Edo; Ryo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Edo; Ryo.The latest application filed is for "processing unit, exposure apparatus having the processing unit, and protection unit".

Company Profile

0.8.8

Edo; Ryo - Utsunomiya JP
Edo; Ryo - Tochigi JP
Edo; Ryo - Utsunomiya-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers Grant 7,670,754 - Edo , et al. March 2, 2	2010-03-02
Processing unit, exposure apparatus having the processing unit, and protection unit Grant 7,656,507 - Edo February 2, 2	2010-02-02
Apparatus and method for removing contaminant on original, method of manufacturing device, and original Grant 7,319,507 - Yonekawa , et al. January 15, 2	2008-01-15
Load-lock system, exposure processing system, and device manufacturing method Grant 7,276,097 - Edo October 2, 2	2007-10-02
Load lock chamber, processing system Grant 7,236,229 - Edo June 26, 2	2007-06-26
Processing unit, exposure apparatus having the processing unit, and protection unit App 20060197935 - Edo; Ryo	2006-09-07
Substrate processing apparatus, method of controlling substrate, and exposure apparatus App 20060142890 - Edo; Ryo	2006-06-29
Apparatus and method for removing contaminant on original, method of manufacturing device, and original App 20060082743 - Yonekawa; Masami ; et al.	2006-04-20
Substrate processing apparatus, method of controlling substrate, and exposure apparatus Grant 7,024,266 - Edo April 4, 2	2006-04-04
Processing system and exposure apparatus using the same App 20050121144 - Edo, Ryo ; et al.	2005-06-09
Substrate processing system with load-lock chamber Grant 6,805,748 - Edo October 19, 2	2004-10-19
Load-lock system, exposure processing system, and device manufacturing method App 20040187452 - Edo, Ryo	2004-09-30
Load lock chamber, processing system App 20040175906 - Edo, Ryo	2004-09-09
Substrate processing apparatus, method of controlling substrate, and exposure apparatus App 20030021671 - Edo, Ryo	2003-01-30
Substrate processing apparatus, substrate processing method, and exposure apparatus App 20030015290 - Edo, Ryo	2003-01-23
Mask, method of producing a device using the mask and aligner with the mask Grant 5,800,949 - Edo , et al. September 1, 1	1998-09-01

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