Ekberg; Mats

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ekberg; Mats.The latest application filed is for "method of compensation for bleaching of resist during three-dimensional exposure of resist".

Company Profile

0.5.3

Ekberg; Mats - Taby SE
Ekberg; Mats - Vasteras SE
Ekberg; Mats - Vaster.ang.s SE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of iterative compensation for non-linear effects in three-dimensional exposure of resist Grant 8,067,134 - Sandstrom , et al. November 29, 2	2011-11-29
Method of compensation for bleaching of resist during three-dimensional exposure of resist Grant 8,057,971 - Sandstrom , et al. November 15, 2	2011-11-15
Multi-focus method of enhanced three-dimensional exposure of resist Grant 7,923,182 - Sandstrom , et al. April 12, 2	2011-04-12
Method Of Compensation For Bleaching Of Resist During Three-dimensional Exposure Of Resist App 20100099034 - Sandstrom; Torbjorn ; et al.	2010-04-22
Method Of Iterative Compensation For Non-linear Effects In Three-dimensional Exposure Of Resist App 20100099035 - Sandstrom; Torbjorn ; et al.	2010-04-22
Multi-focus Method Of Enhanced Three-dimensional Exposure Of Resist App 20100099051 - Sandstrom; Torbjorn ; et al.	2010-04-22
Method for error reduction in lithography Grant 6,883,158 - Sandstrom , et al. April 19, 2	2005-04-19
Device and method relating to protection of an object against over-currents comprising over-current reduction Grant 6,226,163 - Bernhoff , et al. May 1, 2	2001-05-01

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