Patent | Date |
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Stripping and Cleaning Compositions for Removal of Thick Film Resist App 20160152930 - Egbe; Matthew I. ;   et al. | 2016-06-02 |
Composition for removing photoresist and/or etching residue from a substrate and use thereof Grant 9,217,929 - Egbe , et al. December 22, 2 | 2015-12-22 |
Stripping and Cleaning Compositions for Removal of Thick Film Resist App 20140100151 - Egbe; Matthew I. ;   et al. | 2014-04-10 |
Composition for stripping and cleaning and use thereof Grant 8,440,599 - Egbe , et al. May 14, 2 | 2013-05-14 |
Stripper for dry film removal Grant 8,357,646 - Liu , et al. January 22, 2 | 2013-01-22 |
Composition for Removing Photoresist and/or Etching Residue From a Substrate and Use Thereof App 20120295828 - Egbe; Matthew I. ;   et al. | 2012-11-22 |
Aqueous stripping and cleaning composition Grant 8,231,733 - Egbe , et al. July 31, 2 | 2012-07-31 |
Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same Grant 8,110,535 - Egbe February 7, 2 | 2012-02-07 |
Composition For Stripping And Cleaning And Use Thereof App 20110311921 - Egbe; Matthew I. ;   et al. | 2011-12-22 |
Composition for stripping and cleaning and use thereof Grant 8,030,263 - Egbe , et al. October 4, 2 | 2011-10-04 |
Semi-Aqueous Stripping and Cleaning Formulation for Metal Substrate and Methods for Using Same App 20110034362 - Egbe; Matthew I. | 2011-02-10 |
Composition for removal of residue comprising cationic salts and methods using same Grant 7,700,533 - Egbe , et al. April 20, 2 | 2010-04-20 |
Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid Grant 7,687,447 - Egbe , et al. March 30, 2 | 2010-03-30 |
Formulation for removal of photoresist, etch residue and BARC Grant 7,674,755 - Egbe , et al. March 9, 2 | 2010-03-09 |
Stripper For Copper/Low k BEOL Clean App 20090229629 - Lee; Yi-Chia ;   et al. | 2009-09-17 |
Semi-Aqueous Stripping and Cleaning Composition Containing Aminobenzenesulfonic Acid App 20090233827 - Egbe; Matthew I. ;   et al. | 2009-09-17 |
Stripper For Dry Film Removal App 20090227483 - Liu; Wen Dar ;   et al. | 2009-09-10 |
Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and Residue App 20080096785 - EGBE; MATTHEW I. ;   et al. | 2008-04-24 |
Compositions for the removal of organic and inorganic residues Grant 7,361,631 - Egbe , et al. April 22, 2 | 2008-04-22 |
Formulation for removal of photoresist, etch residue and BARC App 20070149430 - Egbe; Matthew I. ;   et al. | 2007-06-28 |
Composition for removal of residue comprising cationic salts and methods using same App 20060293208 - Egbe; Matthew I. ;   et al. | 2006-12-28 |
Composition for removing photoresist and/or etching residue from a substrate and use thereof App 20060016785 - Egbe; Matthew I. ;   et al. | 2006-01-26 |
Composition for stripping and cleaning and use thereof App 20060014656 - Egbe; Matthew I. ;   et al. | 2006-01-19 |
Composition and method comprising same for removing residue from a substrate App 20060003910 - Hsu; Jiun Yi ;   et al. | 2006-01-05 |
Aqueous stripping and cleaning composition App 20050217697 - Egbe, Matthew I. ;   et al. | 2005-10-06 |
Aqueous stripping and cleaning composition Grant 6,943,142 - Egbe , et al. September 13, 2 | 2005-09-13 |
Compositions for the removal of organic and inorganic residues App 20050119143 - Egbe, Matthew I. ;   et al. | 2005-06-02 |
Process and apparatus for removing residues from the microstructure of an object App 20040198627 - Masuda, Kaoru ;   et al. | 2004-10-07 |
Aqueous stripping and cleaning composition App 20030130146 - Egbe, Matthew I. ;   et al. | 2003-07-10 |
Process and apparatus for removing residues from the microstructure of an object App 20020164873 - Masuda, Kaoru ;   et al. | 2002-11-07 |