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Patent applications and USPTO patent grants for Endo; Shosuke.The latest application filed is for "plasma treatment method and apparatus".
Patent | Date |
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Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor Grant 7,337,745 - Komino , et al. March 4, 2 | 2008-03-04 |
Plasma treatment method and apparatus Grant 6,544,380 - Tomoyasu , et al. April 8, 2 | 2003-04-08 |
Plasma treatment method and apparatus App 20020088547 - Tomoyasu, Masayuki ;   et al. | 2002-07-11 |
Plasma treatment method and apparatus App 20010013504 - Imafuku, Kosuke ;   et al. | 2001-08-16 |
Plasma treatment method and apparatus Grant 6,264,788 - Tomoyasu , et al. July 24, 2 | 2001-07-24 |
Plasma treatment method utilizing an amplitude-modulated high frequency power Grant 6,106,737 - Tomoyasu , et al. August 22, 2 | 2000-08-22 |
Plasma processing apparatus Grant 6,074,518 - Imafuku , et al. June 13, 2 | 2000-06-13 |
Process chamber apparatus Grant 6,035,804 - Arami , et al. March 14, 2 | 2000-03-14 |
Gas diffusion plate for electrode of semiconductor wafer processing apparatus Grant D411,516 - Imafuku , et al. June 29, 1 | 1999-06-29 |
Plasma treatment apparatus and method Grant 5,698,062 - Sakamoto , et al. December 16, 1 | 1997-12-16 |
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