| Patent | Date |
|---|
Indium Compound And Method For Forming Indium-containing Film Using Said Indium Compounds
App 20220243319 - ONO; Takashi ; et al. | 2022-08-04 |
Compound And Method For Producing Lithium-containing Film
App 20220231268 - DUSSARRAT; Christian ; et al. | 2022-07-21 |
Heteroalkylcyclopentadienyl Indium-containing Precursors And Processes Of Using The Same For Deposition Of Indium-containing Layers
App 20220033966 - BRUNEAU; Antoine ; et al. | 2022-02-03 |
Group 6 Transition Metal-containing Compounds For Vapor Deposition Of Group 6 Transition Metal-containing Films
App 20220018026 - LANSALOT-MATRAS; Clement ; et al. | 2022-01-20 |
Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films
Grant 11,162,175 - Lansalot-Matras , et al. November 2, 2 | 2021-11-02 |
Fluorocarbon molecules for high aspect ratio oxide etch
Grant 11,152,223 - Anderson , et al. October 19, 2 | 2021-10-19 |
Lanthanoid Compound, Lanthanoid-containing Thin Film And Formation Of Lanthanoid-containing Thin Film Using The Lanthanoid Compound
App 20210061833 - DUSSARRAT; Christian ; et al. | 2021-03-04 |
Method Of Etching Porous Film
App 20200395221 - TAHARA; Shigeru ; et al. | 2020-12-17 |
Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films
Grant 10,731,251 - Lansalot-Matras , et al. | 2020-08-04 |
Chemistries for TSV/MEMS/power device etching
Grant 10,720,335 - Shen , et al. | 2020-07-21 |
Group 6 Transition Metal-containing Compounds For Vapor Deposition Of Group 6 Transition Metal-containing Films
App 20200199749 - LANSALOT-MATRAS; Clement ; et al. | 2020-06-25 |
Porous Film Sealing Method And Porous Film Sealing Material
App 20200010630 - URABE; Keiichiro ; et al. | 2020-01-09 |
Fluorocarbon Molecules For High Aspect Ratio Oxide Etch
App 20190326129 - ANDERSON; Curtis ; et al. | 2019-10-24 |
Fluorocarbon molecules for high aspect ratio oxide etch
Grant 10,381,240 - Anderson , et al. A | 2019-08-13 |
Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
Grant 10,217,629 - Dussarrat , et al. Feb | 2019-02-26 |
Chemistries For Tsv/mems/power Device Etching
App 20180366336 - Shen; Peng ; et al. | 2018-12-20 |
Group 6 Transition Metal-containing Compounds For Vapor Deposition Of Group 6 Transition Metal-containing Films
App 20180355484 - LANSALOT-MATRAS; Clement ; et al. | 2018-12-13 |
Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films
Grant 10,106,568 - Dussarrat , et al. October 23, 2 | 2018-10-23 |
Chemistries for TSV/MEMS/power device etching
Grant 10,103,031 - Shen , et al. October 16, 2 | 2018-10-16 |
Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films
Grant 10,094,021 - Lansalot-Matras , et al. October 9, 2 | 2018-10-09 |
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing
App 20180151354 - DUSSARRAT; Christian ; et al. | 2018-05-31 |
Organosilane precursors for ALD/CVD silicon-containing film applications
Grant 9,938,303 - Dussarrat , et al. April 10, 2 | 2018-04-10 |
Chemistries For Tsv/mems/power Device Etching
App 20180076046 - SHEN; Peng ; et al. | 2018-03-15 |
Methods of forming dielectric films, new precursors and their use in semiconductor manufacturing
Grant 9,911,590 - Dussarrat , et al. March 6, 2 | 2018-03-06 |
Chemistries for TSV/MEMS/power device etching
Grant 9,892,932 - Shen , et al. February 13, 2 | 2018-02-13 |
Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing films
Grant 9,868,753 - Lansalot-Matras , et al. January 16, 2 | 2018-01-16 |
Hexacoordinate silicon-containing precursors for ALD/CVD silicon-containing film applications
Grant 9,822,132 - Kuchenbeiser , et al. November 21, 2 | 2017-11-21 |
Group 6 Transition Metal-containing Compounds For Vapor Deposition Of Group 6 Transition Metal-containing Films
App 20170268107 - LANSALOT-MATRAS; Clement ; et al. | 2017-09-21 |
Cobalt-containing film forming compositions, their synthesis, and use in film deposition
Grant 9,719,167 - Gatineau , et al. August 1, 2 | 2017-08-01 |
Molybdenum- And Tungsten-containing Precursors For Thin Film Deposition
App 20170204126 - DUSSARRAT; Christian ; et al. | 2017-07-20 |
Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
Grant 9,711,347 - Pallem , et al. July 18, 2 | 2017-07-18 |
Silicon- and Zirconium-containing compositions for vapor deposition of Zirconium-containing films
Grant 9,663,547 - Lansalot-Matras , et al. May 30, 2 | 2017-05-30 |
Methods Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing
App 20170125242 - DUSSARRAT; Christian ; et al. | 2017-05-04 |
Chemistries For Tsv/mems/power Device Etching
App 20170103901 - SHEN; Peng ; et al. | 2017-04-13 |
Organosilane precursors for ALD/CVD silicon-containing film applications
Grant 9,593,133 - Dussarrat , et al. March 14, 2 | 2017-03-14 |
Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
Grant 9,583,335 - Dussarrat , et al. February 28, 2 | 2017-02-28 |
Germanium- And Zirconium-containing Composition For Vapor Deposition Of Zirconium-containing Films
App 20170050999 - LANSALOT-MATRAS; Clement ; et al. | 2017-02-23 |
Hafnium-containing Film Forming Compositions For Vapor Deposition Of Hafnium-containing Films
App 20170044664 - DUSSARRAT; Christian ; et al. | 2017-02-16 |
Hafnium-containing Film Forming Compositions For Vapor Deposition Of Hafnium-containing Films
App 20170044199 - DUSSARRAT; Christian ; et al. | 2017-02-16 |
Fluorocarbon Molecules For High Aspect Ratio Oxide Etch
App 20170032976 - ANDERSON; Curtis ; et al. | 2017-02-02 |
Fluorocarbon molecules for high aspect ratio oxide etch
Grant 9,514,959 - Anderson , et al. December 6, 2 | 2016-12-06 |
Germanium- and zirconium-containing compositions for vapor deposition of zirconium-containing films
Grant 9,499,571 - Lansalot-Matras , et al. November 22, 2 | 2016-11-22 |
Process For Forming Gate Insulators For Tft Structures
App 20160315163 - DUSSARRAT; CHRISTIAN ; et al. | 2016-10-27 |
Process For Forming Gate Insulators For Tft Structures
App 20160315168 - DUSSARRAT; Christian ; et al. | 2016-10-27 |
Cyclic Organoaminosilane Precursors For Forming Silicon-containing Films And Methods Of Using The Same
App 20160314962 - HIGASHINO; Katsuko ; et al. | 2016-10-27 |
Preparation Of Lanthanide-containing Precursors And Deposition Of Lanthanide-containing Films
App 20160293409 - PALLEM; Venkateswara R. ; et al. | 2016-10-06 |
Manganese-containing Film Forming Compositions, Their Synthesis, And Use In Film Deposition
App 20160194755 - WIESE; Stefan ; et al. | 2016-07-07 |
Preparation of cerium-containing precursor and deposition of cerium-containing films
Grant 9,384,963 - Pallem , et al. July 5, 2 | 2016-07-05 |
Organosilane precursors for ALD/CVD silicon-containing film applications
Grant 9,371,338 - Dussarrat , et al. June 21, 2 | 2016-06-21 |
Hexacoordinate Silicon-containing Precursors For Ald/cvd Silicon-containing Film Applications
App 20160152640 - KUCHENBEISER; Glenn ; et al. | 2016-06-02 |
Cobalt-containing Film Forming Compositions, Their Synthesis, And Use In Film Deposition
App 20160115588 - GATINEAU; Satoko ; et al. | 2016-04-28 |
Pentakis(dimethylamino) disilane precursor comprising compound and method for the preparation thereof
Grant RE45,839 - Dussarrat January 12, 2 | 2016-01-12 |
Fluorocarbon Molecules For High Aspect Ratio Oxide Etch
App 20150294880 - ANDERSON; Curtis ; et al. | 2015-10-15 |
Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereof
Grant 9,121,093 - Dussarrat , et al. September 1, 2 | 2015-09-01 |
Metal precursors containing beta-diketiminato ligands
Grant 9,103,019 - Dussarrat , et al. August 11, 2 | 2015-08-11 |
Hafnium-containing and zirconium-containing precursors for vapor deposition
Grant 9,087,690 - Pallem , et al. July 21, 2 | 2015-07-21 |
Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
Grant 9,076,648 - Pallem , et al. July 7, 2 | 2015-07-07 |
Silicon- And Zirconium-containing Compositions For Vapor Deposition Of Zirconium-containing Films
App 20150176120 - LANSALOT-MATRAS; Clement ; et al. | 2015-06-25 |
Nitridation of atomic layer deposited high-k dielectrics using trisilylamine
Grant 9,064,694 - Consiglio , et al. June 23, 2 | 2015-06-23 |
Organosilane Precursors For Ald/cvd Silicon-containing Film Applications
App 20150166576 - Dussarrat; Christian ; et al. | 2015-06-18 |
Organosilane Precursors For Ald/cvd Silicon-containing Film Applications
App 20150166577 - Dussarrat; Christian ; et al. | 2015-06-18 |
Hafnium- and zirconium-containing precursors and methods of using the same
Grant 9,045,509 - Dussarrat , et al. June 2, 2 | 2015-06-02 |
Germanium- And Zirconium-containing Compositions For Vapor Deposition Of Zirconium-containing Films
App 20150110958 - LANSALOT-MATRAS; Clement ; et al. | 2015-04-23 |
Cyclic amino compounds for low-k silylation
Grant 8,999,734 - McAndrew , et al. April 7, 2 | 2015-04-07 |
Methods of purifying COS
Grant 8,974,758 - Ertan , et al. March 10, 2 | 2015-03-10 |
Vapor deposition methods of SiCOH low-k films
Grant 8,932,674 - Dussarrat , et al. January 13, 2 | 2015-01-13 |
Organosilane Precursors For Ald/cvd Silicon-containing Film Applications
App 20150004317 - Dussarrat; Christian ; et al. | 2015-01-01 |
Method of atomic layer deposition using metal precursors
Grant 8,906,457 - Thompson , et al. December 9, 2 | 2014-12-09 |
Preparation Of Cerium-containing Precursor And Deposition Of Cerium-containing Films
App 20140335702 - PALLEM; Venkateswara R. ; et al. | 2014-11-13 |
Silicon Containing Compounds For Ald Deposition Of Metal Silicate Films
App 20140322924 - DUSSARRAT; Christian ; et al. | 2014-10-30 |
Use of ruthenium tetroxide as a precursor and reactant for thin film depositions
Grant 8,859,047 - Gatineau , et al. October 14, 2 | 2014-10-14 |
Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process
Grant 8,853,075 - Gatineau , et al. October 7, 2 | 2014-10-07 |
Alkali earth metal precursors for depositing calcium and strontium containing films
Grant 8,852,460 - Letessier , et al. October 7, 2 | 2014-10-07 |
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing
App 20140242812 - DUSSARRAT; Christian ; et al. | 2014-08-28 |
Preparation of cerium-containing precursors and deposition of cerium-containing films
Grant 8,809,849 - Pallem , et al. August 19, 2 | 2014-08-19 |
Methods of making and deposition methods using hafnium- or zirconium-containing compounds
Grant 8,765,220 - Dussarrat , et al. July 1, 2 | 2014-07-01 |
Neutral ligand containing precursors and methods for deposition of a metal containing film
Grant 8,758,867 - Jurcik, Jr. , et al. June 24, 2 | 2014-06-24 |
Hafnium-containing And Zirconium-containing Precursors For Vapor Deposition
App 20140170861 - Pallem; Venkateswara R. ; et al. | 2014-06-19 |
Method for the deposition of a ruthenium-containing film
Grant 8,753,718 - Dussarrat , et al. June 17, 2 | 2014-06-17 |
Titanium-containing Precursors For Vapor Deposition
App 20140127913 - PALLEM; Venkateswara R. ; et al. | 2014-05-08 |
Preparation Of Cerium-containing Precursors And Deposition Of Cerium-containing Films
App 20140113456 - PALLEM; Venkateswara R. ; et al. | 2014-04-24 |
Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
Grant 8,668,957 - Dussarrat , et al. March 11, 2 | 2014-03-11 |
Purification of trimethylamine
Grant 8,664,446 - Besancon , et al. March 4, 2 | 2014-03-04 |
Heteroleptic iridium precursors to be used for the deposition of iridium-containing films
Grant 8,658,249 - Gatineau , et al. February 25, 2 | 2014-02-25 |
Titanium-containing precursors for vapor deposition
Grant 8,633,329 - Pallem , et al. January 21, 2 | 2014-01-21 |
Nitridation Of Atomic Layer Deposited High-k Dielectrics Using Trisilylamine
App 20140017907 - Consiglio; Steven P. ; et al. | 2014-01-16 |
Cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
Grant 08617649 - | 2013-12-31 |
Cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
Grant 8,617,649 - Dussarrat , et al. December 31, 2 | 2013-12-31 |
Method of forming silicon oxide containing films
Grant 8,613,976 - Dussarrat , et al. December 24, 2 | 2013-12-24 |
Preparation Of Lanthanide-containing Precursors And Deposition Of Lanthanide-containing Films
App 20130303739 - PALLEM; Venkateswara R. ; et al. | 2013-11-14 |
Method for the deposition of a Ruthenium containing film
Grant 8,557,339 - Gatineau , et al. October 15, 2 | 2013-10-15 |
Method For The Deposition Of A Ruthenium-containing Film
App 20130252438 - DUSSARRAT; Christian ; et al. | 2013-09-26 |
Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
Grant 8,507,905 - Pallem , et al. August 13, 2 | 2013-08-13 |
Metal Film Deposition
App 20130202794 - Dussarrat; Christian ; et al. | 2013-08-08 |
Deposition of Ta- or Nb-doped high-k films
Grant 8,476,465 - Dussarrat July 2, 2 | 2013-07-02 |
Titanium-containing Precursors For Vapor Deposition
App 20130164947 - Pallem; Venkateswara R. ; et al. | 2013-06-27 |
Method of depositing a metal-containing dielectric film
Grant 8,470,402 - Dussarrat , et al. June 25, 2 | 2013-06-25 |
Use of group V metal containing precursors for a process of depositing a metal containing film
Grant 8,470,401 - Merle , et al. June 25, 2 | 2013-06-25 |
Tellurium precursors for GST deposition
Grant 8,454,928 - Dussarrat June 4, 2 | 2013-06-04 |
High Carbon Content Molecules For Amorphous Carbon Deposition
App 20130109198 - DUSSARRAT; Christian ; et al. | 2013-05-02 |
Plasma-enhanced Deposition Of Nickel-containing Films For Various Applications Using Amidinate Nickel Precursors
App 20130089678 - DUSSARRAT; Christian ; et al. | 2013-04-11 |
Plasma-enhanced Deposition Of Ruthenium-containing Films For Various Applications Using Amidinate Ruthenium Precursors
App 20130089680 - DUSSARRAT; Christian ; et al. | 2013-04-11 |
Plasma-enhanced Deposition Of Manganese-containing Films For Various Applications Using Amidinate Manganese Precursors
App 20130089679 - Dussarrat; Christian ; et al. | 2013-04-11 |
Plasma-enhanced Deposition Of Titanium-containing Films For Various Applications Using Amidinate Titanium Precursors
App 20130089681 - Dussarrat; Christian ; et al. | 2013-04-11 |
Plasma-enhanced Deposition Of Copper-containing Films For Various Applications Using Amidinate Copper Precursors
App 20130084407 - DUSSARRAT; Christian ; et al. | 2013-04-04 |
Method for the deposition of a ruthenium containing film
Grant 8,404,306 - Dussarrat , et al. March 26, 2 | 2013-03-26 |
Titanium-containing precursors for vapor deposition
Grant 8,404,878 - Pallem , et al. March 26, 2 | 2013-03-26 |
Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturing
Grant 8,399,056 - Blasco , et al. March 19, 2 | 2013-03-19 |
New Metal Precursors For Semiconductor Applications
App 20130065395 - DUSSARRAT; Christian | 2013-03-14 |
Method of Atomic Layer Deposition Using Metal Precursors
App 20130059077 - Thompson; David ; et al. | 2013-03-07 |
Use Of Ruthenium Tetroxide As A Precursor And Reactant For Thin Film Depositions
App 20130059078 - Gatineau; Julien ; et al. | 2013-03-07 |
VAPOR DEPOSITION METHODS OF SiCOH LOW-K FILMS
App 20130042790 - Dussarrat; Christian ; et al. | 2013-02-21 |
Method for depositing silicon nitride films and/or silicon oxynitride films by chemical vapor deposition
Grant 8,377,511 - Dussarrat February 19, 2 | 2013-02-19 |
Heteroleptic Iridium Precursors To Be Used For The Deposition Of Iridium-containing Films
App 20130040056 - GATINEAU; Julien ; et al. | 2013-02-14 |
Cobalt precursors for semiconductor applications
Grant 8,372,473 - Dussarrat February 12, 2 | 2013-02-12 |
Aluminum implant using new compounds
Grant 8,367,531 - Omarjee , et al. February 5, 2 | 2013-02-05 |
Silane Blend For Thin Film Vapor Deposition
App 20130022745 - Dussarrat; Christian ; et al. | 2013-01-24 |
Method for producing silicon nitride films
Grant 8,357,430 - Dussarrat , et al. January 22, 2 | 2013-01-22 |
Cyclopentadienyl Transition Metal Precursors For Deposition Of Transition Metal-containing Films
App 20130011580 - DUSSARRAT; Christian ; et al. | 2013-01-10 |
Metal precursors for deposition of metal-containing films
Grant 8,349,738 - Lansalot-Matras , et al. January 8, 2 | 2013-01-08 |
High C content molecules for C implant
Grant 8,343,860 - Omarjee , et al. January 1, 2 | 2013-01-01 |
Preparation Of Lanthanide-containing Precursors And Deposition Of Lanthanide-containing Films
App 20120329999 - PALLEM; Venkateswara R. ; et al. | 2012-12-27 |
Bis-ketoiminate Copper Precursors For Deposition Of Copper-containing Films
App 20120321817 - Dussarrat; Christian ; et al. | 2012-12-20 |
Metal precursors for semiconductor applications
Grant 8,329,583 - Dussarrat December 11, 2 | 2012-12-11 |
Heteroleptic iridium precursors to be used for the deposition of iridium-containing films
Grant 8,309,174 - Gatineau , et al. November 13, 2 | 2012-11-13 |
Method Of Forming Silicon Oxide Containing Films
App 20120276292 - DUSSARRAT; Christian ; et al. | 2012-11-01 |
Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
Grant 8,298,616 - Dussarrat , et al. October 30, 2 | 2012-10-30 |
Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
Grant 8,283,201 - Pallem , et al. October 9, 2 | 2012-10-09 |
Plasma Ashing Compounds And Methods Of Use
App 20120227762 - Dussarrat; Christian ; et al. | 2012-09-13 |
Methods Of Making And Deposition Methods Using Hafnium- Or Zirconium-containing Compounds
App 20120207928 - Dussarrat; Christian ; et al. | 2012-08-16 |
Hafnium- And Zirconium-containing Precursors And Methods Of Using The Same
App 20120207927 - Dussarrat; Christian ; et al. | 2012-08-16 |
Methods for synthesis of heteroleptic cyclopentadienyl transition metal precursors
Grant 8,236,979 - Dussarrat , et al. August 7, 2 | 2012-08-07 |
Method of forming silicon oxide containing films
Grant 8,227,032 - Dussarrat , et al. July 24, 2 | 2012-07-24 |
Preparation Of Cerium-containing Precursors And Deposition Of Cerium-containing Films
App 20120156373 - PALLEM; Venkateswara R. ; et al. | 2012-06-21 |
LITHIUM PRECURSORS FOR LixMyOz MATERIALS FOR BATTERIES
App 20120145953 - Pallem; Venkateswara R. ; et al. | 2012-06-14 |
Compounds for depositing tellurium-containing films
Grant 8,193,388 - Feist , et al. June 5, 2 | 2012-06-05 |
Metal Precursors For Deposition Of Metal-containing Films
App 20120122313 - Dussarrat; Christian ; et al. | 2012-05-17 |
Pentakis(dimethylamino) disilane precursor comprising compound and method for the preparation thereof
Grant 8,153,832 - Dussarrat April 10, 2 | 2012-04-10 |
Deposition Of Ternary Oxide Films Containing Ruthenium And Alkali Earth Metals
App 20120070582 - GATINEAU; Satoko ; et al. | 2012-03-22 |
Deposition Of Ta- Or Nb-doped High-k Films
App 20120065420 - Dussarrat; Christian | 2012-03-15 |
Methods Of Purifying Cos
App 20120051995 - Ertan; Asli ; et al. | 2012-03-01 |
Deposition of ternary oxide films containing ruthenium and alkali earth metals
Grant 8,092,721 - Gatineau , et al. January 10, 2 | 2012-01-10 |
Low decomposition storage of a tantalum precursor
Grant 8,088,938 - Stafford , et al. January 3, 2 | 2012-01-03 |
Metal precursors for deposition of metal-containing films
Grant 8,076,243 - Dussarrat , et al. December 13, 2 | 2011-12-13 |
Deposition of Ta- or Nb-doped high-k films
Grant 8,071,163 - Dussarrat December 6, 2 | 2011-12-06 |
Method For Forming A Dielectric Film And Novel Precursors For Implementing Said Method
App 20110275507 - DUSSARRAT; Christian | 2011-11-10 |
Method For Forming A Titanium-containing Layer On A Substrate Using An Atomic Layer Deposition (ald) Process
App 20110275215 - Gatineau; Satoko ; et al. | 2011-11-10 |
Titanium-containing Precursors For Vapor Deposition
App 20110250354 - Pallem; Venkateswara R. ; et al. | 2011-10-13 |
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing
App 20110207337 - DUSSARRAT; Christian ; et al. | 2011-08-25 |
Method for forming a dielectric film and novel precursors for implementing said method
Grant 7,972,975 - Dussarrat July 5, 2 | 2011-07-05 |
Metal precursors for semiconductor applications
Grant 7,951,711 - Dussarrat May 31, 2 | 2011-05-31 |
Synthesis Of Allyl-containing Precursors For The Deposition Of Metal-containing Films
App 20100256405 - DUSSARRAT; Christian ; et al. | 2010-10-07 |
Precursors having open ligands for ruthenium containing films deposition
Grant 7,807,223 - Dussarrat , et al. October 5, 2 | 2010-10-05 |
Cyclic Amino Compounds For Low-k Silylation
App 20100233829 - McANDREW; James J.F. ; et al. | 2010-09-16 |
Method For The Deposition Of A Ruthenium Containing Film
App 20100221577 - Dussarrat; Christian | 2010-09-02 |
Method For Depositing Silicon Nitride Films And/or Silicon Oxynitride Films By Chemical Vapor Deposition
App 20100221428 - Dussarrat; Christian | 2010-09-02 |
Metal Precursors For Deposition Of Metal-containing Films
App 20100193951 - Dussarrat; Christian ; et al. | 2010-08-05 |
Method For Forming A Dielectric Film And Novel Precursors For Implementing Said Method
App 20100130025 - Dussarrat; Christian | 2010-05-27 |
Allyl-containing Precursors For The Deposition Of Metal-containing Films
App 20100119406 - DUSSARRAT; Christian ; et al. | 2010-05-13 |
Deposition Method Of Ternary Films
App 20100104755 - Dussarrat; Christian ; et al. | 2010-04-29 |
Preparation of Lanthanide-Containing Precursors and Deposition of Lanthanide-Containing Films
App 20100078601 - PALLEM; Venkateswara R. ; et al. | 2010-04-01 |
Group V Metal Containing Precursors And Their Use For Metal Containing Film Deposition
App 20100055310 - Merle; Nicolas ; et al. | 2010-03-04 |
Novel Lanthanide Beta-diketonate Precursors For Lanthanide Thin Film Deposition
App 20100034719 - DUSSARRAT; Christian ; et al. | 2010-02-11 |
Method For The Deposition Of A Ruthenium Containing Film
App 20100034971 - Gatineau; Julien ; et al. | 2010-02-11 |
Heteroleptic Cyclopentadienyl Transition Metal Precursors For Deposition Of Transition Metal-containing Films
App 20100021747 - DUSSARRAT; Christian ; et al. | 2010-01-28 |
Methods For Synthesis Of Heteroleptic Cyclopentadienyl Transition Metal Precursors
App 20100022790 - Dussarrat; Christian ; et al. | 2010-01-28 |
Pentakis(dimethylamino) Disilane Precursor Comprising Compound And Method For The Preparation Thereof
App 20100016620 - Dussarrat; Christian | 2010-01-21 |
Beta-diketiminate Precursors For Metal Containing Film Deposition
App 20100003532 - FEIST; Benjamin J. ; et al. | 2010-01-07 |
Low-K Precursors Based on Silicon Cryptands, Crown Ethers and Podands
App 20100003835 - McANDREW; James J.F. ; et al. | 2010-01-07 |
Method Of Forming High-k Dielectric Films Based On Novel Titanium, Zirconium, And Hafnium Precursors And Their Use For Semiconductor Manufacturing
App 20090311879 - Blasco; Nicolas ; et al. | 2009-12-17 |
Preparation of Lanthanide-Containing Precursors and Deposition of Lanthanide-Containing Films
App 20090302434 - Pallem; Venkateswara R. ; et al. | 2009-12-10 |
Heteroleptic Iridium Precursors To Be Used For The Deposition Of Iridium-Containing Films
App 20090258144 - Gatineau; Julien ; et al. | 2009-10-15 |
Compounds for Depositing Tellurium-Containing Films
App 20090256127 - FEIST; Benjamin J. ; et al. | 2009-10-15 |
Deposition Of Ternary Oxide Films Containing Ruthenium And Alkali Earth Metals
App 20090242852 - GATINEAU; Satoko ; et al. | 2009-10-01 |
Alkali Earth Metal Precursors For Depositing Calcium And Strontium Containing Films
App 20090236568 - LETESSIER; Olivier ; et al. | 2009-09-24 |
Method Of Forming Silicon Oxide Containing Films
App 20090232985 - Dussarrat; Christian ; et al. | 2009-09-17 |
Alkaline Earth Metal Containing Precursor Solutions
App 20090226612 - Ogawa; Satoko ; et al. | 2009-09-10 |
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing
App 20090203222 - Dussarrat; Christian ; et al. | 2009-08-13 |
New Metal Precursors Containing Beta-diketiminato Ligands
App 20090197411 - Dussarrat; Christian ; et al. | 2009-08-06 |
Low Decomposition Storage of a Tantalum Precursor
App 20090163732 - Stafford; Nathan ; et al. | 2009-06-25 |
Precursor for film formation and method for forming ruthenium-containing film
Grant 7,544,389 - Dussarrat , et al. June 9, 2 | 2009-06-09 |
Neutral Ligand Containing Precursors And Methods For Deposition Of A Metal Containing Film
App 20090104375 - Dussarrat; Christian ; et al. | 2009-04-23 |
Tellurium Precursors For Gst Deposition
App 20090074652 - DUSSARRAT; Christian | 2009-03-19 |
Method Of Forming Silicon-containing Films
App 20090075490 - DUSSARRAT; Christian | 2009-03-19 |
Cobalt Precursors For Semiconductor Applications
App 20090029036 - DUSSARRAT; Christian | 2009-01-29 |
Ruthenium Precursor With Two Differing Ligands For Use In Semiconductor Applications
App 20090028745 - Gatineau; Julien ; et al. | 2009-01-29 |
Method for forming dielectric or metallic films
Grant 7,482,286 - Misra , et al. January 27, 2 | 2009-01-27 |
New Metal Precursors For Semiconductor Applications
App 20080311746 - DUSSARRAT; Christian | 2008-12-18 |
Deposition Of Ta- Or Nb-doped High-k Films
App 20080286983 - DUSSARRAT; Christian | 2008-11-20 |
Deposition Of Transition Metal Carbide Containing Films
App 20080268642 - Yanagita; Kazutaka ; et al. | 2008-10-30 |
Method for Producing Silicon Nitride Films
App 20080260969 - Dussarrat; Christian ; et al. | 2008-10-23 |
Method For The Recycling And Purification Of An Inorganic Metallic Precursor
App 20080253948 - GATINEAU; Julien ; et al. | 2008-10-16 |
Method For The Deposition Of A Ruthenium Containing Film With Aryl And Diene Containing Complexes
App 20080152793 - Gatineau; Julien ; et al. | 2008-06-26 |
Method for Cleaning Film-Forming Apparatuses
App 20080121249 - Gatineau; Julien ; et al. | 2008-05-29 |
Precursors Having Open Ligands For Ruthenium Containing Films Deposition
App 20080107812 - DUSSARRAT; Christian ; et al. | 2008-05-08 |
Method for producing silicon nitride films and process for fabricating semiconductor devices using said method
Grant 7,351,670 - Hoshi , et al. April 1, 2 | 2008-04-01 |
Precursor For Film Formation And Method For Forming Ruthenium-Containing Film
App 20080038465 - Dussarrat; Christian ; et al. | 2008-02-14 |
Method for forming dielectric or metallic films
App 20070190807 - Misra; Ashutosh ; et al. | 2007-08-16 |
Method for producing silicon nitride films and silicon oxynitride films by chemical vapor deposition
App 20070160774 - Tsukada; Eri ; et al. | 2007-07-12 |
Methods For Producing Silicon Nitride Films And Silicon Oxynitride Films By Thermal Chemical Vapor Deposition
App 20070134433 - DUSSARRAT; Christian ; et al. | 2007-06-14 |
Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition
Grant 7,192,626 - Dussarrat , et al. March 20, 2 | 2007-03-20 |
Methods for producing silicon nitride films by vapor-phase growth
App 20060198958 - Dussarrat; Christian ; et al. | 2006-09-07 |
Hexakis(monohydrocarbylamino)disilanes and method for the preparation thereof
Grant 7,064,083 - Dussarrat , et al. June 20, 2 | 2006-06-20 |
Hexakis(monohydrocarbylamino) disilanes and method for the preparation thereof
Grant 7,019,159 - Dussarrat , et al. March 28, 2 | 2006-03-28 |
Hexakis(monohydrocarbylamino)disilanes and method for the preparation thereof
App 20060030724 - Dussarrat; Christian ; et al. | 2006-02-09 |
Methods for producing ruthenium film and ruthenium oxide film
App 20050238808 - Gatineau, Julien ; et al. | 2005-10-27 |
Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition
Grant 6,936,548 - Dussarrat , et al. August 30, 2 | 2005-08-30 |
Method for producing silicon nitride films and process for fabricating semiconductor devices using said method
App 20050158983 - Hoshi, Takeshi ; et al. | 2005-07-21 |
Hexakis(monohydrocarbylamino) disilanes and method for the preparation thereof
App 20050107627 - Dussarrat, Christian ; et al. | 2005-05-19 |
Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition
App 20050100670 - Dussarrat, Christian ; et al. | 2005-05-12 |
Method for the fabrication of silicon nitride, silicon oxynitride, and silicon oxide films by chemical vapor deposition
App 20050048204 - Dussarrat, Christian ; et al. | 2005-03-03 |
Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition
App 20050037627 - Dussarrat, Christian ; et al. | 2005-02-17 |
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