Eda; Masataka
Patent Applications and Registrations
Patent applications and USPTO patent grants for Eda; Masataka.The latest application filed is for "fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film".
- Eda; Masataka - Yokohama JP
- Eda; Masataka - Yokohama-shi JP
- Eda; Masataka - Tokyo JP
| Patent | Date |
|---|---|
| Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film Grant 7,498,393 - Takebe , et al. March 3, 2 | 2009-03-03 |
| Fluorinated Compound, Fluoropolymer, Resist Composition, And Composition For Resist Protective Film App 20070154844 - TAKEBE; Yoko ; et al. | 2007-07-05 |
| Fluorocopolymer, method for its production and resist composition containing it App 20070083021 - Eda; Masataka ; et al. | 2007-04-12 |
| Fluoropolymer and resist composition Grant 7,091,294 - Takebe , et al. August 15, 2 | 2006-08-15 |
| Fluorinated copolymer process for its production and resist composition containing it App 20060135663 - Takebe; Yoko ; et al. | 2006-06-22 |
| Fluoropolymer and resist composition App 20050234206 - Takebe, Yoko ; et al. | 2005-10-20 |
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