EBATA; Shinya

Patent Applications and Registrations

Patent applications and USPTO patent grants for EBATA; Shinya.The latest application filed is for "method of manufacturing semiconductor device, method of processing substrate, recording medium, and substrate processing apparatus".

Company Profile

4.7.7

EBATA; Shinya - Tokyo JP
Ebata; Shinya - Toyama JP
EBATA; Shinya - Toyama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Manufacturing Semiconductor Device, Method Of Processing Substrate, Recording Medium, And Substrate Processing Apparatus App 20220301852 - EBATA; Shinya	2022-09-22
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Grant 11,170,995 - Ebata , et al. November 9, 2	2021-11-09
Inlet liner for substrate processing apparatus Grant D925,481 - Kagaya , et al. July 20, 2	2021-07-20
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus And Recording Medium App 20210115563 - HIRAMATSU; Hiroaki ; et al.	2021-04-22
Substrate Processing Apparatus, And Method Of Manufacturing Semiconductor Device App 20210087678 - EBATA; Shinya ; et al.	2021-03-25
Method of manufacturing semiconductor device, substrate processing apparatus and recording medium Grant 10,907,253 - Hiramatsu , et al. February 2, 2	2021-02-02
Gas nozzle for substrate processing apparatus Grant D889,596 - Okajima , et al.	2020-07-07
Gas nozzle for substrate processing apparatus Grant D888,196 - Okajima , et al.	2020-06-23
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, And Recording Medium App 20200098555 - EBATA; Shinya ; et al.	2020-03-26
Method Of Cleaning Member In Process Container, Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus, An App 20190255576 - KURIBAYASHI; Koei ; et al.	2019-08-22
Reaction tube Grant D853,979 - Kagaya , et al. July 16, 2	2019-07-16
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus And Recording Medium App 20190112710 - HIRAMATSU; Hiroaki ; et al.	2019-04-18
Method of manufacturing semiconductor device by alternatively increasing and decreasing pressure of process chamber Grant 9,508,531 - Kuribayashi , et al. November 29, 2	2016-11-29
Substrate Processing Apparatus, Method Of Manufacturing Semiconductor Device And Non-transitory Computer Readable Recording Medium App 20150087159 - KURIBAYASHI; Koei ; et al.	2015-03-26

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