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Multiplexing System, Multiplexing Method, And Computer Program Product App 20180189131 - Endo; Kotaro | 2018-07-05 |
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Method For Forming Resist Pattern App 20140205956 - Iwasawa; Yuta ;   et al. | 2014-07-24 |
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Resist Composition And Method Of Forming Resist Pattern App 20130252171 - Hirano; Tomoyuki ;   et al. | 2013-09-26 |
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Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 8,338,076 - Kawaue , et al. December 25, 2 | 2012-12-25 |
Norbornene-type polymers, compositions thereof and lithographic processes using such compositions Grant 8,329,838 - Rhodes , et al. December 11, 2 | 2012-12-11 |
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Material for forming resist protection films and method for resist pattern formation with the same Grant 8,278,025 - Ishiduka , et al. October 2, 2 | 2012-10-02 |
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Material for forming resist protective film and method for forming resist pattern using same Grant 7,951,523 - Ishizuka , et al. May 31, 2 | 2011-05-31 |
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Material for formation of resist protection film and method of forming resist pattern therewith Grant 7,879,529 - Endo , et al. February 1, 2 | 2011-02-01 |
Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film Grant 7,846,637 - Ishizuka , et al. December 7, 2 | 2010-12-07 |
Positive resist composition for immersion lithography and method for forming resist pattern Grant 7,799,507 - Endo , et al. September 21, 2 | 2010-09-21 |
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Positive Resist Composition And Method Of Forming Resist Pattern App 20100086873 - Seshimo; Takehiro ;   et al. | 2010-04-08 |
Distributed system and redundancy control method Grant 7,620,845 - Endo November 17, 2 | 2009-11-17 |
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Material For Protective Film Formation And Method Of Forming Resist Pattern Therewith App 20090053646 - Ishiduka; Keita ;   et al. | 2009-02-26 |
Acrylic Copolymer App 20090048409 - Endo; Kotaro ;   et al. | 2009-02-19 |
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Material for Forming Resist Protective Film for Use in Liquid Immersion Lithography Process and Method for Forming Resist Pattern Using the Protective Film App 20080032202 - Ishizuka; Keita ;   et al. | 2008-02-07 |
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Method for determining a server computer which carried out a process most recently, and high availability computer system Grant 7,171,465 - Endo , et al. January 30, 2 | 2007-01-30 |
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Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound App 20050130056 - Ogata, Toshiyuki ;   et al. | 2005-06-16 |
Fluorine-containing monomeric ester compound for base resin in photoresist composition Grant 6,846,949 - Ogata , et al. January 25, 2 | 2005-01-25 |
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Disk control mechanism preferable for random disk write Grant 6,721,863 - Endo April 13, 2 | 2004-04-13 |
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