Efraty; Boris

Patent Applications and Registrations

Patent applications and USPTO patent grants for Efraty; Boris.The latest application filed is for "methods of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology".

Company Profile

4.5.5

Efraty; Boris - Carmiel IL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology Grant 10,831,108 - Marciano , et al. November 10, 2	2020-11-10
Quality estimation and improvement of imaging metrology targets Grant 10,408,602 - Efraty , et al. Sept	2019-09-10
Wafer notch detection Grant 10,366,483 - Efraty , et al. July 30, 2	2019-07-30
Method, system, and user interface for metrology target characterization Grant 10,242,290 - Tarshish-Shapir , et al.	2019-03-26
Removing process-variation-related inaccuracies from scatterometry measurements Grant 9,874,527 - Amit , et al. January 23, 2	2018-01-23
Methods Of Analyzing And Utilizing Landscapes To Reduce Or Eliminate Inaccuracy In Overlay Optical Metrology App 20160313658 - Marciano; Tal ; et al.	2016-10-27
Quality Estimation And Improvement Of Imaging Metrology Targets App 20160231102 - Efraty; Boris ; et al.	2016-08-11
Wafer Notch Detection App 20160086325 - EFRATY; Boris ; et al.	2016-03-24
Removing Process-variation-related Inaccuracies From Scatterometry Measurements App 20150316490 - Amit; Eran ; et al.	2015-11-05
Metrology Target Characterization App 20140136137 - Tarshish-Shapir; Inna ; et al.	2014-05-15

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