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Patent applications and USPTO patent grants for Endou; Mitsuhiro.The latest application filed is for "etching method and etching apparatus".
Patent | Date |
---|---|
Pneumatic booster Grant 8,631,735 - Nakamura , et al. January 21, 2 | 2014-01-21 |
Dry cleaning method for plasma processing apparatus Grant 8,133,325 - Ueda , et al. March 13, 2 | 2012-03-13 |
Etching Method And Etching Apparatus App 20100213170 - Kokaze; Yutaka ;   et al. | 2010-08-26 |
Plasma Processing Apparatus And Manufacturing Method Of Deposition-inhibitory Member App 20100151150 - Kokaze; Yutaka ;   et al. | 2010-06-17 |
Pneumatic booster App 20100132543 - Nakamura; Tadaaki ;   et al. | 2010-06-03 |
Dry Cleaning Method For Plasma Processing Apparatus App 20100083981 - Ueda; Masahisa ;   et al. | 2010-04-08 |
Silicon wafer cleaning method Grant 7,632,357 - Okuuchi , et al. December 15, 2 | 2009-12-15 |
Method And Apparatus For Manufacturing Device App 20090275146 - TAKANO; Katsuo ;   et al. | 2009-11-05 |
Silicon wafer cleaning method App 20070034229 - Okuuchi; Shigeru ;   et al. | 2007-02-15 |
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