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name:-0.0073950290679932
name:-0.0016779899597168
Eda; Masaichi Patent Filings

Eda; Masaichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Eda; Masaichi.The latest application filed is for "method of forming a semiconductor device".

Company Profile
1.7.3
  • Eda; Masaichi - Gresham OR
  • Eda; Masaichi - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of forming a semiconductor device
Grant 11,049,956 - Probst , et al. June 29, 2
2021-06-29
Method Of Forming A Semiconductor Device
App 20200395468 - PROBST; Dean E. ;   et al.
2020-12-17
Reduced Dry Etching Lag
App 20060199366 - Eda; Masaichi
2006-09-07
Reduced dry etching lag
Grant 7,094,687 - Eda August 22, 2
2006-08-22
Method of preventing resist poisoning in dual damascene structures
Grant 6,969,683 - Hu , et al. November 29, 2
2005-11-29
Method and apparatus for reducing microtrenching for borderless vias created in a dual damascene process
Grant 6,794,304 - Gu , et al. September 21, 2
2004-09-21
Method of preventing resist poisoning in dual damascene structures
App 20040161927 - Hu, Rongxiang ;   et al.
2004-08-19
High selectivity SiC etch in integrated circuit fabrication
Grant 6,743,725 - Hu , et al. June 1, 2
2004-06-01
Method of preventing resist poisoning in dual damascene structures
Grant 6,713,386 - Hu , et al. March 30, 2
2004-03-30
Anti-reflective coatings for use at 248 nm and 193 nm
Grant 6,686,272 - Lee , et al. February 3, 2
2004-02-03

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