Enzu; Masaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Enzu; Masaki.The latest application filed is for "method for producing metallic ruthenium thin film by atomic layer deposition".

Company Profile

6.7.12

Enzu; Masaki - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for producing metallic ruthenium thin film by atomic layer deposition Grant 11,408,069 - Nishida , et al. August 9, 2	2022-08-09
Method For Producing Metallic Ruthenium Thin Film By Atomic Layer Deposition App 20220002867 - NISHIDA; Akihiro ; et al.	2022-01-06
Raw Material For Forming Thin Film By Atomic Layer Deposition Method And Method For Producing Thin Film App 20210155638 - ENZU; Masaki ; et al.	2021-05-27
Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film Grant 10,920,313 - Yoshino , et al. February 16, 2	2021-02-16
Ruthenium Compound, Raw Material For Forming Thin Film, And Method For Producing Thin Film App 20200262854 - YOSHINO; Tomoharu ; et al.	2020-08-20
Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound Grant 10,351,584 - Sakurai , et al. July 16, 2	2019-07-16
Diazadienyl Compound, Raw Material For Forming Thin Film, And Method For Manufacturing Thin Film App 20190185994 - YOSHINO; Tomoharu ; et al.	2019-06-20
Compound, thin film-forming material, and thin film manufacturing method Grant 10,253,408 - Yoshino , et al.	2019-04-09
Ruthenium compound, material for thin film formation, and process for thin film formation Grant 10,167,304 - Hatase , et al. J	2019-01-01
Alkoxide Compound, Thin Film-forming Starting Material, Thin Film Formation Method, And Alcohol Compound App 20180282358 - SAKURAI; Atsushi ; et al.	2018-10-04
Alkoxide compound, thin film-forming starting material, and thin film formation method Grant 10,011,623 - Sakurai , et al. July 3, 2	2018-07-03
Copper compound, starting material for forming thin film, and method for manufacturing thin film Grant 9,994,593 - Yoshino , et al. June 12, 2	2018-06-12
Novel Compound, Thin Film-forming Material, And Thin Film Manufacturing Method App 20180051372 - YOSHINO; Tomoharu ; et al.	2018-02-22
Diazadienyl Compound, Raw Material For Forming Thin Film, Method For Producing Thin Film, And Diazadiene Compound App 20180037540 - YOSHINO; Tomoharu ; et al.	2018-02-08
Alkoxide Compound, Thin Film-forming Starting Material, Thin Film Formation Method, And Alcohol Compound App 20170129912 - SAKURAI; Atsushi ; et al.	2017-05-11
Alkoxide Compound, Raw Material For Forming Thin Film, Method For Manufacturing Thin Film, And Alcohol Compound App 20170121358 - SAKURAI; Atsushi ; et al.	2017-05-04
Cobalt Compound, Thin Film-forming Raw Material, And Method For Producing Thin Film App 20170050998 - YOSHINO; Tomoharu ; et al.	2017-02-23
Copper Compound, Starting Material For Forming Thin Film, And Method For Manufacturing Thin Film App 20170044188 - YOSHINO; Tomoharu ; et al.	2017-02-16
Ruthenium Compound, Material For Thin Film Formation, And Process For Thin Film Formation App 20160272664 - HATASE; Masako ; et al.	2016-09-22

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