Dziura; Thaddeus G.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Dziura; Thaddeus G..The latest application filed is for "visualization of three-dimensional semiconductor structures".

Company Profile

5.13.9

Dziura; Thaddeus G. - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Visualization of three-dimensional semiconductor structures Grant 11,099,137 - Rosenberg , et al. August 24, 2	2021-08-24
Visualization of Three-Dimensional Semiconductor Structures App 20200393386 - Rosenberg; Aaron J. ; et al.	2020-12-17
Visualization of three-dimensional semiconductor structures Grant 10,794,839 - Rosenberg , et al. October 6, 2	2020-10-06
Visualization of Three-Dimensional Semiconductor Structures App 20200271595 - Rosenberg; Aaron J. ; et al.	2020-08-27
Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology Grant 10,325,004 - Dziura , et al.	2019-06-18
Secondary target design for optical measurements Grant 9,311,431 - Yoo , et al. April 12, 2	2016-04-12
Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology Grant 9,310,296 - Dziura , et al. April 12, 2	2016-04-12
Secondary Target Design for Optical Measurements App 20130116978 - Yoo; Sungchul ; et al.	2013-05-09
Method Of Optimizing An Optical Parametric Model For Structural Analysis Using Optical Critical Dimension (ocd) Metrology App 20120323356 - Dziura; Thaddeus G. ; et al.	2012-12-20
Optical parametric model optimization Grant 8,090,558 - Dziura January 3, 2	2012-01-03
Apparatus and methods for detecting overlay errors using scatterometry Grant 7,933,016 - Mieher , et al. April 26, 2	2011-04-26
Apparatus And Methods For Detecting Overlay Errors Using Scatterometry App 20100091284 - Mieher; Walter D. ; et al.	2010-04-15
Apparatus and methods for detecting overlay errors using scatterometry Grant 7,663,753 - Mieher , et al. February 16, 2	2010-02-16
Method for determining lithographic focus and exposure Grant 7,656,512 - Mieher , et al. February 2, 2	2010-02-02
Method For Determining Lithographic Focus And Exposure App 20080192221 - Mieher; Walter ; et al.	2008-08-14
Method for determining lithographic focus and exposure Grant 7,382,447 - Mieher , et al. June 3, 2	2008-06-03
Apparatus And Methods For Detecting Overlay Errors Using Scatterometry App 20080094630 - Mieher; Walter D. ; et al.	2008-04-24
Apparatus and methods for detecting overlay errors using scatterometry Grant 7,317,531 - Mieher , et al. January 8, 2	2008-01-08
Apparatus and method for detecting overlay errors using scatterometry App 20040169861 - Mieher, Walter D. ; et al.	2004-09-02
Method for determining lithographic focus and exposure App 20030048458 - Mieher, Walter ; et al.	2003-03-13

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