loadpatents
name:-0.018010854721069
name:-0.011382102966309
name:-0.0055770874023438
DOCKERY; Kevin P. Patent Filings

DOCKERY; Kevin P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for DOCKERY; Kevin P..The latest application filed is for "cmp composition including a novel abrasive".

Company Profile
6.14.16
  • DOCKERY; Kevin P. - Aurora IL
  • Dockery; Kevin P. - Rochester NY US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Cmp Composition Including A Novel Abrasive
App 20210301178 - HAINS; Alexander W. ;   et al.
2021-09-30
Derivatized Polyamino Acids
App 20210206920 - ZHANG; Na ;   et al.
2021-07-08
Surface treated abrasive particles for tungsten buff applications
Grant 11,043,151 - Cui , et al. June 22, 2
2021-06-22
Composition For Tungsten Cmp
App 20200208014 - ZHANG; Na ;   et al.
2020-07-02
Composition for tungsten CMP
Grant 10,676,647 - Zhang , et al.
2020-06-09
Tungsten buff polishing compositions with improved topography
Grant 10,647,887 - Dockery , et al.
2020-05-12
CMP compositions selective for oxide and nitride with improved dishing and pattern selectivity
Grant 10,640,679 - Pallikkara Kuttiatoor , et al.
2020-05-05
Tungsten Buff Polishing Compositions With Improved Topography
App 20190211227 - DOCKERY; Kevin P. ;   et al.
2019-07-11
Surface Treated Abrasive Particles For Tungsten Buff Applications
App 20190100677 - CUI; Ji ;   et al.
2019-04-04
Composition For Tungsten Cmp
App 20190085209 - DOCKERY; Kevin P. ;   et al.
2019-03-21
Tungsten processing slurry with catalyst
Grant 10,066,126 - Dockery , et al. September 4, 2
2018-09-04
Cmp Compositions Selective For Oxide And Nitride With Improved Dishing And Pattern Selectivity
App 20180105721 - PALLIKKARA KUTTIATOOR; Sudeep ;   et al.
2018-04-19
Tungsten Processing Slurry With Catalyst
App 20170190936 - Dockery; Kevin P. ;   et al.
2017-07-06
CMP compositions selective for oxide and nitride with high removal rate and low defectivity
Grant 8,906,252 - Dockery , et al. December 9, 2
2014-12-09
Cmp Compositions Selective For Oxide And Nitride With High Removal Rate And Low Defectivity
App 20140346140 - Dockery; Kevin P. ;   et al.
2014-11-27
Aqueous inkjet printing fluid compositions
Grant 8,485,654 - Sowinski , et al. July 16, 2
2013-07-16
Aqueous inkjet printing fluid compositions
Grant 8,459,787 - Sowinski , et al. June 11, 2
2013-06-11
Aqueous compositions with improved silicon corrosion characteristics
Grant 8,419,176 - Dockery , et al. April 16, 2
2013-04-16
Aqueous Inkjet Printing Fluid Compositions
App 20120105535 - Sowinski; Allan F. ;   et al.
2012-05-03
Aqueous Inkjet Printing Fluid Compositions
App 20120105553 - Sowinski; Allan F. ;   et al.
2012-05-03
Aqueous Compositions With Improved Silicon Corrosion Characteristics
App 20100302292 - Dockery; Kevin P. ;   et al.
2010-12-02
Measuring Etching Rates Using Low Coherence Interferometry
App 20090065478 - Dockery; Kevin P. ;   et al.
2009-03-12
Synthesis for polycyclic aromatic hydrocarbon compounds
Grant 7,368,624 - Brown , et al. May 6, 2
2008-05-06
Element for protein microarrays
Grant 7,153,896 - Dockery , et al. December 26, 2
2006-12-26
Conjugation agent
App 20060052421 - Welter; Thomas R. ;   et al.
2006-03-09
Synthesis for polycyclic aromatic hydrocarbon compounds
App 20050222417 - Brown, Christopher T. ;   et al.
2005-10-06
Element for protein microarrays
App 20050107528 - Dockery, Kevin P. ;   et al.
2005-05-19

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