loadpatents
Patent applications and USPTO patent grants for DOI; Toshiro.The latest application filed is for "work processing apparatus".
Patent | Date |
---|---|
Work Processing Apparatus App 20220297223 - AIDA; Hideo ;   et al. | 2022-09-22 |
Polishing pad and polishing method Grant 9,956,669 - Doi , et al. May 1, 2 | 2018-05-01 |
Ceramic composite for light conversion and method for manufacture thereof Grant 9,543,480 - Inamori , et al. January 10, 2 | 2017-01-10 |
Polishing Pad And Polishing Method App 20160016292 - DOI; Toshiro ;   et al. | 2016-01-21 |
Ceramic Composite for Light Conversion and Method for Manufacture Thereof App 20130327985 - Inamori; Dai ;   et al. | 2013-12-12 |
Polishing Slurry For Silicon Carbide And Polishing Method Therefor App 20120240479 - Doi; Toshiro ;   et al. | 2012-09-27 |
Method and apparatus for chemical mechanical polishing Grant 7,785,175 - Doi , et al. August 31, 2 | 2010-08-31 |
Polishing apparatus and method of polishing work piece Grant 7,195,546 - Doi , et al. March 27, 2 | 2007-03-27 |
Polishing apparatus and method of polishing work piece App 20060217039 - Doi; Toshiro ;   et al. | 2006-09-28 |
Polishing apparatus and method of polishing work piece Grant 7,070,486 - Doi , et al. July 4, 2 | 2006-07-04 |
Method and apparatus for chemical and mechanical polishing Grant 6,969,308 - Doi , et al. November 29, 2 | 2005-11-29 |
Method and apparatus for chemical mechanical polishing App 20050205433 - Doi, Toshiro ;   et al. | 2005-09-22 |
Method of conditioning polishing pad for semiconductor wafer App 20050164613 - Seike, Yoshiyuki ;   et al. | 2005-07-28 |
Polishing apparatus and method of polishing work piece App 20050113007 - Doi, Toshiro ;   et al. | 2005-05-26 |
Method and apparatus for chemical and mechanical polishing App 20040009738 - Doi, Toshiro ;   et al. | 2004-01-15 |
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