| Patent | Date |
|---|
Underlayer Film Forming Composition For Lithography, Underlayer Film For Lithography, And Pattern Formation Method And Purification Method
App 20220260910 - YAMAMOTO; Hiroaki ; et al. | 2022-08-18 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, Method For Forming Pattern, And Purification Method
App 20220155682 - HORIUCHI; Junya ; et al. | 2022-05-19 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method, And Method For Purifying Resin
App 20220144738 - MAKINOSHIMA; Takashi ; et al. | 2022-05-12 |
Compound, (co)polymer, Composition, Method For Forming Pattern, And Method For Producing Compound
App 20220119336 - OMATSU; Tadashi ; et al. | 2022-04-21 |
Polycyclic Polyphenolic Resin And Method For Producing Polycyclic Polyphenolic Resin
App 20220089810 - OMATSU; Tadashi ; et al. | 2022-03-24 |
Composition For Film Formation, Resist Composition, Radiation-sensitive Composition, Method For Producing Amorphous Film, Resist Pattern Formation Method, Composition For Underlayer Film Formation For Lithography, Method For Producing Underlayer Film For Lithography, And Circuit Pattern Formation Me
App 20220089811 - OMATSU; Tadashi ; et al. | 2022-03-24 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method, And Purification Method
App 20220064137 - SATO; Takashi ; et al. | 2022-03-03 |
Compound, resist composition, and method for forming resist pattern using it
Grant 11,256,170 - Toida , et al. February 22, 2 | 2022-02-22 |
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purificat
Grant 11,243,467 - Toida , et al. February 8, 2 | 2022-02-08 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern
App 20220019146 - YAMANE; Masahiro ; et al. | 2022-01-20 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern
App 20220010072 - YAMADA; Kouichi ; et al. | 2022-01-13 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern
App 20210405529 - HORIUCHI; Junya ; et al. | 2021-12-30 |
Compound, Composition Containing The Same, Method For Forming Resist Pattern And Method For Forming Insulating Film
App 20210331994 - SATO; Takashi ; et al. | 2021-10-28 |
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method
Grant 11,143,962 - Toida , et al. October 12, 2 | 2021-10-12 |
Composition For Forming Optical Component, Optical Component, Compound, And Resin
App 20210309595 - OKADA; Yu ; et al. | 2021-10-07 |
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
Grant 11,137,686 - Toida , et al. October 5, 2 | 2021-10-05 |
Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
Grant 11,130,724 - Toida , et al. September 28, 2 | 2021-09-28 |
Underlayer Film Forming Composition
App 20210294214 - OKADA; Yu ; et al. | 2021-09-23 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern
App 20210278767 - UENO; Masayoshi ; et al. | 2021-09-09 |
Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method
Grant 11,067,889 - Echigo July 20, 2 | 2021-07-20 |
Compound, Composition Containing The Same, Method For Forming Resist Pattern And Method For Forming Insulating Film
App 20210206901 - SATO; Takashi ; et al. | 2021-07-08 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern
App 20210165327 - HORIUCHI; Junya ; et al. | 2021-06-03 |
Composition For Resist Underlayer Film Formation, Underlayer Film For Lithography, And Pattern Formation Method
App 20210116813 - SATO; Takashi ; et al. | 2021-04-22 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method And Method For Purifying Resin
App 20210109448 - HORIUCHI; Junya ; et al. | 2021-04-15 |
Compound, Resin, Composition And Pattern Formation Method
App 20210070727 - ECHIGO; Masatoshi | 2021-03-11 |
Compound, Resin, Composition, Resist Pattern Formation Method And Circuit Pattern Formation Method
App 20210070683 - ECHIGO; Masatoshi | 2021-03-11 |
Compound, Resin, Composition, Resist Pattern Formation Method And Circuit Pattern Formation Method
App 20210070685 - ECHIGO; Masatoshi | 2021-03-11 |
Resist Composition And Pattern Formation Method Using Same, Compound And Resin
App 20210063880 - KUDO; Hiroto ; et al. | 2021-03-04 |
Optical Component Forming Composition And Cured Product Thereof
App 20210055651 - SATO; Takashi ; et al. | 2021-02-25 |
Compound, Resin, Composition And Pattern Formation Method
App 20210047457 - ECHIGO; Masatoshi ; et al. | 2021-02-18 |
Composition, Method For Forming Resist Pattern And Method For Forming Insulating Film
App 20210040290 - SATO; Takashi ; et al. | 2021-02-11 |
Composition For Resist Underlayer Film Formation And Pattern Formation Method
App 20210018841 - SATO; Takashi ; et al. | 2021-01-21 |
Compound, Resin, Composition, And Film Forming Material For Lithography Using The Same
App 20210003921 - ECHIGO; Masatoshi ; et al. | 2021-01-07 |
Compound, Resin, Resist Composition Or Radiation-sensitive Composition, Resist Pattern Formation Method, Method For Producing Amorphous Film, Underlayer Film Forming Material For Lithography, Composition For Underlayer Film Formation For Lithography, Method For Forming Circuit Pattern, And Purificat
App 20200409261 - TOIDA; Takumi ; et al. | 2020-12-31 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method And Method For Purifying Resin
App 20200361843 - MAKINOSHIMA; Takashi ; et al. | 2020-11-19 |
Composition For Film Formation For Lithography, Film For Lithography, Method For Forming Resist Pattern, And Method For Forming Circuit Pattern
App 20200354501 - MAKINOSHIMA; Takashi ; et al. | 2020-11-12 |
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purificat
Grant 10,816,898 - Toida , et al. October 27, 2 | 2020-10-27 |
Optical Component Forming Composition And Cured Product Thereof
App 20200262787 - ECHIGO; Masatoshi ; et al. | 2020-08-20 |
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
Grant 10,745,372 - Toida , et al. A | 2020-08-18 |
Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
Grant 10,747,112 - Toida , et al. A | 2020-08-18 |
Composition For Lithography, Pattern Formation Method, And Compound
App 20200257195 - A1 | 2020-08-13 |
Composition For Resist Underlayer Film Formation, Underlayer Film For Lithography, And Pattern Formation Method
App 20200249573 - Kind Code | 2020-08-06 |
Compound, Resin, Composition, Pattern Formation Method, And Purification Method
App 20200247739 - Kind Code | 2020-08-06 |
(Meth)acryloyl compound and method for producing same
Grant 10,723,690 - Echigo | 2020-07-28 |
Novel (poly)amine Compound, Resin And Cured Product
App 20200172470 - ECHIGO; Masatoshi ; et al. | 2020-06-04 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Meth
App 20200166844 - OKADA; Kana ; et al. | 2020-05-28 |
Film Forming Material, Composition For Film Formation For Lithography, Material For Optical Component Formation, Resist Composit
App 20200157060 - MIKI; Yasushi ; et al. | 2020-05-21 |
Resist base material, resist composition and method for forming resist pattern
Grant 10,642,156 - Toida , et al. | 2020-05-05 |
Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin
Grant 10,577,323 - Okada , et al. | 2020-03-03 |
Compound, Resist Composition Containing Compound And Pattern Formation Method Using Same
App 20200057370 - KUDO; Hiroto ; et al. | 2020-02-20 |
Compound and method for producing same
Grant 10,550,068 - Echigo Fe | 2020-02-04 |
Method For Purifying Compound Or Resin And Method For Producing Composition
App 20200002307 - UCHIYAMA; Naoya ; et al. | 2020-01-02 |
Compound, Resin, Composition, Resist Pattern Formation Method And Pattern Formation Method
App 20190367658 - ECHIGO; Masatoshi | 2019-12-05 |
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
Grant 10494358 - | 2019-12-03 |
Optical Member Forming Composition
App 20190359756 - ECHIGO; Masatoshi | 2019-11-28 |
Resist material, resist composition and method for forming resist pattern
Grant 10,437,148 - Toida , et al. O | 2019-10-08 |
Compound, Resin, Composition, Resist Pattern Formation Method And Circuit Pattern Formation Method
App 20190278180 - ECHIGO; Masatoshi | 2019-09-12 |
Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition
Grant 10,377,734 - Echigo , et al. A | 2019-08-13 |
Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method
Grant 10,364,314 - Okada , et al. | 2019-07-30 |
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
Grant 10,359,701 - Okada , et al. July 23, 2 | 2019-07-23 |
Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
Grant 10,338,471 - Okada , et al. | 2019-07-02 |
Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method
Grant 10,310,377 - Makinoshima , et al. | 2019-06-04 |
Resist composition and method for forming resist pattern
Grant 10,303,055 - Sato , et al. | 2019-05-28 |
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin
Grant 10,294,183 - Makinoshima , et al. | 2019-05-21 |
Compound, Resin, Resist Composition Or Radiation-sensitive Composition, Resist Pattern Formation Method, Method For Producing Amorphous Film, Underlayer Film Forming Material For Lithography, Composition For Underlayer Film Formation For Lithography, Method For Forming Circuit Pattern, And Purificat
App 20190056657 - TOIDA; Takumi ; et al. | 2019-02-21 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Production Method Thereof, Pattern Forming Method, Resin, And Purification Method
App 20190041750 - TOIDA; Takumi ; et al. | 2019-02-07 |
Compound, Resin, Composition, Resist Pattern Formation Method, And Circuit Pattern Formation Method
App 20190010108 - TOIDA; Takumi ; et al. | 2019-01-10 |
Radiation-sensitive Composition
App 20180284607 - ECHIGO; Masatoshi ; et al. | 2018-10-04 |
Material For Lithography, Production Method Therefor, Composition For Lithography, Pattern Formation Method, Compound, Resin, And Method For Purifying The Compound Or The Resin
App 20180246405 - KUDO; Hiroto ; et al. | 2018-08-30 |
Compound, Composition, And Method For Producing Same, Underlayer Film Forming Material For Lithography, Composition For Underlayer Film Formation For Lithography, And Purification Method
App 20180246407 - ECHIGO; Masatoshi | 2018-08-30 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Production Method Thereof, And Resist Pattern Forming Method
App 20180246409 - TOIDA; Takumi ; et al. | 2018-08-30 |
Novel (meth)acryloyl Compound And Method For Producing Same
App 20180210341 - ECHIGO; Masatoshi | 2018-07-26 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Resist Pattern Forming Method, Circuit Pattern Forming Method, And Purification Method
App 20180208703 - OKADA; Kana ; et al. | 2018-07-26 |
Novel Compound And Method For Producing Same
App 20180201570 - ECHIGO; Masatoshi | 2018-07-19 |
Resist Base Material, Resist Composition And Method For Forming Resist Pattern
App 20180107113 - TOIDA; Takumi ; et al. | 2018-04-19 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method
App 20180101097 - OKADA; Kana ; et al. | 2018-04-12 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method
App 20180101096 - OKADA; Kana ; et al. | 2018-04-12 |
Compound, Resin, And Purification Method Thereof, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film, And Underlayer Film, As Well As Resist Pattern Forming Method And Circuit Pattern Forming Method
App 20180095368 - TOIDA; Takumi ; et al. | 2018-04-05 |
Radiation-sensitive Composition, Amorphous Film, And Method For Forming Resist Pattern
App 20180081270 - ECHIGO; Masatoshi ; et al. | 2018-03-22 |
Method for purifying compound or resin
Grant 9,920,024 - Echigo , et al. March 20, 2 | 2018-03-20 |
Compound, Resist Composition, And Method For Forming Resist Pattern Using It
App 20180074406 - TOIDA; Takumi ; et al. | 2018-03-15 |
Resist Composition, Method For Forming Resist Pattern, And Polyphenol Compound Used Therein
App 20180074402 - TOIDA; Takumi ; et al. | 2018-03-15 |
Radiation-sensitive Composition And Method For Forming Resist Pattern
App 20180074404 - ECHIGO; Masatoshi ; et al. | 2018-03-15 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Method For Purifying Compound Or Resin
App 20180065930 - OKADA; Kana ; et al. | 2018-03-08 |
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
Grant 9,908,831 - Echigo , et al. March 6, 2 | 2018-03-06 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Resist Pattern Forming Method, And Circuit Pattern Forming Method
App 20180052392 - OKADA; Kana ; et al. | 2018-02-22 |
Radiation-sensitive composition
Grant 9,897,913 - Echigo , et al. February 20, 2 | 2018-02-20 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Method For Purifying Compound Or Resin
App 20180044270 - HORIUCHI; Junya ; et al. | 2018-02-15 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Resist Pattern Forming Method, Circuit Pattern Forming Method, And Purification Method Of Compound Or Resin
App 20180029968 - TOIDA; Takumi ; et al. | 2018-02-01 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Purification Method
App 20170349564 - TOIDA; Takumi ; et al. | 2017-12-07 |
Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
Grant 9,828,355 - Echigo , et al. November 28, 2 | 2017-11-28 |
Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
Grant 9,809,601 - Echigo , et al. November 7, 2 | 2017-11-07 |
Resist composition
Grant 9,785,048 - Takasuka , et al. October 10, 2 | 2017-10-10 |
Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method
App 20170227849 - OKADA; Kana ; et al. | 2017-08-10 |
Resist Composition, Method For Forming Resist Pattern, Polyphenolic Compound For Use In The Composition, And Alcoholic Compound That Can Be Derived Therefrom
App 20170183279 - ECHIGO; Masatoshi ; et al. | 2017-06-29 |
Resist Material, Resist Composition And Method For Forming Resist Pattern
App 20170145142 - TOIDA; Takumi ; et al. | 2017-05-25 |
Material For Forming Film For Lithography, Composition For Forming Film For Lithography, Film For Lithography, Pattern Forming Method And Purification Method
App 20170144954 - MAKINOSHIMA; Takashi ; et al. | 2017-05-25 |
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
Grant 9,598,392 - Echigo , et al. March 21, 2 | 2017-03-21 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Method For Purifying The Compound Or Resin
App 20170073288 - MAKINOSHIMA; Takashi ; et al. | 2017-03-16 |
Resist Composition And Method For Forming Resist Pattern
App 20170075220 - SATO; Takashi ; et al. | 2017-03-16 |
Polymer Compound, Radiation Sensitive Composition And Pattern Forming Method
App 20170058079 - KUDO; Hiroto ; et al. | 2017-03-02 |
Polymer Compound, Radiation Sensitive Composition And Pattern Forming Method
App 20170059989 - KUDO; Hiroto ; et al. | 2017-03-02 |
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
Grant 9,540,339 - Echigo , et al. January 10, 2 | 2017-01-10 |
Method For Purifying Compound Or Resin
App 20170001972 - ECHIGO; Masatoshi ; et al. | 2017-01-05 |
Allyl compound and method for producing the same
Grant 9,464,068 - Echigo October 11, 2 | 2016-10-11 |
Resist Composition, Method For Forming Resist Pattern, Polyphenolic Compound For Use In The Composition, And Alcoholic Compound That Can Be Derived Therefrom
App 20160176840 - ECHIGO; Masatoshi ; et al. | 2016-06-23 |
Resist composition
Grant 9,354,516 - Takasuka , et al. May 31, 2 | 2016-05-31 |
Resist Composition, Method For Forming Resist Pattern, Polyphenolic Compound For Use In The Composition, And Alcoholic Compound That Can Be Derived Therefrom
App 20160145231 - ECHIGO; Masatoshi ; et al. | 2016-05-26 |
Resist Composition
App 20160124303 - Takasuka; Masaaki ; et al. | 2016-05-05 |
Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
Grant 9,316,913 - Echigo , et al. April 19, 2 | 2016-04-19 |
Compound, radiation-sensitive composition and resist pattern formation method
Grant 9,239,517 - Echigo January 19, 2 | 2016-01-19 |
Compound, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method
App 20150376202 - Echigo; Masatoshi ; et al. | 2015-12-31 |
Compound, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method
App 20150376158 - Echigo; Masatoshi ; et al. | 2015-12-31 |
Resist Composition, Method For Forming Resist Pattern, Polyphenol Derivative For Use In The Composition
App 20150376157 - Echigo; Masatoshi ; et al. | 2015-12-31 |
Novel Allyl Compound And Method For Producing The Same
App 20150368224 - Echigo; Masatoshi | 2015-12-24 |
Naphthalene formaldehyde resin, deacetalized naphthalene formaldehyde resin, and modified naphthalene formaldehyde resin
Grant 9,200,105 - Uchiyama , et al. December 1, 2 | 2015-12-01 |
Epoxy Resin, Production Method Thereof, Epoxy Resin Composition, And Cured Product
App 20150322308 - Echigo; Masatoshi ; et al. | 2015-11-12 |
Cyclic compound, method for producing the same, radiation-sensitive composition, and resist pattern formation method
Grant 9,182,666 - Echigo , et al. November 10, 2 | 2015-11-10 |
Bicyclohexane derivative compound and manufacturing method of the same
Grant 9,150,491 - Echigo , et al. October 6, 2 | 2015-10-06 |
Cyclic compound, method for producing same, composition, and method for forming resist pattern
Grant 9,122,153 - Echigo , et al. September 1, 2 | 2015-09-01 |
Phenolic resin and material for forming underlayer film for lithography
Grant 9,110,373 - Uchiyama , et al. August 18, 2 | 2015-08-18 |
Material For Forming Underlayer Film Lithography, Underlayer Film For Lithography And Pattern Forming Method
App 20150090691 - Echigo; Masatoshi ; et al. | 2015-04-02 |
Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method
Grant 8,969,629 - Takasuka , et al. March 3, 2 | 2015-03-03 |
Acidic Treatment-subjected Monoalkylnaphthalene Formaldehyde Resin
App 20150037736 - Uchiyama; Naoya ; et al. | 2015-02-05 |
Radiation-sensitive Composition
App 20150030980 - ECHIGO; Masatoshi ; et al. | 2015-01-29 |
Naphthalene Formaldehyde Resin, Deacetalized Naphthalene Formaldehyde Resin, And Modified Naphthalene Formaldehyde Resin
App 20150018499 - Uchiyama; Naoya ; et al. | 2015-01-15 |
Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
Grant 8,889,919 - Echigo , et al. November 18, 2 | 2014-11-18 |
Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern
Grant 8,883,937 - Echigo , et al. November 11, 2 | 2014-11-11 |
Cyclic Compound, Method For Producing Same, Radiation-sensitive Composition, And Resist Pattern Formation Method
App 20140329177 - Echigo; Masatoshi ; et al. | 2014-11-06 |
Cyclic Compound, Method For Producing The Same, Radiation-sensitive Composition, And Resist Pattern Formation Method
App 20140329178 - Echigo; Masatoshi ; et al. | 2014-11-06 |
Cyclic Compound, Method For Producing Same, Composition, And Method For Forming Resist Pattern
App 20140308615 - Echigo; Masatoshi ; et al. | 2014-10-16 |
Radiation-sensitive composition
Grant 8,846,292 - Echigo , et al. September 30, 2 | 2014-09-30 |
Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
Grant 8,829,247 - Hayashi , et al. September 9, 2 | 2014-09-09 |
Resin Having Fluorene Structure And Material For Forming Underlayer Film For Lithography
App 20140246400 - Higashihara; Go ; et al. | 2014-09-04 |
Resist Composition, Method For Forming Resist Pattern, Polyphenolic Compound For In The Composition, And Alcoholic Compound That Can Be Derived Therefrom
App 20140248561 - Echigo; Masatoshi ; et al. | 2014-09-04 |
Compound for resist and radiation-sensitive composition specification
Grant 8,802,353 - Echigo , et al. August 12, 2 | 2014-08-12 |
Phenolic Resin And Material For Forming Underlayer Film For Lithography
App 20140186776 - Uchiyama; Naoya ; et al. | 2014-07-03 |
Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
Grant 8,748,078 - Hayashi , et al. June 10, 2 | 2014-06-10 |
Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern
Grant 8,741,553 - Higashihara , et al. June 3, 2 | 2014-06-03 |
Aromatic Hydrocarbon Resin, Underlayer Film Forming Composition For Lithography, And Method For Forming Multilayer Resist Pattern
App 20130280655 - Higashihara; Go ; et al. | 2013-10-24 |
Purification Method For Cyclic Compound
App 20130150627 - Okada; Yu ; et al. | 2013-06-13 |
Compound, Radiation-sensitive Composition And Resist Pattern Formation Method
App 20130122423 - Echigo; Masatoshi | 2013-05-16 |
Bicyclohexane Derivative Compound And Manufacturing Method Of The Same
App 20130030211 - Echigo; Masatoshi ; et al. | 2013-01-31 |
Compound for resist and radiation-sensitive composition
Grant 8,350,096 - Echigo , et al. January 8, 2 | 2013-01-08 |
Compound For Resist And Radiation-sensitive Composition Specification
App 20130004896 - ECHIGO; Masatoshi ; et al. | 2013-01-03 |
Under Coat Film Material And Method Of Forming Multilayer Resist Pattern
App 20130004894 - Hayashi; Hiromi ; et al. | 2013-01-03 |
Cyclic Compound, Production Process Thereof, Radiation-sensitive Composition And Resist Pattern Formation Method
App 20120282546 - Takasuka; Masaaki ; et al. | 2012-11-08 |
Cyclic Compound, Method Of Producing The Same, Radiation Sensitive Composition, And Method Of Forming Resist Pattern
App 20120251947 - Hayashi; Hiromi ; et al. | 2012-10-04 |
Radiation-sensitive Composition
App 20120171379 - ECHIGO; Masatoshi ; et al. | 2012-07-05 |
Cyclic Compound, Process For Production Of The Cyclic Compound, Radiation-sensitive Composition, And Method For Formation Of Resist Pattern
App 20120171615 - Echigo; Masatoshi ; et al. | 2012-07-05 |
Cyclic Compound, Process For Preparation Thereof, Radiation-sensitive Composition, And Method For Formation Of Resist Pattern
App 20120164576 - Hayashi; Hiromi ; et al. | 2012-06-28 |
Cyclic Compound, Manufacturing Method Therefor, Radiation-sensitive Composition, And Method For Forming A Resist Pattern
App 20120164575 - Echigo; Masatoshi ; et al. | 2012-06-28 |
Cyclic Compound, Process For Production Of The Cyclic Compound, Radiation-sensitive Composition, And Method For Formation Of Resist Pattern
App 20120156615 - Echigo; Masatoshi ; et al. | 2012-06-21 |
Radiation-sensitive composition
Grant 8,110,334 - Echigo , et al. February 7, 2 | 2012-02-07 |
Compound For Resist And Radiation-sensitive Composition
App 20110165516 - ECHIGO; Masatoshi ; et al. | 2011-07-07 |
Compound for resist and radiation-sensitive composition
Grant 7,919,223 - Echigo , et al. April 5, 2 | 2011-04-05 |
Resist composition
Grant 7,871,751 - Echigo , et al. January 18, 2 | 2011-01-18 |
Radiation-sensitive Composition
App 20100047709 - Echigo; Masatoshi ; et al. | 2010-02-25 |
Modified cyclic aliphatic polyamine
Grant 7,572,877 - Koyama , et al. August 11, 2 | 2009-08-11 |
Modified chain aliphatic polyamine
Grant 7,473,806 - Echigo , et al. January 6, 2 | 2009-01-06 |
Curing epoxy resin with aliphatic diamine-styrene product and carboxyl- and hydroxyl-containing accelerator
Grant 7,414,097 - Kuwahara , et al. August 19, 2 | 2008-08-19 |
Epoxy resin curing agent of aliphatic diamine/styrene addition product
Grant 7,396,902 - Kuwahara , et al. July 8, 2 | 2008-07-08 |
Resist composition
App 20080153031 - Echigo; Masatoshi ; et al. | 2008-06-26 |
Compound for Resist and Radiation-Sensitive Composition
App 20080113294 - Echigo; Masatoshi ; et al. | 2008-05-15 |
Process for producing an amino composition
Grant 7,364,668 - Kuwahara , et al. April 29, 2 | 2008-04-29 |
Modified cyclic aliphatic polyamine
App 20080090990 - Koyama; Takeshi ; et al. | 2008-04-17 |
Modified cyclic aliphatic polyamine
Grant 7,301,053 - Koyama , et al. November 27, 2 | 2007-11-27 |
Low-temperature curable epoxy resin curing agent and epoxy resin composition
App 20070155915 - Kuwahara; Hisayuki ; et al. | 2007-07-05 |
Method of manufacturing a semiconductor device
App 20070059632 - Oguro; Dai ; et al. | 2007-03-15 |
Process for producing an amino composition
Grant 7,157,606 - Echigo , et al. January 2, 2 | 2007-01-02 |
Modified polyoxyalkylene polyamine
Grant 7,109,289 - Echigo , et al. September 19, 2 | 2006-09-19 |
Process for producing an amino composition
App 20050137424 - Kuwahara, Hisayuki ; et al. | 2005-06-23 |
Amino composition and process for producing the same
Grant 6,908,982 - Ichikawa , et al. June 21, 2 | 2005-06-21 |
Process for producing an amino composition
App 20050038298 - Echigo, Masatoshi ; et al. | 2005-02-17 |
Modified polyoxyalkylene polyamine
App 20040210011 - Echigo, Masatoshi ; et al. | 2004-10-21 |
Resist composition
App 20040191672 - Oguro, Dai ; et al. | 2004-09-30 |
Low-temperature curable epoxy resin curing agent and epoxy resin composition
App 20040171770 - Kuwahara, Hisayuki ; et al. | 2004-09-02 |
Modified chain aliphatic polyamine
App 20040171791 - Echigo, Masatoshi ; et al. | 2004-09-02 |
Modified cyclic aliphatic polyamine
App 20040106684 - Koyama, Takeshi ; et al. | 2004-06-03 |
Amino composition and process for producing the same
App 20040044176 - Ichikawa, Tetsushi ; et al. | 2004-03-04 |
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