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name:-0.0027730464935303
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Doi; Atsumasa Patent Filings

Doi; Atsumasa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Doi; Atsumasa.The latest application filed is for "method for forming gas cluster and method for forming thin film".

Company Profile
0.2.5
  • Doi; Atsumasa - Gifu JP
  • Doi; Atsumasa - Ogaki JP
  • Doi, Atsumasa - Ogaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for forming gas cluster and method for forming thin film
Grant 6,797,334 - Akizuki , et al. September 28, 2
2004-09-28
Method for forming thin film with a gas cluster ion beam
Grant 6,797,339 - Akizuki , et al. September 28, 2
2004-09-28
Method for forming gas cluster and method for forming thin film
App 20040037970 - Akizuki, Makoto ;   et al.
2004-02-26
Method for forming thin film with a gas cluster ion beam
App 20030143340 - Akizuki, Makoto ;   et al.
2003-07-31
Method for forming gas cluster and method for forming thin film
App 20020068128 - Akizuki, Makoto ;   et al.
2002-06-06
Method for forming thin film with a gas cluster ion beam
App 20020015803 - Akizuki, Makoto ;   et al.
2002-02-07
Method for forming gas cluster and method for forming thin film
App 20010010835 - Akizuki, Makoto ;   et al.
2001-08-02

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