loadpatents
name:-0.015220880508423
name:-0.028012990951538
name:-0.00064778327941895
ECHIZEN; Hiroshi Patent Filings

ECHIZEN; Hiroshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for ECHIZEN; Hiroshi.The latest application filed is for "method for producing high-protein milk raw material".

Company Profile
0.22.13
  • ECHIZEN; Hiroshi - Tokyo JP
  • Echizen; Hiroshi - Kawasaki JP
  • Echizen; Hiroshi - Kawasaki-shi JP
  • Echizen; Hiroshi - Kanagawa JP
  • Echizen; Hiroshi - Nara JP
  • Echizen; Hiroshi - Nara-shi JP
  • Echizen; Hiroshi - Nagahama JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method For Producing High-protein Milk Raw Material
App 20210378252 - KAWAMURA; Yuki ;   et al.
2021-12-09
Method For Producing High-protein Milk Raw Material
App 20210378253 - KAWAMURA; Yuki ;   et al.
2021-12-09
Photoelectric conversion apparatus, manufacturing method thereof, and image pickup system
Grant 9,312,289 - Echizen , et al. April 12, 2
2016-04-12
Photoelectric Conversion Apparatus, Manufacturing Method Thereof, And Image Pickup System
App 20150364511 - Echizen; Hiroshi ;   et al.
2015-12-17
Dairy Product-like Processed Food And Method Of Manufacturing The Same
App 20150272151 - Narahara; Yoshiharu ;   et al.
2015-10-01
Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program
Grant 7,641,382 - Izawa , et al. January 5, 2
2010-01-05
Method Of Improving The Texture Of Fermented Milk
App 20090136620 - Horiuchi; Hiroshi ;   et al.
2009-05-28
Wet process gas treatment apparatus
Grant 7,288,140 - Echizen , et al. October 30, 2
2007-10-30
Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program
App 20060068081 - Izawa; Hiroshi ;   et al.
2006-03-30
Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device
Grant 6,930,025 - Nakayama , et al. August 16, 2
2005-08-16
Wet process gas treatment apparatus
App 20050081720 - Echizen, Hiroshi ;   et al.
2005-04-21
Long-Term sputtering method
Grant 6,860,974 - Echizen , et al. March 1, 2
2005-03-01
Wet-process gas treatment method and wet-process gas treatment apparatus
Grant 6,821,317 - Echizen , et al. November 23, 2
2004-11-23
Sputtering method and sputtering apparatus
Grant 6,783,640 - Yamashita , et al. August 31, 2
2004-08-31
Sputtering method for forming film and apparatus therefor
Grant 6,740,210 - Echizen , et al. May 25, 2
2004-05-25
Deposited-film formation apparatus, deposited-film formation process, vacuum system, leak judgment method, and computer-readable recording medium with recorded leak-judgment- executable program
App 20030207021 - Izawa, Hiroshi ;   et al.
2003-11-06
Wet-process gas treatment method and wet-process gas treatment apparatus
App 20030116018 - Echizen, Hiroshi ;   et al.
2003-06-26
Long-term sputtering method
App 20030085116 - Echizen, Hiroshi ;   et al.
2003-05-08
Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device
App 20020157703 - Nakayama, Akiya ;   et al.
2002-10-31
Sputtering method and sputtering apparatus
App 20020134670 - Echizen, Hiroshi ;   et al.
2002-09-26
Sputtering method for forming film and apparatus therefor
App 20020046943 - Echizen, Hiroshi ;   et al.
2002-04-25
Film forming method
Grant 6,338,872 - Yoshino , et al. January 15, 2
2002-01-15
Film forming apparatus
Grant 6,273,955 - Yoshino , et al. August 14, 2
2001-08-14
Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same
Grant 5,714,010 - Matsuyama , et al. February 3, 1
1998-02-03
Microwave plasma processing apparatus
Grant 5,700,326 - Takatsu , et al. December 23, 1
1997-12-23
Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method
Grant 5,527,391 - Echizen , et al. June 18, 1
1996-06-18
Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space
Grant 5,510,151 - Matsuyama , et al. April 23, 1
1996-04-23
Exposure method and apparatus
Grant 5,171,965 - Suzuki , et al. December 15, 1
1992-12-15
Microwave PCVD method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation
Grant 5,130,170 - Kanai , et al. July 14, 1
1992-07-14
Method for continuously forming functional deposited films with a large area by a microwave plasma CVD method
Grant 5,114,770 - Echizen , et al. May 19, 1
1992-05-19
Microwave chemical vapor deposition apparatus and feedback control method
Grant 5,069,928 - Echizen , et al. December 3, 1
1991-12-03
Wafer position detecting method and apparatus
Grant 4,806,773 - Hiraga , et al. February 21, 1
1989-02-21
Illuminance distribution measuring system
Grant 4,799,791 - Echizen , et al. January 24, 1
1989-01-24
Illumination optical system
Grant 4,717,242 - Echizen , et al. January 5, 1
1988-01-05
Method for forming deposition film
Grant 4,626,449 - Hirai , et al. December 2, 1
1986-12-02

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