| Patent | Date |
|---|
Systems And Methods For Compensating For Rf Power Loss
App 20220238307 - Evans; Mathew Dennis ; et al. | 2022-07-28 |
Systems And Methods For Multi-level Pulsing In Rf Plasma Tools
App 20220216038 - Wu; Ying ; et al. | 2022-07-07 |
Electrostatic Chuck With Spatially Tunable Rf Coupling To A Wafer
App 20220199378 - DREWERY; John | 2022-06-23 |
Automated Process Module Ring Positioning And Replacement
App 20220122878 - Wu; Joanna ; et al. | 2022-04-21 |
Integrated Atomic Layer Passivation In Tcp Etch Chamber And In-situ Etch-alp Method
App 20210287909 - Zhou; Xiang ; et al. | 2021-09-16 |
Methods and systems for advanced ion control for etching processes
Grant 11,049,726 - Tan , et al. June 29, 2 | 2021-06-29 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20210193474 - Tan; Zhongkui ; et al. | 2021-06-24 |
Gas delivery system
Grant 10,957,561 - Drewery , et al. March 23, 2 | 2021-03-23 |
Integrated atomic layer passivation in TCP etch chamber and in-situ etch-ALP method
Grant 10,950,454 - Zhou , et al. March 16, 2 | 2021-03-16 |
Methods and systems for advanced ion control for etching processes
Grant 10,943,789 - Tan , et al. March 9, 2 | 2021-03-09 |
Air Cooled Faraday Shield and Methods for Using the Same
App 20200318852 - Sriraman; Saravanapriyan ; et al. | 2020-10-08 |
RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate support
Grant 10,784,083 - Long , et al. Sept | 2020-09-22 |
Air cooled faraday shield and methods for using the same
Grant 10,690,374 - Sriraman , et al. | 2020-06-23 |
Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate
Grant 10,679,825 - Wu , et al. | 2020-06-09 |
Systems and Methods for Applying Frequency and Match Tuning in a Non-Overlapping Manner for Processing Substrate
App 20190148114 - Wu; Ying ; et al. | 2019-05-16 |
Rf Voltage Sensor Incorporating Multiple Voltage Dividers For Detecting Rf Voltages At A Pickup Device Of A Substrate Support
App 20190051497 - Long; Maolin ; et al. | 2019-02-14 |
Integrated Atomic Layer Passivation In Tcp Etch Chamber And In-situ Etch-alp Method
App 20190043728 - Zhou; Xiang ; et al. | 2019-02-07 |
Hollow RF feed with coaxial DC power feed
Grant 10,153,136 - Augustino , et al. Dec | 2018-12-11 |
Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systems
Grant 10,121,641 - Long , et al. November 6, 2 | 2018-11-06 |
Air Cooled Faraday Shield and Methods for Using the Same
App 20180156489 - Sriraman; Saravanapriyan ; et al. | 2018-06-07 |
Time multiplexed chemical delivery system
Grant 9,934,956 - Drewery April 3, 2 | 2018-04-03 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20180090334 - Tan; Zhongkui ; et al. | 2018-03-29 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20180076045 - Tan; Zhongkui ; et al. | 2018-03-15 |
Air cooled faraday shield and methods for using the same
Grant 9,885,493 - Sriraman , et al. February 6, 2 | 2018-02-06 |
Systems and Methods for Reverse Pulsing
App 20170372912 - Long; Maolin ; et al. | 2017-12-28 |
Methods and systems for advanced ion control for etching processes
Grant 9,824,896 - Tan , et al. November 21, 2 | 2017-11-21 |
Systems and methods for reverse pulsing
Grant 9,761,459 - Long , et al. September 12, 2 | 2017-09-12 |
Methods and Systems for Advanced Ion Control for Etching Processes
App 20170125260 - Tan; Zhongkui ; et al. | 2017-05-04 |
Systems and methods for reverse pulsing
Grant 9,583,357 - Long , et al. February 28, 2 | 2017-02-28 |
Systems And Methods For Reverse Pulsing
App 20170040176 - Long; Maolin ; et al. | 2017-02-09 |
Systems And Methods For Reverse Pulsing
App 20170040174 - Long; Maolin ; et al. | 2017-02-09 |
Hollow Rf Feed With Coaxial Dc Power Feed
App 20170040148 - Augustino; Jason ; et al. | 2017-02-09 |
Time Multiplexed Chemical Delivery System
App 20170031370 - Drewery; John | 2017-02-02 |
Gas Delivery System
App 20170032982 - Drewery; John ; et al. | 2017-02-02 |
Large Dynamic Range Rf Voltage Sensor And Method For Voltage Mode Rf Bias Application Of Plasma Processing Systems
App 20160358755 - Long; Maolin ; et al. | 2016-12-08 |
Internal Faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer TCP coil
Grant 9,490,106 - Drewery , et al. November 8, 2 | 2016-11-08 |
Faraday Shield Having Plasma Density Decoupling Structure Between TCP Coil Zones
App 20160163569 - Long; Maolin ; et al. | 2016-06-09 |
Track and hold feedback control of pulsed RF
Grant 9,336,901 - Drewery May 10, 2 | 2016-05-10 |
Track And Hold Feedback Control Of Pulsed Rf
App 20150262704 - Drewery; John | 2015-09-17 |
Substrate clamping system and method for operating the same
Grant 9,076,831 - Drewery July 7, 2 | 2015-07-07 |
Air Cooled Faraday Shield and Methods for Using the Same
App 20150020969 - Sriraman; Saravanapriyan ; et al. | 2015-01-22 |
Methods And Apparatus For Dielectric Deposition
App 20140302689 - Ashtiani; Kaihan ; et al. | 2014-10-09 |
Gap fill integration
Grant 8,728,958 - Ashtiani , et al. May 20, 2 | 2014-05-20 |
Faraday Shield Having Plasma Density Decoupling Structure Between TCP Coil Zones
App 20130186568 - Long; Maolin ; et al. | 2013-07-25 |
Substrate Clamping System and Method for Operating the Same
App 20130114181 - Drewery; John | 2013-05-09 |
Internal Faraday Shield Having Distributed Chevron Patterns and Correlated Positioning Relative to External Inner and Outer TCP Coil
App 20120273130 - Drewery; John ; et al. | 2012-11-01 |
Novel Gap Fill Integration
App 20110151678 - Ashtiani; Kaihan ; et al. | 2011-06-23 |
Selective electrochemical accelerator removal
Grant 7,799,200 - Mayer , et al. September 21, 2 | 2010-09-21 |
Conductive planarization assembly for electrochemical mechanical planarization of a work piece
Grant 7,695,597 - Drewery , et al. April 13, 2 | 2010-04-13 |
Method for enhancing the nucleation and morphology of ruthenium films on dielectric substrates using amine containing compounds
Grant 7,456,101 - Gopinath , et al. November 25, 2 | 2008-11-25 |
Conductive contacts and methods for fabricating conductive contacts for elctrochemical planarization of a work piece
Grant 7,391,086 - Drewery , et al. June 24, 2 | 2008-06-24 |
Methods for the electrochemical deposition of copper onto a barrier layer of a work piece
Grant 7,341,946 - Kailasam , et al. March 11, 2 | 2008-03-11 |
Method for enhancing the nucleation and morphology of ruthenium films on dielectric substrates using amine containing compounds
Grant 7,211,509 - Gopinath , et al. May 1, 2 | 2007-05-01 |
Methods for the electrochemical deposition of copper onto a barrier layer of a work piece
App 20050098440 - Kailasam, Sridhar K. ; et al. | 2005-05-12 |
Inductively-coupled plasma processing system
Grant 6,652,711 - Brcka , et al. November 25, 2 | 2003-11-25 |
Electrostatic control of deposition of, and etching by, ionized materials in semiconductor processing
Grant 6,620,736 - Drewery September 16, 2 | 2003-09-16 |
RF bias control in plasma deposition and etch systems with multiple RF power sources
Grant 6,537,421 - Drewery March 25, 2 | 2003-03-25 |
Electrostatic control of deposition of, and etching by, ionized materials in semiconductor processing
App 20030019582 - Drewery, John | 2003-01-30 |
Rf Bias Control In Plasma Deposition And Etch Systems With Multiple Rf Power Sources
App 20030019581 - Drewery, John | 2003-01-30 |
Inductively-coupled plasma processing system
App 20020185229 - Brcka, Jozef ; et al. | 2002-12-12 |
Immersed inductively--coupled plasma source
Grant 6,417,626 - Brcka , et al. July 9, 2 | 2002-07-09 |
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