Du; Yao Jun
Patent Applications and Registrations
Patent applications and USPTO patent grants for Du; Yao Jun.The latest application filed is for "photolithography process and photolithography apparatus".
- Du; Yao Jun - Shanghai CN
| Patent | Date |
|---|---|
| Photolithography process and photolithography apparatus Grant 10,908,495 - Du , et al. February 2, 2 | 2021-02-02 |
| Method for correcting target patterns and mask having corrected target patterns Grant 10,423,062 - Du , et al. Sept | 2019-09-24 |
| Mask pattern correction method Grant 10,423,063 - Du , et al. Sept | 2019-09-24 |
| Photolithography Process And Photolithography Apparatus App 20190064655 - DU; Yao Jun ; et al. | 2019-02-28 |
| Mask Pattern Correction Method App 20180203342 - DU; Yao Jun ; et al. | 2018-07-19 |
| Method For Correcting Target Patterns And Mask Having Corrected Target Patterns App 20180059533 - DU; Yao Jun ; et al. | 2018-03-01 |
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