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Underlayer Film Forming Composition For Lithography, Underlayer Film For Lithography, And Pattern Formation Method And Purification Method App 20220260910 - YAMAMOTO; Hiroaki ;   et al. | 2022-08-18 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, Method For Forming Pattern, And Purification Method App 20220155682 - HORIUCHI; Junya ;   et al. | 2022-05-19 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method, And Method For Purifying Resin App 20220144738 - MAKINOSHIMA; Takashi ;   et al. | 2022-05-12 |
Compound, (co)polymer, Composition, Method For Forming Pattern, And Method For Producing Compound App 20220119336 - OMATSU; Tadashi ;   et al. | 2022-04-21 |
Polycyclic Polyphenolic Resin And Method For Producing Polycyclic Polyphenolic Resin App 20220089810 - OMATSU; Tadashi ;   et al. | 2022-03-24 |
Composition For Film Formation, Resist Composition, Radiation-sensitive Composition, Method For Producing Amorphous Film, Resist Pattern Formation Method, Composition For Underlayer Film Formation For Lithography, Method For Producing Underlayer Film For Lithography, And Circuit Pattern Formation Me App 20220089811 - OMATSU; Tadashi ;   et al. | 2022-03-24 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method, And Purification Method App 20220064137 - SATO; Takashi ;   et al. | 2022-03-03 |
Compound, resist composition, and method for forming resist pattern using it Grant 11,256,170 - Toida , et al. February 22, 2 | 2022-02-22 |
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purificat Grant 11,243,467 - Toida , et al. February 8, 2 | 2022-02-08 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern App 20220019146 - YAMANE; Masahiro ;   et al. | 2022-01-20 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern App 20220010072 - YAMADA; Kouichi ;   et al. | 2022-01-13 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern App 20210405529 - HORIUCHI; Junya ;   et al. | 2021-12-30 |
Compound, Composition Containing The Same, Method For Forming Resist Pattern And Method For Forming Insulating Film App 20210331994 - SATO; Takashi ;   et al. | 2021-10-28 |
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method Grant 11,143,962 - Toida , et al. October 12, 2 | 2021-10-12 |
Composition For Forming Optical Component, Optical Component, Compound, And Resin App 20210309595 - OKADA; Yu ;   et al. | 2021-10-07 |
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method Grant 11,137,686 - Toida , et al. October 5, 2 | 2021-10-05 |
Compound, resin, composition, resist pattern formation method, and circuit pattern formation method Grant 11,130,724 - Toida , et al. September 28, 2 | 2021-09-28 |
Underlayer Film Forming Composition App 20210294214 - OKADA; Yu ;   et al. | 2021-09-23 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern App 20210278767 - UENO; Masayoshi ;   et al. | 2021-09-09 |
Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method Grant 11,067,889 - Echigo July 20, 2 | 2021-07-20 |
Compound, Composition Containing The Same, Method For Forming Resist Pattern And Method For Forming Insulating Film App 20210206901 - SATO; Takashi ;   et al. | 2021-07-08 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Method For Forming Pattern App 20210165327 - HORIUCHI; Junya ;   et al. | 2021-06-03 |
Composition For Resist Underlayer Film Formation, Underlayer Film For Lithography, And Pattern Formation Method App 20210116813 - SATO; Takashi ;   et al. | 2021-04-22 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method And Method For Purifying Resin App 20210109448 - HORIUCHI; Junya ;   et al. | 2021-04-15 |
Compound, Resin, Composition And Pattern Formation Method App 20210070727 - ECHIGO; Masatoshi | 2021-03-11 |
Compound, Resin, Composition, Resist Pattern Formation Method And Circuit Pattern Formation Method App 20210070683 - ECHIGO; Masatoshi | 2021-03-11 |
Compound, Resin, Composition, Resist Pattern Formation Method And Circuit Pattern Formation Method App 20210070685 - ECHIGO; Masatoshi | 2021-03-11 |
Resist Composition And Pattern Formation Method Using Same, Compound And Resin App 20210063880 - KUDO; Hiroto ;   et al. | 2021-03-04 |
Optical Component Forming Composition And Cured Product Thereof App 20210055651 - SATO; Takashi ;   et al. | 2021-02-25 |
Compound, Resin, Composition And Pattern Formation Method App 20210047457 - ECHIGO; Masatoshi ;   et al. | 2021-02-18 |
Composition, Method For Forming Resist Pattern And Method For Forming Insulating Film App 20210040290 - SATO; Takashi ;   et al. | 2021-02-11 |
Composition For Resist Underlayer Film Formation And Pattern Formation Method App 20210018841 - SATO; Takashi ;   et al. | 2021-01-21 |
Compound, Resin, Composition, And Film Forming Material For Lithography Using The Same App 20210003921 - ECHIGO; Masatoshi ;   et al. | 2021-01-07 |
Compound, Resin, Resist Composition Or Radiation-sensitive Composition, Resist Pattern Formation Method, Method For Producing Amorphous Film, Underlayer Film Forming Material For Lithography, Composition For Underlayer Film Formation For Lithography, Method For Forming Circuit Pattern, And Purificat App 20200409261 - TOIDA; Takumi ;   et al. | 2020-12-31 |
Compound, Resin, Composition, Resist Pattern Formation Method, Circuit Pattern Formation Method And Method For Purifying Resin App 20200361843 - MAKINOSHIMA; Takashi ;   et al. | 2020-11-19 |
Composition For Film Formation For Lithography, Film For Lithography, Method For Forming Resist Pattern, And Method For Forming Circuit Pattern App 20200354501 - MAKINOSHIMA; Takashi ;   et al. | 2020-11-12 |
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purificat Grant 10,816,898 - Toida , et al. October 27, 2 | 2020-10-27 |
Optical Component Forming Composition And Cured Product Thereof App 20200262787 - ECHIGO; Masatoshi ;   et al. | 2020-08-20 |
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method Grant 10,745,372 - Toida , et al. A | 2020-08-18 |
Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method Grant 10,747,112 - Toida , et al. A | 2020-08-18 |
Composition For Lithography, Pattern Formation Method, And Compound App 20200257195 - A1 | 2020-08-13 |
Composition For Resist Underlayer Film Formation, Underlayer Film For Lithography, And Pattern Formation Method App 20200249573 - Kind Code | 2020-08-06 |
Compound, Resin, Composition, Pattern Formation Method, And Purification Method App 20200247739 - Kind Code | 2020-08-06 |
(Meth)acryloyl compound and method for producing same Grant 10,723,690 - Echigo | 2020-07-28 |
Novel (poly)amine Compound, Resin And Cured Product App 20200172470 - ECHIGO; Masatoshi ;   et al. | 2020-06-04 |
Film Forming Material For Lithography, Composition For Film Formation For Lithography, Underlayer Film For Lithography, And Meth App 20200166844 - OKADA; Kana ;   et al. | 2020-05-28 |
Film Forming Material, Composition For Film Formation For Lithography, Material For Optical Component Formation, Resist Composit App 20200157060 - MIKI; Yasushi ;   et al. | 2020-05-21 |
Resist base material, resist composition and method for forming resist pattern Grant 10,642,156 - Toida , et al. | 2020-05-05 |
Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin Grant 10,577,323 - Okada , et al. | 2020-03-03 |
Compound, Resist Composition Containing Compound And Pattern Formation Method Using Same App 20200057370 - KUDO; Hiroto ;   et al. | 2020-02-20 |
Compound and method for producing same Grant 10,550,068 - Echigo Fe | 2020-02-04 |
Method For Purifying Compound Or Resin And Method For Producing Composition App 20200002307 - UCHIYAMA; Naoya ;   et al. | 2020-01-02 |
Compound, Resin, Composition, Resist Pattern Formation Method And Pattern Formation Method App 20190367658 - ECHIGO; Masatoshi | 2019-12-05 |
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method Grant 10494358 - | 2019-12-03 |
Optical Member Forming Composition App 20190359756 - ECHIGO; Masatoshi | 2019-11-28 |
Resist material, resist composition and method for forming resist pattern Grant 10,437,148 - Toida , et al. O | 2019-10-08 |
Compound, Resin, Composition, Resist Pattern Formation Method And Circuit Pattern Formation Method App 20190278180 - ECHIGO; Masatoshi | 2019-09-12 |
Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition Grant 10,377,734 - Echigo , et al. A | 2019-08-13 |
Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method Grant 10,364,314 - Okada , et al. | 2019-07-30 |
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Grant 10,359,701 - Okada , et al. July 23, 2 | 2019-07-23 |
Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Grant 10,338,471 - Okada , et al. | 2019-07-02 |
Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method Grant 10,310,377 - Makinoshima , et al. | 2019-06-04 |
Resist composition and method for forming resist pattern Grant 10,303,055 - Sato , et al. | 2019-05-28 |
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin Grant 10,294,183 - Makinoshima , et al. | 2019-05-21 |
Compound, Resin, Resist Composition Or Radiation-sensitive Composition, Resist Pattern Formation Method, Method For Producing Amorphous Film, Underlayer Film Forming Material For Lithography, Composition For Underlayer Film Formation For Lithography, Method For Forming Circuit Pattern, And Purificat App 20190056657 - TOIDA; Takumi ;   et al. | 2019-02-21 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Production Method Thereof, Pattern Forming Method, Resin, And Purification Method App 20190041750 - TOIDA; Takumi ;   et al. | 2019-02-07 |
Compound, Resin, Composition, Resist Pattern Formation Method, And Circuit Pattern Formation Method App 20190010108 - TOIDA; Takumi ;   et al. | 2019-01-10 |
Radiation-sensitive Composition App 20180284607 - ECHIGO; Masatoshi ;   et al. | 2018-10-04 |
Material For Lithography, Production Method Therefor, Composition For Lithography, Pattern Formation Method, Compound, Resin, And Method For Purifying The Compound Or The Resin App 20180246405 - KUDO; Hiroto ;   et al. | 2018-08-30 |
Compound, Composition, And Method For Producing Same, Underlayer Film Forming Material For Lithography, Composition For Underlayer Film Formation For Lithography, And Purification Method App 20180246407 - ECHIGO; Masatoshi | 2018-08-30 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Production Method Thereof, And Resist Pattern Forming Method App 20180246409 - TOIDA; Takumi ;   et al. | 2018-08-30 |
Novel (meth)acryloyl Compound And Method For Producing Same App 20180210341 - ECHIGO; Masatoshi | 2018-07-26 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Resist Pattern Forming Method, Circuit Pattern Forming Method, And Purification Method App 20180208703 - OKADA; Kana ;   et al. | 2018-07-26 |
Novel Compound And Method For Producing Same App 20180201570 - ECHIGO; Masatoshi | 2018-07-19 |
Resist Base Material, Resist Composition And Method For Forming Resist Pattern App 20180107113 - TOIDA; Takumi ;   et al. | 2018-04-19 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20180101097 - OKADA; Kana ;   et al. | 2018-04-12 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20180101096 - OKADA; Kana ;   et al. | 2018-04-12 |
Compound, Resin, And Purification Method Thereof, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film, And Underlayer Film, As Well As Resist Pattern Forming Method And Circuit Pattern Forming Method App 20180095368 - TOIDA; Takumi ;   et al. | 2018-04-05 |
Radiation-sensitive Composition, Amorphous Film, And Method For Forming Resist Pattern App 20180081270 - ECHIGO; Masatoshi ;   et al. | 2018-03-22 |
Method for purifying compound or resin Grant 9,920,024 - Echigo , et al. March 20, 2 | 2018-03-20 |
Compound, Resist Composition, And Method For Forming Resist Pattern Using It App 20180074406 - TOIDA; Takumi ;   et al. | 2018-03-15 |
Resist Composition, Method For Forming Resist Pattern, And Polyphenol Compound Used Therein App 20180074402 - TOIDA; Takumi ;   et al. | 2018-03-15 |
Radiation-sensitive Composition And Method For Forming Resist Pattern App 20180074404 - ECHIGO; Masatoshi ;   et al. | 2018-03-15 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Method For Purifying Compound Or Resin App 20180065930 - OKADA; Kana ;   et al. | 2018-03-08 |
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom Grant 9,908,831 - Echigo , et al. March 6, 2 | 2018-03-06 |
Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Resist Pattern Forming Method, And Circuit Pattern Forming Method App 20180052392 - OKADA; Kana ;   et al. | 2018-02-22 |
Radiation-sensitive composition Grant 9,897,913 - Echigo , et al. February 20, 2 | 2018-02-20 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Method For Purifying Compound Or Resin App 20180044270 - HORIUCHI; Junya ;   et al. | 2018-02-15 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Resist Pattern Forming Method, Circuit Pattern Forming Method, And Purification Method Of Compound Or Resin App 20180029968 - TOIDA; Takumi ;   et al. | 2018-02-01 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Purification Method App 20170349564 - TOIDA; Takumi ;   et al. | 2017-12-07 |
Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Grant 9,828,355 - Echigo , et al. November 28, 2 | 2017-11-28 |
Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Grant 9,809,601 - Echigo , et al. November 7, 2 | 2017-11-07 |
Resist composition Grant 9,785,048 - Takasuka , et al. October 10, 2 | 2017-10-10 |
Composition For Forming Underlayer Film For Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20170227849 - OKADA; Kana ;   et al. | 2017-08-10 |
Resist Composition, Method For Forming Resist Pattern, Polyphenolic Compound For Use In The Composition, And Alcoholic Compound That Can Be Derived Therefrom App 20170183279 - ECHIGO; Masatoshi ;   et al. | 2017-06-29 |
Resist Material, Resist Composition And Method For Forming Resist Pattern App 20170145142 - TOIDA; Takumi ;   et al. | 2017-05-25 |
Material For Forming Film For Lithography, Composition For Forming Film For Lithography, Film For Lithography, Pattern Forming Method And Purification Method App 20170144954 - MAKINOSHIMA; Takashi ;   et al. | 2017-05-25 |
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom Grant 9,598,392 - Echigo , et al. March 21, 2 | 2017-03-21 |
Compound, Resin, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, Pattern Forming Method, And Method For Purifying The Compound Or Resin App 20170073288 - MAKINOSHIMA; Takashi ;   et al. | 2017-03-16 |
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Polymer Compound, Radiation Sensitive Composition And Pattern Forming Method App 20170059989 - KUDO; Hiroto ;   et al. | 2017-03-02 |
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom Grant 9,540,339 - Echigo , et al. January 10, 2 | 2017-01-10 |
Method For Purifying Compound Or Resin App 20170001972 - ECHIGO; Masatoshi ;   et al. | 2017-01-05 |
Allyl compound and method for producing the same Grant 9,464,068 - Echigo October 11, 2 | 2016-10-11 |
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Resist composition Grant 9,354,516 - Takasuka , et al. May 31, 2 | 2016-05-31 |
Resist Composition, Method For Forming Resist Pattern, Polyphenolic Compound For Use In The Composition, And Alcoholic Compound That Can Be Derived Therefrom App 20160145231 - ECHIGO; Masatoshi ;   et al. | 2016-05-26 |
Resist Composition App 20160124303 - Takasuka; Masaaki ;   et al. | 2016-05-05 |
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Novel Allyl Compound And Method For Producing The Same App 20150368224 - Echigo; Masatoshi | 2015-12-24 |
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Epoxy Resin, Production Method Thereof, Epoxy Resin Composition, And Cured Product App 20150322308 - Echigo; Masatoshi ;   et al. | 2015-11-12 |
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Bicyclohexane derivative compound and manufacturing method of the same Grant 9,150,491 - Echigo , et al. October 6, 2 | 2015-10-06 |
Cyclic compound, method for producing same, composition, and method for forming resist pattern Grant 9,122,153 - Echigo , et al. September 1, 2 | 2015-09-01 |
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Material For Forming Underlayer Film Lithography, Underlayer Film For Lithography And Pattern Forming Method App 20150090691 - Echigo; Masatoshi ;   et al. | 2015-04-02 |
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Acidic Treatment-subjected Monoalkylnaphthalene Formaldehyde Resin App 20150037736 - Uchiyama; Naoya ;   et al. | 2015-02-05 |
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Naphthalene Formaldehyde Resin, Deacetalized Naphthalene Formaldehyde Resin, And Modified Naphthalene Formaldehyde Resin App 20150018499 - Uchiyama; Naoya ;   et al. | 2015-01-15 |
Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern Grant 8,889,919 - Echigo , et al. November 18, 2 | 2014-11-18 |
Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern Grant 8,883,937 - Echigo , et al. November 11, 2 | 2014-11-11 |
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Cyclic Compound, Method For Producing The Same, Radiation-sensitive Composition, And Resist Pattern Formation Method App 20140329178 - Echigo; Masatoshi ;   et al. | 2014-11-06 |
Cyclic Compound, Method For Producing Same, Composition, And Method For Forming Resist Pattern App 20140308615 - Echigo; Masatoshi ;   et al. | 2014-10-16 |
Radiation-sensitive composition Grant 8,846,292 - Echigo , et al. September 30, 2 | 2014-09-30 |
Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern Grant 8,829,247 - Hayashi , et al. September 9, 2 | 2014-09-09 |
Resin Having Fluorene Structure And Material For Forming Underlayer Film For Lithography App 20140246400 - Higashihara; Go ;   et al. | 2014-09-04 |
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Phenolic Resin And Material For Forming Underlayer Film For Lithography App 20140186776 - Uchiyama; Naoya ;   et al. | 2014-07-03 |
Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern Grant 8,748,078 - Hayashi , et al. June 10, 2 | 2014-06-10 |
Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern Grant 8,741,553 - Higashihara , et al. June 3, 2 | 2014-06-03 |
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Compound, Radiation-sensitive Composition And Resist Pattern Formation Method App 20130122423 - Echigo; Masatoshi | 2013-05-16 |
Bicyclohexane Derivative Compound And Manufacturing Method Of The Same App 20130030211 - Echigo; Masatoshi ;   et al. | 2013-01-31 |
Compound for resist and radiation-sensitive composition Grant 8,350,096 - Echigo , et al. January 8, 2 | 2013-01-08 |
Compound For Resist And Radiation-sensitive Composition Specification App 20130004896 - ECHIGO; Masatoshi ;   et al. | 2013-01-03 |
Under Coat Film Material And Method Of Forming Multilayer Resist Pattern App 20130004894 - Hayashi; Hiromi ;   et al. | 2013-01-03 |
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Cyclic Compound, Manufacturing Method Therefor, Radiation-sensitive Composition, And Method For Forming A Resist Pattern App 20120164575 - Echigo; Masatoshi ;   et al. | 2012-06-28 |
Cyclic Compound, Process For Production Of The Cyclic Compound, Radiation-sensitive Composition, And Method For Formation Of Resist Pattern App 20120156615 - Echigo; Masatoshi ;   et al. | 2012-06-21 |
Radiation-sensitive composition Grant 8,110,334 - Echigo , et al. February 7, 2 | 2012-02-07 |
Compound For Resist And Radiation-sensitive Composition App 20110165516 - ECHIGO; Masatoshi ;   et al. | 2011-07-07 |
Compound for resist and radiation-sensitive composition Grant 7,919,223 - Echigo , et al. April 5, 2 | 2011-04-05 |
Resist composition Grant 7,871,751 - Echigo , et al. January 18, 2 | 2011-01-18 |
Radiation-sensitive Composition App 20100047709 - Echigo; Masatoshi ;   et al. | 2010-02-25 |
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Modified chain aliphatic polyamine Grant 7,473,806 - Echigo , et al. January 6, 2 | 2009-01-06 |
Curing epoxy resin with aliphatic diamine-styrene product and carboxyl- and hydroxyl-containing accelerator Grant 7,414,097 - Kuwahara , et al. August 19, 2 | 2008-08-19 |
Epoxy resin curing agent of aliphatic diamine/styrene addition product Grant 7,396,902 - Kuwahara , et al. July 8, 2 | 2008-07-08 |
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