Draeger; Nerissa
Patent Applications and Registrations
Patent applications and USPTO patent grants for Draeger; Nerissa.The latest application filed is for "selective atomic layer etching".
- Draeger; Nerissa - Fremont CA
- Draeger; Nerissa - Milpitas CA
| Patent | Date |
|---|---|
| Selective atomic layer etching Grant 10,847,375 - Wang , et al. November 24, 2 | 2020-11-24 |
| Selective Atomic Layer Etching App 20190393046 - WANG; Chia-Chun ; et al. | 2019-12-26 |
| Atomic layer etching of metal oxide Grant 10,354,887 - Fischer , et al. July 16, 2 | 2019-07-16 |
| Atomic Layer Etching Of Metal Oxide App 20190096690 - FISCHER; Andreas ; et al. | 2019-03-28 |
| Treatment for flowable dielectric deposition on substrate surfaces Grant 9,847,222 - Reilly , et al. December 19, 2 | 2017-12-19 |
| Dielectric repair for emerging memory devices Grant 9,627,608 - Draeger , et al. April 18, 2 | 2017-04-18 |
| Flowable oxide film with tunable wet etch rate Grant 9,299,559 - Draeger , et al. March 29, 2 | 2016-03-29 |
| Dielectric Repair For Emerging Memory Devices App 20160079521 - Draeger; Nerissa ; et al. | 2016-03-17 |
| Coverage Of High Aspect Ratio Features Using Spin-on Dielectric Through A Wetted Surface Without A Prior Drying Step App 20160042945 - Limary; Ratchana ; et al. | 2016-02-11 |
| CVD flowable gap fill Grant 9,257,302 - Wang , et al. February 9, 2 | 2016-02-09 |
| Flowable oxide deposition using rapid delivery of process gases Grant 9,064,684 - Mui , et al. June 23, 2 | 2015-06-23 |
| Atomic Layer Removal Process With Higher Etch Amount App 20150118848 - Draeger; Nerissa ; et al. | 2015-04-30 |
| Methods And Apparatus For Forming Flowable Dielectric Films Having Low Porosity App 20150118863 - Rathod; Megha ; et al. | 2015-04-30 |
| Treatment For Flowable Dielectric Deposition On Substrate Surfaces App 20150118862 - Reilly; Patrick ; et al. | 2015-04-30 |
| Flowable Oxide Film With Tunable Wet Etch Rate App 20150044882 - Draeger; Nerissa ; et al. | 2015-02-12 |
| Methods And Apparatus For Dielectric Deposition App 20140302689 - Ashtiani; Kaihan ; et al. | 2014-10-09 |
| Flowable oxide film with tunable wet etch rate Grant 8,846,536 - Draeger , et al. September 30, 2 | 2014-09-30 |
| Gap fill integration Grant 8,728,958 - Ashtiani , et al. May 20, 2 | 2014-05-20 |
| Premetal dielectric integration process Grant 8,685,867 - Danek , et al. April 1, 2 | 2014-04-01 |
| Flowable Oxide Film With Tunable Wet Etch Rate App 20130230987 - Draeger; Nerissa ; et al. | 2013-09-05 |
| Selective capping of copper Grant 8,278,216 - Alers , et al. October 2, 2 | 2012-10-02 |
| Bottom Up Fill In High Aspect Ratio Trenches App 20120149213 - Nittala; Lakshminarayana ; et al. | 2012-06-14 |
| CVD flowable gap fill Grant 8,187,951 - Wang , et al. May 29, 2 | 2012-05-29 |
| Atomic layer removal process with higher etch amount Grant 8,058,179 - Draeger , et al. November 15, 2 | 2011-11-15 |
| Novel Gap Fill Integration App 20110151678 - Ashtiani; Kaihan ; et al. | 2011-06-23 |
| CVD flowable gap fill Grant 7,629,227 - Wang , et al. December 8, 2 | 2009-12-08 |
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