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Patent applications and USPTO patent grants for Doering; Ken.The latest application filed is for "massively parallel atomic layer deposition/chemical vapor deposition system".
Patent | Date |
---|---|
Purged heater-susceptor for an ALD/CVD reactor Grant 7,015,426 - Doering , et al. March 21, 2 | 2006-03-21 |
Massively parallel atomic layer deposition/chemical vapor deposition system App 20050281949 - Seidel, Thomas E. ;   et al. | 2005-12-22 |
Massively parallel atomic layer deposition/chemical vapor deposition system App 20050274323 - Seidel, Thomas E. ;   et al. | 2005-12-15 |
Massively parallel atomic layer deposition/chemical vapor deposition system Grant 6,902,624 - Seidel , et al. June 7, 2 | 2005-06-07 |
Methods and apparatus for cycle time improvements for atomic layer deposition App 20050016956 - Liu, Xinye ;   et al. | 2005-01-27 |
Purged heater-susceptor for an ALD/CVD reactor App 20040211764 - Doering, Ken ;   et al. | 2004-10-28 |
Systems and methods for improved gas delivery App 20040065256 - Kim, Gi Youl ;   et al. | 2004-04-08 |
Massively parallel atomic layer deposition/chemical vapor deposition system App 20030109094 - Seidel, Thomas E. ;   et al. | 2003-06-12 |
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