Edart; Remi Daniel Marie

Patent Applications and Registrations

Patent applications and USPTO patent grants for Edart; Remi Daniel Marie.The latest application filed is for "method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods".

Company Profile

0.10.9

Edart; Remi Daniel Marie - Eindhoven NL
Edart; Remi Daniel Marie - Veldhoven N/A NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system Grant 9,454,084 - Lyulina , et al. September 27, 2	2016-09-27
Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods Grant 9,291,916 - Van Der Sanden , et al. March 22, 2	2016-03-22
Method of Applying a Pattern to a Substrate, Device Manufacturing Method and Lithographic Apparatus for Use in Such Methods App 20150153656 - VAN DER SANDEN; Stefan Cornelis Theodorus ; et al.	2015-06-04
Method To Determine The Usefulness Of Alignment Marks To Correct Overlay, And A Combination Of A Lithographic Apparatus And An Overlay Measurement System App 20150146188 - Lyulina; Irina ; et al.	2015-05-28
Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus Grant 8,982,347 - Wei , et al. March 17, 2	2015-03-17
Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods Grant 8,976,355 - Van Der Sanden , et al. March 10, 2	2015-03-10
Lithographic apparatus and method Grant 8,576,374 - Best , et al. November 5, 2	2013-11-05
Method of Applying a Pattern to a Substrate, Device Manufacturing Method and Lithographic Apparatus for Use in Such Methods App 20130230797 - VAN DER SANDEN; Stefan Cornelis Theodorus ; et al.	2013-09-05
Alignment Mark Deformation Estimating Method, Substrate Position Predicting Method, Alignment System and Lithographic Apparatus App 20130141723 - WEI; Xiuhong ; et al.	2013-06-06
Lithographic Apparatus And Method App 20090237635 - Best; Keith Frank ; et al.	2009-09-24
Lithographic Apparatus And Method App 20090153825 - EDART; Remi Daniel Marie ; et al.	2009-06-18
Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system Grant 7,317,509 - Edart January 8, 2	2008-01-08
Alignment system and method and device manufactured thereby Grant 7,259,828 - Tolsma , et al. August 21, 2	2007-08-21
Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system Grant 7,126,669 - Edart October 24, 2	2006-10-24
Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system App 20060139596 - Edart; Remi Daniel Marie	2006-06-29
Alignment system and method and device manufactured thereby App 20050254030 - Tolsma, Hoite Pieter Theodoor ; et al.	2005-11-17

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