| Patent | Date |
|---|
Method of controlling ion energy distribution using a pulse generator
Grant 11,284,500 - Dorf , et al. March 22, 2 | 2022-03-22 |
Plasma Processing Assembly Using Pulsed-voltage And Radio-frequency Power
App 20220037119 - DORF; Leonid ; et al. | 2022-02-03 |
Plasma Processing Using Pulsed-voltage And Radio-frequency Power
App 20220037121 - DORF; Leonid ; et al. | 2022-02-03 |
Pulsed-voltage Hardware Assembly For Use In A Plasma Processing System
App 20220037120 - DORF; Leonid ; et al. | 2022-02-03 |
Creating Ion Energy Distribution Functions (iedf)
App 20210343496 - DORF; LEONID ; et al. | 2021-11-04 |
Symmetric Vhf Source For A Plasma Reactor
App 20210313147 - Ramaswamy; Kartik ; et al. | 2021-10-07 |
Ion-ion plasma atomic layer etch process
Grant 11,101,113 - Collins , et al. August 24, 2 | 2021-08-24 |
Apparatus And Method For Controlling Edge Ring Variation
App 20210254957 - GHANTASALA; Sathyendra ; et al. | 2021-08-19 |
Creating ion energy distribution functions (IEDF)
Grant 11,069,504 - Dorf , et al. July 20, 2 | 2021-07-20 |
Methods And Apparatus For Processing A Substrate
App 20210193438 - DORF; Leonid ; et al. | 2021-06-24 |
Symmetric VHF source for a plasma reactor
Grant 11,043,361 - Ramaswamy , et al. June 22, 2 | 2021-06-22 |
System For Tunable Workpiece Biasing In A Plasma Reactor
App 20210134561 - KOH; Travis ; et al. | 2021-05-06 |
Adjustable extended electrode for edge uniformity control
Grant 10,991,556 - Luere , et al. April 27, 2 | 2021-04-27 |
Apparatus and method of generating a pulsed waveform
Grant 10,923,321 - Dorf , et al. February 16, 2 | 2021-02-16 |
System for tunable workpiece biasing in a plasma reactor
Grant 10,923,320 - Koh , et al. February 16, 2 | 2021-02-16 |
Apparatus and method of forming plasma using a pulsed waveform
Grant 10,916,408 - Dorf , et al. February 9, 2 | 2021-02-09 |
Method Of Controlling Ion Energy Distribution Using A Pulse Generator
App 20200352017 - DORF; Leonid ; et al. | 2020-11-05 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,791,617 - Dorf , et al. September 29, 2 | 2020-09-29 |
Creating Ion Energy Distribution Functions (iedf)
App 20200266022 - DORF; LEONID ; et al. | 2020-08-20 |
High Voltage Filter Assembly
App 20200243303 - MISHRA; Anurag Kumar ; et al. | 2020-07-30 |
Apparatus And Method Of Forming Plasma Using A Pulsed Waveform
App 20200234923 - DORF; Leonid ; et al. | 2020-07-23 |
Feedback loop for controlling a pulsed voltage waveform
App 20200234921 - DORF; Leonid ; et al. | 2020-07-23 |
Apparatus And Method Of Generating A Pulsed Waveform
App 20200234922 - DORF; Leonid ; et al. | 2020-07-23 |
Creating ion energy distribution functions (IEDF)
Grant 10,685,807 - Dorf , et al. | 2020-06-16 |
Automatic Esc Bias Compensation When Using Pulsed Dc Bias
App 20200161155 - ROGERS; James ; et al. | 2020-05-21 |
Method Of Controlling Ion Energy Distribution Using A Pulse Generator With A Current-return Output Stage
App 20200154556 - DORF; Leonid ; et al. | 2020-05-14 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20200118798 - LUERE; Olivier ; et al. | 2020-04-16 |
Adjustable extended electrode for edge uniformity control
Grant 10,553,404 - Luere , et al. Fe | 2020-02-04 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,555,412 - Dorf , et al. Fe | 2020-02-04 |
Ion-ion Plasma Atomic Layer Etch Process
App 20200035454 - Collins; Kenneth S. ; et al. | 2020-01-30 |
Adjustable extended electrode for edge uniformity control
Grant 10,504,702 - Luere , et al. Dec | 2019-12-10 |
Method Of Controlling Ion Energy Distribution Using A Pulse Generator With A Current-return Output Stage
App 20190350072 - DORF; Leonid ; et al. | 2019-11-14 |
System For Tunable Workpiece Biasing In A Plasma Reactor
App 20190348258 - KOH; TRAVIS ; et al. | 2019-11-14 |
Ion-ion plasma atomic layer etch process and reactor
Grant 10,475,626 - Collins , et al. Nov | 2019-11-12 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,448,494 - Dorf , et al. Oc | 2019-10-15 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,448,495 - Dorf , et al. Oc | 2019-10-15 |
Creating Ion Energy Distribution Functions (iedf)
App 20190259562 - DORF; LEONID ; et al. | 2019-08-22 |
System for tunable workpiece biasing in a plasma reactor
Grant 10,373,804 - Koh , et al. | 2019-08-06 |
Processing With Powered Edge Ring
App 20190228952 - DORF; Leonid ; et al. | 2019-07-25 |
Creating ion energy distribution functions (IEDF)
Grant 10,312,048 - Dorf , et al. | 2019-06-04 |
Plasma Reactor Having Radial Struts for Substrate Support
App 20190085467 - Nguyen; Andrew ; et al. | 2019-03-21 |
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow
Grant 10,131,994 - Nguyen , et al. November 20, 2 | 2018-11-20 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20180315583 - LUERE; Olivier ; et al. | 2018-11-01 |
Adjustable extended electrode for edge uniformity control
Grant 10,103,010 - Luere , et al. October 16, 2 | 2018-10-16 |
Ion-ion Plasma Atomic Layer Etch Process And Reactor
App 20180261429 - Collins; Kenneth S. ; et al. | 2018-09-13 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20180233334 - LUERE; Olivier ; et al. | 2018-08-16 |
System For Tunable Workpiece Biasing In A Plasma Reactor
App 20180226225 - KOH; TRAVIS ; et al. | 2018-08-09 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20180218933 - LUERE; Olivier ; et al. | 2018-08-02 |
Creating Ion Energy Distribution Functions (iedf)
App 20180166249 - DORF; Leonid ; et al. | 2018-06-14 |
Adjustable extended electrode for edge uniformity control
Grant 9,947,517 - Luere , et al. April 17, 2 | 2018-04-17 |
Symmetric VHF Source for a Plasma Reactor
App 20180053630 - Ramaswamy; Kartik ; et al. | 2018-02-22 |
Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching
App 20180053631 - Dorf; Leonid ; et al. | 2018-02-22 |
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure
Grant 9,896,769 - Nguyen , et al. February 20, 2 | 2018-02-20 |
Systems And Methods For Controlling A Voltage Waveform At A Substrate During Plasma Processing
App 20170358431 - DORF; LEONID ; et al. | 2017-12-14 |
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow Chamber
App 20170350017 - Nguyen; Andrew ; et al. | 2017-12-07 |
Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting Structure
App 20170350018 - Nguyen; Andrew ; et al. | 2017-12-07 |
Symmetric VHF source for a plasma reactor
Grant 9,824,862 - Ramaswamy , et al. November 21, 2 | 2017-11-21 |
Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
Grant 9,799,491 - Dorf , et al. October 24, 2 | 2017-10-24 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber
Grant 9,745,663 - Nguyen , et al. August 29, 2 | 2017-08-29 |
Electron beam plasma source with reduced metal contamination
Grant 9,721,760 - Dorf , et al. August 1, 2 | 2017-08-01 |
Uniform Low Electron Temperature Plasma Source With Reduced Wafer Charging And Independent Control Over Radical Composition
App 20170140900 - Dorf; Leonid ; et al. | 2017-05-18 |
Low Electron Temperature Etch Chamber With Independent Control Over Plasma Density, Radical Composition And Ion Energy For Atomic Precision Etching
App 20170125217 - Dorf; Leonid ; et al. | 2017-05-04 |
Electron beam plasma source with remote radical source
Grant 9,564,297 - Wu , et al. February 7, 2 | 2017-02-07 |
Ion-ion Plasma Atomic Layer Etch Process And Reactor
App 20160276134 - Collins; Kenneth S. ; et al. | 2016-09-22 |
Electron beam plasma source with segmented suppression electrode for uniform plasma generation
Grant 9,443,700 - Dorf , et al. September 13, 2 | 2016-09-13 |
Interface treatment of semiconductor surfaces with high density low energy plasma
Grant 9,378,941 - Nainani , et al. June 28, 2 | 2016-06-28 |
Plasma reactor with electron beam plasma source having a uniform magnetic field
Grant 9,269,546 - Wu , et al. February 23, 2 | 2016-02-23 |
Electron Beam Plasma Source With Rotating Cathode, Backside Heliumcooling And Liquid Cooled Pedestal For Uniform Plasma Generation
App 20160042961 - Dorf; Leonid ; et al. | 2016-02-11 |
Feol Low-k Spacers
App 20160005833 - Collins; Kenneth S. ; et al. | 2016-01-07 |
Photoresist treatment method by low bombardment plasma
Grant 9,177,824 - Wu , et al. November 3, 2 | 2015-11-03 |
Electron beam plasma source with arrayed plasma sources for uniform plasma generation
Grant 9,129,777 - Dorf , et al. September 8, 2 | 2015-09-08 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
Grant 9,111,722 - Dorf , et al. August 18, 2 | 2015-08-18 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
Grant 9,082,591 - Dorf , et al. July 14, 2 | 2015-07-14 |
Interface Treatment Of Semiconductor Surfaces With High Density Low Energy Plasma
App 20150093862 - Nainani; Aneesh ; et al. | 2015-04-02 |
Symmetric Vhf Source For A Plasma Reactor
App 20150075719 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Electron beam plasma source with segmented beam dump for uniform plasma generation
Grant 8,951,384 - Dorf , et al. February 10, 2 | 2015-02-10 |
Symmetric VHF source for a plasma reactor
Grant 8,920,597 - Ramaswamy , et al. December 30, 2 | 2014-12-30 |
Symmetric VHF source for a plasma reactor
Grant 08920597 - | 2014-12-30 |
Photoresist Treatment Method By Low Bombardment Plasma
App 20140370708 - WU; BANQIU ; et al. | 2014-12-18 |
Charged Beam Plasma Apparatus For Photomask Manufacture Applications
App 20140356768 - WU; Banqiu ; et al. | 2014-12-04 |
Electron beam plasma source with profiled magnet shield for uniform plasma generation
Grant 8,894,805 - Bera , et al. November 25, 2 | 2014-11-25 |
Electron Beam Plasma Source With Remote Radical Source
App 20140339980 - Wu; Ming-Feng ; et al. | 2014-11-20 |
Electron Beam Plasma Source With Reduced Metal Contamination
App 20140338835 - Dorf; Leonid ; et al. | 2014-11-20 |
Electron Beam Plasma Source With Segmented Suppression Electrode For Uniform Plasma Generation
App 20140265855 - Dorf; Leonid ; et al. | 2014-09-18 |
Plasma Reactor With Electron Beam Plasma Source Having A Uniform Magnetic Field
App 20140035458 - Wu; Ming-Feng ; et al. | 2014-02-06 |
Symmetrical Inductively Coupled Plasma Source With Symmetrical Flow Chamber
App 20140020835 - Nguyen; Andrew ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Multiple Dielectric Windows And Window-supporting Structure
App 20140020837 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Plural Top Coils Over A Ceiling And An Independent Side Coil
App 20140020836 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
Three-coil Inductively Coupled Plasma Source With Individually Controlled Coil Currents From A Single Rf Power Generator
App 20130278141 - Dorf; Leonid ; et al. | 2013-10-24 |
Three-coil Inductively Coupled Plasma Source With Individually Controlled Coil Currents From A Single Rf Power Generator
App 20130278142 - Dorf; Leonid ; et al. | 2013-10-24 |
Electron Beam Plasma Source With Profiled Magnet Shield For Uniform Plasma Generation
App 20130098883 - Bera; Kallol ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Profiled Chamber Wall For Uniform Plasma Generation
App 20130098553 - Bera; Kallol ; et al. | 2013-04-25 |
E-beam Plasma Source With Profiled E-beam Extraction Grid For Uniform Plasma Generation
App 20130098552 - Dorf; Leonid ; et al. | 2013-04-25 |
Switched Electron Beam Plasma Source Array For Uniform Plasma Production
App 20130098872 - Dorf; Leonid ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Arrayed Plasma Sources For Uniform Plasma Generation
App 20130098551 - Dorf; Leonid ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Segmented Beam Dump For Uniform Plasma Generation
App 20130098882 - Dorf; Leonid ; et al. | 2013-04-25 |
Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber
Grant 8,313,664 - Chen , et al. November 20, 2 | 2012-11-20 |
Symmetric Vhf Source For A Plasma Reactor
App 20120043023 - Ramaswamy; Kartik ; et al. | 2012-02-23 |
Efficient And Accurate Method For Real-time Prediction Of The Self-bias Voltage Of A Wafer And Feedback Control Of Esc Voltage In Plasma Processing Chamber
App 20100136793 - Chen; Zhigang ; et al. | 2010-06-03 |
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