Eib; Nicholas K.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Eib; Nicholas K..The latest application filed is for "maskless vortex phase shift optical direct write lithography".

Company Profile

0.20.14

Eib; Nicholas K. - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Maskless vortex phase shift optical direct write lithography Grant 9,188,848 - Eib , et al. November 17, 2	2015-11-17
Maskless Vortex Phase Shift Optical Direct Write Lithography App 20130107240 - Eib; Nicholas K. ; et al.	2013-05-02
Maskless vortex phase shift optical direct write lithography Grant 8,377,633 - Eib , et al. February 19, 2	2013-02-19
Maskless Vortex Phase Shift Optical Direct Write Lithography App 20120038896 - Eib; Nicholas K. ; et al.	2012-02-16
Maskless vortex phase shift optical direct write lithography Grant 8,057,963 - Eib , et al. November 15, 2	2011-11-15
Method for providing temperature uniformity of rapid thermal annealing Grant 8,012,873 - Eib September 6, 2	2011-09-06
Optimized mirror design for optical direct write Grant 7,738,078 - Eib , et al. June 15, 2	2010-06-15
Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping Grant 7,499,146 - Troost , et al. March 3, 2	2009-03-03
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography Grant 7,372,547 - Eib , et al. May 13, 2	2008-05-13
Optimized Mirror Design For Optical Direct Write App 20070247604 - Eib; Nicholas K. ; et al.	2007-10-25
Optimized mirror design for optical direct write Grant 7,270,942 - Eib , et al. September 18, 2	2007-09-18
OPC based illumination optimization with mask error constraints Grant 7,264,906 - Croffie , et al. September 4, 2	2007-09-04
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process Grant 7,189,498 - Eib , et al. March 13, 2	2007-03-13
Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping App 20060203220 - Troost; Kars Zeger ; et al.	2006-09-14
Maskless vortex phase shift optical direct write lithography App 20050275814 - Eib, Nicholas K. ; et al.	2005-12-15
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography App 20050237508 - Eib, Nicholas K. ; et al.	2005-10-27
OPC based illumination optimization with mask error constraints App 20050196681 - Croffle, Ebo H. ; et al.	2005-09-08
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process App 20050153246 - Eib, Nicholas K. ; et al.	2005-07-14
Process and apparatus for applying apodization to maskless optical direct write lithography processes App 20050151949 - Eib, Nicholas K. ; et al.	2005-07-14
Optimized mirror design for optical direct write App 20050088640 - Eib, Nicholas K. ; et al.	2005-04-28
Phase edge darkening binary masks App 20050014075 - Croffie, Ebo H. ; et al.	2005-01-20
Ion implantation phase shift mask App 20040241554 - Rissman, Paul ; et al.	2004-12-02
Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate Grant 6,809,824 - Yates , et al. October 26, 2	2004-10-26
Method and apparatus for application of proximity correction with relative segmentation Grant 6,532,585 - Petranovic , et al. March 11, 2	2003-03-11
Method and apparatus for application of proximity correction with unitary segmentation Grant 6,499,003 - Jones , et al. December 24, 2	2002-12-24
Method And Apparatus For Application Of Proximity Correction With Unitary Segmentation App 20020004714 - JONES, EDWIN ; et al.	2002-01-10
Performing optical proximity correction with the aid of design rule checkers Grant 6,282,696 - Garza , et al. August 28, 2	2001-08-28
Optical proximity correction method and apparatus Grant 6,269,472 - Garza , et al. July 31, 2	2001-07-31
Method for adjusting the density of lines and contact openings across a substrate region for improving the chemical-mechanical polishing of a thin-film later disposed thereon Grant 6,109,775 - Tripathi , et al. August 29, 2	2000-08-29
Performing optical proximity correction with the aid of design rule checkers Grant 5,900,338 - Garza , et al. May 4, 1	1999-05-04
Optical proximity correction method and apparatus Grant 5,723,233 - Garza , et al. March 3, 1	1998-03-03
Performing optical proximity correction with the aid of design rule checkers Grant 5,705,301 - Garza , et al. January 6, 1	1998-01-06

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