Endoh; Shosuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Endoh; Shosuke.The latest application filed is for "method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating method".

Company Profile

0.9.14

Endoh; Shosuke - Nirasaki N/A JP
ENDOH; Shosuke - Nirasaki-Shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component Grant 8,727,708 - Moriya , et al. May 20, 2	2014-05-20
Method For Coating Internal Member Having Holes In Vacuum Processing Apparatus And The Internal Member Having Holes Coated By Using The Coating Method App 20120200051 - TAKEUCHI; Jun ; et al.	2012-08-09
Plasma processing apparatus, focus ring, and susceptor Grant 8,124,539 - Endoh , et al. February 28, 2	2012-02-28
Substrate Processing Apparatus And Side Wall Component App 20120037314 - ENDOH; Shosuke ; et al.	2012-02-16
Plasma processing apparatus and focus ring Grant 8,114,247 - Endoh , et al. February 14, 2	2012-02-14
Reflecting Device, Communicating Pipe, Exhausting Pump, Exhaust System, Method For Cleaning The System, Storage Medium Storing Program For Implementing The Method, Substrate Processing Apparatus, And Particle Capturing Component App 20110162678 - MORIYA; Tsuyoshi ; et al.	2011-07-07
Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component Grant 7,927,066 - Moriya , et al. April 19, 2	2011-04-19
Plasma Processing Apparatus And Focus Ring App 20110048643 - Endoh; Shosuke ; et al.	2011-03-03
Plasma Processing Apparatus, Focus Ring, And Susceptor App 20110000883 - Endoh; Shosuke ; et al.	2011-01-06
Plasma processing apparatus and focus ring Grant 7,850,174 - Endoh , et al. December 14, 2	2010-12-14
Method For Coating Internal Member Having Holes In Vacuum Processing Apparatus And The Internal Member Having Holes Coated By Using The Coating Method App 20100089323 - TAKEUCHI; Jun ; et al.	2010-04-15
Processing apparatus and gas discharge suppressing member Grant 7,622,017 - Himori , et al. November 24, 2	2009-11-24
Method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating method Grant 7,604,845 - Takeuchi , et al. October 20, 2	2009-10-20
Substrate Processing Apparatus And Side Wall Component App 20070227663 - Endoh; Shosuke ; et al.	2007-10-04
Substrate Processing Apparatus And Substrate Processing Method App 20070187363 - OKA; Hiromi ; et al.	2007-08-16
Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component App 20060257243 - Moriya; Tsuyoshi ; et al.	2006-11-16
Processing apparatus and gas discharge suppressing member App 20050011456 - Himori, Shinji ; et al.	2005-01-20
Plasma processing apparatus, focus ring, and susceptor App 20040261946 - Endoh, Shosuke ; et al.	2004-12-30
Plasma processing apparatus and focus ring App 20040134618 - Endoh, Shosuke ; et al.	2004-07-15
Temperature measuring method and plasma processing apparatus App 20040108066 - Hayami, Toshihiro ; et al.	2004-06-10
Method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating method App 20040058070 - Takeuchi, Jun ; et al.	2004-03-25
Method for manufacturing electrode plate for plasma processing device Grant 5,961,361 - Endoh , et al. October 5, 1	1999-10-05

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