Duvall; Andrew

Patent Applications and Registrations

Patent applications and USPTO patent grants for Duvall; Andrew.The latest application filed is for "systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity".

Company Profile

6.8.9

Duvall; Andrew - Tualatin OR
Duvall; Andrew - Portland OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Planar substrate edge contact with open volume equalization pathways and side containment Grant 11,443,975 - Breiling , et al. September 13, 2	2022-09-13
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity Grant 11,127,567 - Kang , et al. September 21, 2	2021-09-21
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity App 20200335304 - Kang; Hu ; et al.	2020-10-22
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment App 20200227304 - Breiling; Patrick ; et al.	2020-07-16
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Pla App 20200219757 - BREILING; Patrick ; et al.	2020-07-09
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity Grant 10,665,429 - Kang , et al.	2020-05-26
Reducing backside deposition at wafer edge Grant 10,648,079 - Baldasseroni , et al.	2020-05-12
Planar substrate edge contact with open volume equalization pathways and side containment Grant 10,622,243 - Breiling , et al.	2020-04-14
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment App 20180122685 - Breiling; Patrick ; et al.	2018-05-03
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity App 20180068833 - Kang; Hu ; et al.	2018-03-08
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity Grant 9,793,096 - Kang , et al. October 17, 2	2017-10-17
Plasma Suppression Behind A Showerhead Through The Use Of Increased Pressure App 20170260627 - Breiling; Patrick Girard ; et al.	2017-09-14
Plasma suppression behind a showerhead through the use of increased pressure Grant 9,758,868 - Breiling , et al. September 12, 2	2017-09-12
Method and apparatus for backside deposition reduction by control of wafer support to achieve edge seal Grant 9,428,833 - Duvall , et al. August 30, 2	2016-08-30
Reducing Backside Deposition At Wafer Edge App 20160177444 - Baldasseroni; Chloe ; et al.	2016-06-23
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity App 20160079036 - Kang; Hu ; et al.	2016-03-17
Methods And Apparatuses For Stable Deposition Rate Control In Low Temperature Ald Systems By Showerhead Active Heating And/or Pedestal Cooling App 20160056032 - Baldasseroni; Chloe ; et al.	2016-02-25

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