loadpatents
name:-0.027373075485229
name:-0.030121088027954
name:-0.0055661201477051
Dubois; Geraud Jean-Michel Patent Filings

Dubois; Geraud Jean-Michel

Patent Applications and Registrations

Patent applications and USPTO patent grants for Dubois; Geraud Jean-Michel.The latest application filed is for "implementing the post-porosity plasma protection (p4) process using i-cvd".

Company Profile
4.32.27
  • Dubois; Geraud Jean-Michel - Redwood City CA
  • Dubois; Geraud Jean-Michel - Los Altos CA
  • Dubois; Geraud Jean-Michel - San Jose CA US
  • - Los Gatos CA US
  • Dubois; Geraud Jean-Michel - Los Gatos CA US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Implementing the post-porosity plasma protection (P4) process using I-CVD
Grant 11,371,143 - Lionti , et al. June 28, 2
2022-06-28
Implementing The Post-porosity Plasma Protection (p4) Process Using I-cvd
App 20200378001 - Lionti; Krystelle ;   et al.
2020-12-03
In-situ hardmask generation
Grant 9,058,983 - Dubois , et al. June 16, 2
2015-06-16
Overburden removal for pore fill integration approach
Grant 8,927,430 - Bruce , et al. January 6, 2
2015-01-06
In-situ Hardmask Generation
App 20140367356 - Dubois; Geraud Jean-Michel ;   et al.
2014-12-18
Reduction of pore fill material dewetting
Grant 8,871,632 - Dubois , et al. October 28, 2
2014-10-28
Homogeneous modification of porous films
Grant 8,828,489 - Dubois , et al. September 9, 2
2014-09-09
Semiconductor interconnect structure having enhanced performance and reliability
Grant 8,648,465 - Cabral, Jr. , et al. February 11, 2
2014-02-11
Homogeneous porous low dielectric constant materials
Grant 8,623,741 - Purushothaman , et al. January 7, 2
2014-01-07
Poly-oxycarbosilane compositions for use in imprint lithography
Grant 08617786 -
2013-12-31
Poly-oxycarbosilane compositions for use in imprint lithography
Grant 8,617,786 - Dipietro , et al. December 31, 2
2013-12-31
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials
Grant 8,603,584 - Allen , et al. December 10, 2
2013-12-10
Reduction of pore fill material dewetting
Grant 8,541,301 - Dubois , et al. September 24, 2
2013-09-24
Homogeneous porous low dielectric constant materials
Grant 8,492,239 - Bruce , et al. July 23, 2
2013-07-23
Semiconductor Interconnect Structure Having Enhanced Performance And Reliability
App 20130075908 - Cabral, JR.; Cyril ;   et al.
2013-03-28
Nanoporous media with lamellar structures
Grant 8,389,589 - Cha , et al. March 5, 2
2013-03-05
Homogeneous Modification Of Porous Films
App 20130045337 - DUBOIS; GERAUD JEAN-MICHEL ;   et al.
2013-02-21
Reduction Of Pore Fill Material Dewetting
App 20130045608 - Dubois; Geraud Jean-Michel ;   et al.
2013-02-21
Reduction Of Pore Fill Material Dewetting
App 20130017688 - Dubois; Geraud Jean-Michel ;   et al.
2013-01-17
Overburden Removal For Pore Fill Integration Approach
App 20130017682 - Bruce; Robert L. ;   et al.
2013-01-17
Homogeneous Porous Low Dielectric Constant Materials
App 20120329273 - Bruce; Robert L. ;   et al.
2012-12-27
Homogeneous porous low dielectric constant materials
Grant 8,314,005 - Purushothaman , et al. November 20, 2
2012-11-20
Homogeneous Porous Low Dielectric Constant Materials
App 20120282784 - Purushothaman; Sampath ;   et al.
2012-11-08
Nanoporous media templated from unsymmetrical amphiphilic porogens
Grant 8,268,903 - Dubois , et al. September 18, 2
2012-09-18
Polyhedral Oligomeric Silsesquioxane Based Imprint Materials And Imprint Process Using Polyhedral Oligomeric Silsesquioxane Based Imprint Materials
App 20110256713 - Allen; Robert David ;   et al.
2011-10-20
Nanoporous Media Templated from Unsymmetrical Amphiphilic Porogens
App 20110245418 - Dubois; Geraud Jean-Michel ;   et al.
2011-10-06
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials
Grant 8,026,293 - Allen , et al. September 27, 2
2011-09-27
Homogeneous Porous Low Dielectric Constant Materials
App 20110183525 - Purushothaman; Sampath ;   et al.
2011-07-28
Nanoporous media templated from unsymmetrical amphiphilic porogens
Grant 7,960,442 - Cha , et al. June 14, 2
2011-06-14
Poly-oxycarbosilane Compositions For Use In Imprint Lithography
App 20110136928 - Dipietro; Richard Anthony ;   et al.
2011-06-09
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures
Grant 7,931,829 - Dubois , et al. April 26, 2
2011-04-26
Method of step-and-flash imprint lithography
Grant 7,927,664 - Dipietro , et al. April 19, 2
2011-04-19
Photopatternable dielectric materials for BEOL applications and methods for use
Grant 7,919,225 - Allen , et al. April 5, 2
2011-04-05
Low-k Interlevel Dielectric Materials And Method Of Forming Low-k Interlevel Dielectric Layers And Structures
App 20100311895 - Dubois; Geraud Jean-Michel ;   et al.
2010-12-09
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures
Grant 7,820,242 - Dubois , et al. October 26, 2
2010-10-26
Nanoporous Media with Lamellar Structures
App 20100055307 - Cha; Jennifer Nam ;   et al.
2010-03-04
Photopatternable Dielectric Materials For Beol Applications And Methods For Use
App 20090291389 - Allen; Robert D. ;   et al.
2009-11-26
Nanoporous media with lamellar structures
Grant 7,482,389 - Cha , et al. January 27, 2
2009-01-27
Imprint process using polyhedral oligomeric silsesquioxane based imprint materials
Grant 7,468,330 - Allen , et al. December 23, 2
2008-12-23
Method of forming low-K interlevel dielectric layers and structures
Grant 7,459,183 - Dubois , et al. December 2, 2
2008-12-02
Low-k Interlevel Dielectric Materials And Method Of Forming Low-k Interlevel Dielectric Layers And Structures
App 20080171136 - Dubois; Geraud Jean-Michel ;   et al.
2008-07-17
Polyhedral Oligomeric Silsesquioxane Based Imprint Materials And Imprint Process Using Polyhedral Oligomeric Silsesquioxane Based Imprint Materials
App 20080166871 - Allen; Robert David ;   et al.
2008-07-10
Compositions Comprising Poly-oxycarbosilane and Methods for Their Use in Imprint Lithography
App 20080050530 - Dipietro; Richard Anthony ;   et al.
2008-02-28
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials
App 20070238317 - Allen; Robert David ;   et al.
2007-10-11
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures
App 20070023870 - Dubois; Geraud Jean-Michel ;   et al.
2007-02-01
Nanoporous media with lamellar structures
App 20060240240 - Cha; Jennifer Nam ;   et al.
2006-10-26
Nanoporous media templated from unsymmetrical amphiphilic porogens
App 20060241194 - Cha; Jennifer Nam ;   et al.
2006-10-26

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