Dobuzinsky, David Mark
Patent Applications and Registrations
Patent applications and USPTO patent grants for Dobuzinsky, David Mark.The latest application filed is for "dual layer hard mask for edram gate etch process".
- Dobuzinsky, David Mark - New Windsor NY
- Dobuzinsky; David Mark - Hopewell Junction NY
| Patent | Date |
|---|---|
| Dual Layer Hard Mask For Edram Gate Etch Process App 20030032269 - Dobuzinsky, David Mark ; et al. | 2003-02-13 |
| High dielectric TiO.sub.2 -SiN composite films for memory applications Grant 6,014,310 - Bronner , et al. January 11, 2 | 2000-01-11 |
| High dielectric TiO.sub.2 -SiN composite films for memory applications Grant 5,876,788 - Bronner , et al. March 2, 1 | 1999-03-02 |
| Shallow trench isolation with oxide-nitride/oxynitride liner Grant 5,763,315 - Benedict , et al. June 9, 1 | 1998-06-09 |
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