loadpatents
name:-0.0078530311584473
name:-0.0030839443206787
name:-0.00042915344238281
Doran; James E. Patent Filings

Doran; James E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Doran; James E..The latest application filed is for "identification of dies on a semiconductor wafer".

Company Profile
0.10.6
  • Doran; James E. - Ontario NY US
  • Doran; James E. - Essex Junction VT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Stitching methods using multiple microlithographic expose tools
Grant 8,728,722 - Fabinski , et al. May 20, 2
2014-05-20
Stitching methods using multiple microlithographic expose tools
Grant 8,728,713 - Fabinski , et al. May 20, 2
2014-05-20
Identification of dies on a semiconductor wafer
Grant 8,415,813 - Wang , et al. April 9, 2
2013-04-09
Identification of dies on a semiconductor wafer
Grant 8,415,175 - Wang , et al. April 9, 2
2013-04-09
Identification Of Dies On A Semiconductor Wafer
App 20120319307 - Wang; Shen ;   et al.
2012-12-20
Identification Of Dies On A Semiconductor Wafer
App 20120322271 - Wang; Shen ;   et al.
2012-12-20
Stitching Methods Using Multiple Microlithographic Expose Tools
App 20120082937 - Fabinski; Robert P. ;   et al.
2012-04-05
Mask Layer Trim Method Using Charged Particle Beam Exposure
App 20080138986 - Zhou; Lin ;   et al.
2008-06-12
Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus
Grant 6,944,578 - Bowley, Jr. , et al. September 13, 2
2005-09-13
Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus
Grant 6,917,901 - Bowley, Jr. , et al. July 12, 2
2005-07-12
Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus
App 20040267506 - Bowley, Reginald R. JR. ;   et al.
2004-12-30
Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus
App 20030158710 - Bowley, Reginald R. JR. ;   et al.
2003-08-21
Company Registrations
SEC0001214769DORAN JAMES E

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed