Donaher; J. Casey
Patent Applications and Registrations
Patent applications and USPTO patent grants for Donaher; J. Casey.The latest application filed is for "system and method for optimizing a lithography exposure process".
- Donaher; J. Casey - Westford MA
| Patent | Date |
|---|---|
| Conformal stage Grant 11,353,800 - Donaher , et al. June 7, 2 | 2022-06-07 |
| System And Method For Optimizing A Lithography Exposure Process App 20220075282 - da Silveira; Elvino ; et al. | 2022-03-10 |
| System and method for optimizing a lithography exposure process Grant 11,126,096 - Da Silveira , et al. September 21, 2 | 2021-09-21 |
| Conformal Stage App 20200401055 - DONAHER; J. Casey ; et al. | 2020-12-24 |
| Separated Axis Lithographic Tool App 20200333713 - DONAHER; J. Casey | 2020-10-22 |
| High Resolution Stage Positioner App 20200286764 - DONAHER; J. Casey | 2020-09-10 |
| System And Method For Optimizing A Lithography Exposure Process App 20200233320 - DA SILVEIRA; Elvino ; et al. | 2020-07-23 |
| Planar motor system with increased efficiency Grant 9,625,832 - Donaher , et al. April 18, 2 | 2017-04-18 |
| Planar Motor System With Increased Efficiency App 20150309425 - Donaher; J. Casey ; et al. | 2015-10-29 |
| Multiple-Blade Device for Substrate Edge Protection during Photolithography App 20150277239 - Greer; James H. ; et al. | 2015-10-01 |
| Blade for Substrate Edge Protection During Photolithography App 20150234281 - Gardner; Steven D. ; et al. | 2015-08-20 |
| System and method for estimating field curvature Grant 8,760,624 - Donaher June 24, 2 | 2014-06-24 |
| System metrology core Grant 8,395,783 - Donaher , et al. March 12, 2 | 2013-03-12 |
| System Metrology Core App 20120015461 - Donaher; J. Casey ; et al. | 2012-01-19 |
| System and Method for Estimating Field Curvature App 20120015460 - Donaher; J. Casey | 2012-01-19 |
| Alignment system for use in lithography utilizing a spherical reflector having a centered etched-on projection object Grant 5,483,345 - Donaher , et al. January 9, 1 | 1996-01-09 |
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