loadpatents
name:-0.0064430236816406
name:-0.024466991424561
name:-0.00075888633728027
DOI; Toshiro Patent Filings

DOI; Toshiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for DOI; Toshiro.The latest application filed is for "work processing apparatus".

Company Profile
0.9.12
  • DOI; Toshiro - Fukuoka JP
  • DOI; Toshiro - Fukuoka-shi Fukuoka
  • Doi; Toshiro - Tokorozawa JP
  • Doi; Toshiro - Tokorozawa-shi JP
  • Doi; Toshiro - Saitama JP
  • Doi, Toshiro - Fujikoshi Machinery Corp. Tokorozawa-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Work Processing Apparatus
App 20220297223 - AIDA; Hideo ;   et al.
2022-09-22
Polishing pad and polishing method
Grant 9,956,669 - Doi , et al. May 1, 2
2018-05-01
Ceramic composite for light conversion and method for manufacture thereof
Grant 9,543,480 - Inamori , et al. January 10, 2
2017-01-10
Polishing Pad And Polishing Method
App 20160016292 - DOI; Toshiro ;   et al.
2016-01-21
Ceramic Composite for Light Conversion and Method for Manufacture Thereof
App 20130327985 - Inamori; Dai ;   et al.
2013-12-12
Polishing Slurry For Silicon Carbide And Polishing Method Therefor
App 20120240479 - Doi; Toshiro ;   et al.
2012-09-27
Method and apparatus for chemical mechanical polishing
Grant 7,785,175 - Doi , et al. August 31, 2
2010-08-31
Polishing apparatus and method of polishing work piece
Grant 7,195,546 - Doi , et al. March 27, 2
2007-03-27
Polishing apparatus and method of polishing work piece
App 20060217039 - Doi; Toshiro ;   et al.
2006-09-28
Polishing apparatus and method of polishing work piece
Grant 7,070,486 - Doi , et al. July 4, 2
2006-07-04
Method and apparatus for chemical and mechanical polishing
Grant 6,969,308 - Doi , et al. November 29, 2
2005-11-29
Method and apparatus for chemical mechanical polishing
App 20050205433 - Doi, Toshiro ;   et al.
2005-09-22
Method of conditioning polishing pad for semiconductor wafer
App 20050164613 - Seike, Yoshiyuki ;   et al.
2005-07-28
Polishing apparatus and method of polishing work piece
App 20050113007 - Doi, Toshiro ;   et al.
2005-05-26
Method and apparatus for chemical and mechanical polishing
App 20040009738 - Doi, Toshiro ;   et al.
2004-01-15

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