Edmonds; Harold D.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Edmonds; Harold D..The latest application filed is for "method for determining oxygen and carbon in silicon semiconductor wafer having rough surface".
- Edmonds; Harold D. - Hopewell Junction NY
| Patent | Date |
|---|---|
| Method for determining oxygen and carbon in silicon semiconductor wafer having rough surface Grant 4,590,574 - Edmonds , et al. May 20, 1 | 1986-05-20 |
| Dual mode spectrometer test station Grant 4,506,158 - Cadwallader , et al. March 19, 1 | 1985-03-19 |
| Multi-layered metallized silicon matrix substrate Grant 4,364,100 - Edmonds , et al. December 14, 1 | 1982-12-14 |
| Process for forming compound semiconductor bodies Grant 4,261,781 - Edmonds , et al. April 14, 1 | 1981-04-14 |
| High performance silicon wafer and fabrication process Grant 4,144,099 - Edmonds , et al. March 13, 1 | 1979-03-13 |
| Liquid Crystal Display Assembly Grant 3,832,034 - Edmonds August 27, 1 | 1974-08-27 |
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