ENDOU; Masayuki
Patent Applications and Registrations
Patent applications and USPTO patent grants for ENDOU; Masayuki.The latest application filed is for "chemically amplified resist material and pattern formation method using the same".
- ENDOU; Masayuki - Osaka JP
- Endou; Masayuki - Toyama JP
| Patent | Date |
|---|---|
| Chemically Amplified Resist Material And Pattern Formation Method Using The Same App 20120009795 - ENDOU; Masayuki ; et al. | 2012-01-12 |
| Pattern forming method Grant 8,067,148 - Endou , et al. November 29, 2 | 2011-11-29 |
| Pattern forming method Grant 7,998,658 - Endou , et al. August 16, 2 | 2011-08-16 |
| Method Of Accelerating Self-assembly Of Block Copolymer And Method Of Forming Self-assembled Pattern Of Block Copolymer Using The Accelerating Method App 20110186544 - ENDOU; Masayuki ; et al. | 2011-08-04 |
| Resist Material And Pattern Formation Method Using The Resist Material App 20110177454 - Endou; Masayuki ; et al. | 2011-07-21 |
| Resist Material And Method For Forming Pattern Using The Same App 20100266958 - ENDOU; Masayuki ; et al. | 2010-10-21 |
| Pattern Forming Method App 20100221672 - ENDOU; Masayuki ; et al. | 2010-09-02 |
| Pattern Forming Method App 20100209850 - ENDOU; Masayuki ; et al. | 2010-08-19 |
| Method For Pattern Formation App 20100055626 - Endou; Masayuki ; et al. | 2010-03-04 |
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