name:-0.0069899559020996
name:-0.0047769546508789
name:-0.00097823143005371
Epoch Material Co., Ltd. Patent Filings

Epoch Material Co., Ltd.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Epoch Material Co., Ltd..The latest application filed is for "chemical mechanical polishing slurry, its preparation method and use for the same".

Company Profile
0.4.6
  • Epoch Material Co., Ltd. - Aurora IL
  • Epoch Material Co., Ltd. -
  • Epoch Material Co., Ltd. - Kaoh Siung County TW
  • Epoch Material Co., Ltd. - Kaohsiung County TW
  • Epoch Material Co., Ltd. - Lu-Chuh Hsiang TW
  • EPOCH MATERIAL CO., LTD. - Kaohsiung Science Park TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks
Patent Activity
PatentDate
Chemical mechanical polishing slurry, its preparation method and use for the same
Grant 8,557,006 - Hou , et al. October 15, 2
2013-10-15
Chemical Mechanical Polishing Slurry, Its Preparation Method And Use For The Same
App 20120270401 - HOU; Hui-Fang ;   et al.
2012-10-25
Aqueous cleaning composition for semiconductor copper processing
Grant 8,067,352 - Chen , et al. November 29, 2
2011-11-29
Aqueous cleaning composition for semiconductor copper processing
Grant 8,063,006 - Chen , et al. November 22, 2
2011-11-22
Aqueous Cleaning Composition
App 20090170742 - Chuang; Tsung-Hsien ;   et al.
2009-07-02
Chemical mechanical polishing composition
Grant 7,550,092 - Hou , et al. June 23, 2
2009-06-23
Aqueous Cleaning Composition For Semiconductor Copper Processing
App 20090036343 - Chen; Chien Ching ;   et al.
2009-02-05
Chemical mechanical polishing slurry, its preparation method, and use for the same
App 20080096470 - Hou; Hui-Fang ;   et al.
2008-04-24
Chemical mechanical polishing composition
App 20070290165 - Hou; Hui-Fang ;   et al.
2007-12-20
Aqueous cleaning composition for semiconductor copper processing
App 20070066508 - Chen; Chien Ching ;   et al.
2007-03-22

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