Echizenya; Akira
Patent Applications and Registrations
Patent applications and USPTO patent grants for Echizenya; Akira.The latest application filed is for "x-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an x-ray diffraction measuring method for the same".
- Echizenya; Akira - Fussa JP
- Echizenya; Akira - Tokyo JP
| Patent | Date |
|---|---|
| X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same Grant 7,860,217 - Ozawa , et al. December 28, 2 | 2010-12-28 |
| X-ray optical system Grant 7,542,548 - Matsuo , et al. June 2, 2 | 2009-06-02 |
| X-Ray Diffraction Measuring Apparatus Having Debye-Scherrer Optical System Therein, and an X-ray Diffraction Measuring Method for the Same App 20090086910 - Ozawa; Tetsuya ; et al. | 2009-04-02 |
| X-ray optical system App 20080084967 - Matsuo; Ryuji ; et al. | 2008-04-10 |
| X-ray analysis device Grant D566,278 - Echizenya , et al. April 8, 2 | 2008-04-08 |
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