992-03-03 |
Wafer handling system with Bernoulli pick-up Grant 5,080,549 - Goodwin , et al. January 14, 1 | 1992-01-14 |
Substrate handling and transporting apparatus Grant 5,020,475 - Crabb , et al. June 4, 1 | 1991-06-04 |
Rotatable substrate supporting susceptor with temperature sensors Grant 4,996,942 - deBoer , et al. * March 5, 1 | 1991-03-05 |
Susceptor with temperature sensing device Grant 4,993,355 - deBoer , et al. * February 19, 1 | 1991-02-19 |
Heating system for substrates Grant 4,975,561 - Robinson , et al. December 4, 1 | 1990-12-04 |
Reaction chambers for CVD systems Grant 4,846,102 - Ozias July 11, 1 | 1989-07-11 |
Heating system for reaction chamber of chemical vapor deposition equipment Grant 4,836,138 - Robinson , et al. June 6, 1 | 1989-06-06 |
Chemical vapor deposition system Grant 4,828,224 - Crabb , et al. May 9, 1 | 1989-05-09 |
Apparatus and method for automated wafer handling Grant 4,813,732 - Klem March 21, 1 | 1989-03-21 |
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