Dinger; Udo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Dinger; Udo.The latest application filed is for "radiation source and device for feeding back emitted radiation to a laser source".

Company Profile

3.48.44

Dinger; Udo - Oberkochen DE
Dinger, Udo - Aalen DE
Dinger; Udo - 73447 Oberkochen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radiation source and device for feeding back emitted radiation to a laser source Grant 11,303,092 - Dinger April 12, 2	2022-04-12
Reflective optical element for EUV lithography and method for adapting a geometry of a component Grant 11,199,780 - Dinger December 14, 2	2021-12-14
Radiation Source And Device For Feeding Back Emitted Radiation To A Laser Source App 20210167569 - Dinger; Udo	2021-06-03
Reflective Optical Element For Euv Lithography And Method For Adapting A Geometry Of A Component App 20200174378 - DINGER; Udo	2020-06-04
Lithography apparatus and method for operating a lithography apparatus Grant 10,261,424 - Dinger , et al.	2019-04-16
EUV-mirror, optical system with EUV-mirror and associated operating method Grant 9,997,268 - Dinger , et al. June 12, 2	2018-06-12
Facet mirror for use in a projection exposure apparatus for microlithography Grant 9,996,012 - Dinger , et al. June 12, 2	2018-06-12
Lithography Apparatus And Method For Operating A Lithography Apparatus App 20180107122 - Dinger; Udo ; et al.	2018-04-19
Euv-mirror, Optical System With Euv-mirror And Associated Operating Method App 20160379730 - DINGER; Udo ; et al.	2016-12-29
Facet Mirror For Use In A Projection Exposure Apparatus For Microlithography App 20160313646 - Dinger; Udo ; et al.	2016-10-27
EUV lithography system Grant 9,448,490 - Dinger , et al. September 20, 2	2016-09-20
EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method Grant 9,442,383 - Dinger , et al. September 13, 2	2016-09-13
Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and LPP X-ray source comprising a laser light source and such a beam guidance system Grant 9,444,214 - Dinger September 13, 2	2016-09-13
Facet mirror for use in a projection exposure apparatus for microlithography Grant 9,411,241 - Dinger , et al. August 9, 2	2016-08-09
EUV collector with cooling device Grant 9,007,559 - Layh , et al. April 14, 2	2015-04-14
Beam Guidance System For The Focusing Guidance Of Radiation From A High-power Laser Light Source Toward A Target And Lpp X-ray Source Comprising A Laser Light Source And Such A Beam Guidance System App 20150098072 - Dinger; Udo	2015-04-09
Substrate for mirrors for EUV lithography Grant 8,976,927 - Ekstein , et al. March 10, 2	2015-03-10
Bundle-guiding optical collector for collecting the emission of a radiation source Grant 8,934,085 - Dinger , et al. January 13, 2	2015-01-13
Euv-mirror Arrangement, Optical System With Euv-mirror Arrangement And Associated Operating Method App 20140285783 - DINGER; Udo ; et al.	2014-09-25
Projection illumination system for EUV microlithography Grant 8,710,471 - Dinger , et al. April 29, 2	2014-04-29
Illumination optics for EUV microlithography and related system and apparatus Grant 8,587,767 - Fiolka , et al. November 19, 2	2013-11-19
EUV Lithography System App 20130265560 - Dinger; Udo ; et al.	2013-10-10
Substrate For Mirrors For Euv Lithography App 20130170056 - EKSTEIN; Claudia ; et al.	2013-07-04
Method For Producing Facet Mirrors And Projection Exposure Apparatus App 20130100426 - Warm; Berndt ; et al.	2013-04-25
Optical element with multiple primary light sources Grant 8,253,927 - Dinger August 28, 2	2012-08-28
Euv Collector App 20120050703 - Layh; Michael ; et al.	2012-03-01
Illumination Optics For Euv Microlithography App 20110235015 - Dengel; Guenther ; et al.	2011-09-29
Illumination system particularly for microlithography Grant 7,977,651 - Mann , et al. July 12, 2	2011-07-12
Collector for an illumination system Grant 7,910,900 - Stuetzle , et al. March 22, 2	2011-03-22
Illumination Optics For Euv Microlithography And Related System And Apparatus App 20110063598 - Fiolka; Damian ; et al.	2011-03-17
Projection system for EUV lithography Grant RE42,118 - Hudyma , et al. February 8, 2	2011-02-08
Projection Illumination System For Euv Microlithography App 20110014799 - Dinger; Udo ; et al.	2011-01-20
Facet Mirror For Use In A Projection Exposure Apparatus For Microlithography App 20110001947 - Dinger; Udo ; et al.	2011-01-06
Illumination System For A Microlithography Projection Exposure Apparatus App 20110001948 - Dinger; Udo	2011-01-06
Bundle-guiding Optical Collector For Collecting The Emission Of A Radiation Source App 20100231882 - Dinger; Udo ; et al.	2010-09-16
Method For Producing An Optical Element Through A Molding Process, Optical Element Produced According To The Method, Collector, And Lighting System App 20100182710 - DINGER; Udo ; et al.	2010-07-22
Method For Producing Facet Mirrors And Projection Exposure Apparatus App 20100007866 - Warm; Berndt ; et al.	2010-01-14
Illumination System Particularly For Microlithography App 20090316128 - Mann; Hans-Juergen ; et al.	2009-12-24
Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm Grant 7,623,620 - Mann , et al. November 24, 2	2009-11-24
Optical Element With Multiple Primary Light Sources App 20090257040 - Dinger; Udo	2009-10-15
Illumination system particularly for microlithography Grant 7,592,598 - Mann , et al. September 22, 2	2009-09-22
Projection objective Grant 7,557,902 - Dinger , et al. July 7, 2	2009-07-07
Illumination System Particularly For Microlithography App 20090073410 - Mann; Hans-Juergen ; et al.	2009-03-19
Mirror for use in a projection exposure apparatus Grant 7,481,543 - Dinger , et al. January 27, 2	2009-01-27
Illumination System Particularly For Microlithography App 20090015812 - Schultz; Joerg ; et al.	2009-01-15
Illumination system particularly for microlithography Grant 7,456,408 - Mann , et al. November 25, 2	2008-11-25
Illumination system particularly for microlithography Grant 7,443,948 - Schultz , et al. October 28, 2	2008-10-28
Illumination system particularly for microlithography App 20080130076 - Mann; Hans-Juergen ; et al.	2008-06-05
Projection system for EUV lithography Grant 7,375,798 - Hudyma , et al. May 20, 2	2008-05-20
High-Precision Optical Surface Prepared by Sagging from a Masterpiece App 20080099935 - Egle; Wilhelm ; et al.	2008-05-01
Projection system for EUV lithography Grant 7,355,678 - Hudyma , et al. April 8, 2	2008-04-08
Illumination system particularly for microlithography Grant 7,348,565 - Mann , et al. March 25, 2	2008-03-25
Collector For An Illumination System App 20080018876 - Stuetzle; Ralf ; et al.	2008-01-24
Projection system for EUV lithograhphy App 20070153252 - Hudyma; Russell ; et al.	2007-07-05
Illumination system particularly for microlithography App 20070120072 - Mann; Hans-Juergen ; et al.	2007-05-31
Projection system for EUV lithography App 20070070322 - Hudyma; Russell ; et al.	2007-03-29
Illumination system particularly for microlithography Grant 7,186,983 - Mann , et al. March 6, 2	2007-03-06
Euv projection lens with mirrors made from material with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature App 20070035814 - Dinger; Udo ; et al.	2007-02-15
Projection system for EUV lithography Grant 7,151,592 - Hudyma , et al. December 19, 2	2006-12-19
Illumination system particularly for microlithography App 20060245540 - Schultz; Jorg ; et al.	2006-11-02
Method of manufacturing an optical element Grant 7,118,449 - Dinger , et al. October 10, 2	2006-10-10
Reflecting device for electromagnetic waves Grant 7,077,533 - Weiser , et al. July 18, 2	2006-07-18
Substrate material for X-ray optical components Grant 7,031,428 - Dinger , et al. April 18, 2	2006-04-18
Projection system for EUV lithography App 20060050258 - Hudyma; Russell ; et al.	2006-03-09
Illumination system particularly for microlithography Grant 7,006,595 - Singer , et al. February 28, 2	2006-02-28
Projection system for EUV lithography Grant 6,985,210 - Hudyma , et al. January 10, 2	2006-01-10
Reflective X-ray microscope and inspection system for examining objects with wavelengths < 100 nm App 20050201514 - Mann, Hans-Jurgen ; et al.	2005-09-15
Microlithography reduction objective and projection exposure apparatus Grant 6,902,283 - Dinger June 7, 2	2005-06-07
Illumination system particularly for microlithography App 20050088760 - Mann, Hans-Juergen ; et al.	2005-04-28
6-mirror microlithography projection objective Grant 6,867,913 - Mann , et al. March 15, 2	2005-03-15
Illumination system particularly for microlithography Grant 6,859,328 - Schultz , et al. February 22, 2	2005-02-22
Substrate material for X-ray optical components App 20040202278 - Dinger, Udo ; et al.	2004-10-14
Reflecting device for electromagnetic waves App 20040174624 - Weiser, Martin ; et al.	2004-09-09
Projection system for EUV lithography App 20040070743 - Hudyma, Russell ; et al.	2004-04-15
Microlithography reduction objective and projection exposure apparatus App 20040057134 - Dinger, Udo	2004-03-25
Optical apparatus for diffracting radiation having wavelength .ltoreq.160 nm Grant 6,700,952 - Dinger , et al. March 2, 2	2004-03-02
Microlithography reduction objective and projection exposure apparatus Grant 6,600,552 - Dinger July 29, 2	2003-07-29
Illumination system particularly for microlithography App 20030095622 - Schultz, Jorg ; et al.	2003-05-22
Illumination system particularly for microlithography App 20030086524 - Schultz, Jorg ; et al.	2003-05-08
Microlithography reduction objective and projection exposure apparatus App 20020145718 - Dinger, Udo	2002-10-10
Reduction objective for extreme ultraviolet lithography App 20020114089 - Dinger, Udo ; et al.	2002-08-22
Illumination system particularly for microlithography Grant 6,438,199 - Schultz , et al. August 20, 2	2002-08-20
6-mirror microlithography projection objective App 20020056815 - Mann, Hans-Jurgen ; et al.	2002-05-16
Microlithography reduction objective and projection exposure apparatus Grant 6,353,470 - Dinger March 5, 2	2002-03-05
Adaptronic mirror App 20020009178 - Dinger, Udo ; et al.	2002-01-24
Reduction objective for extreme ultraviolet lithography Grant 6,244,717 - Dinger June 12, 2	2001-06-12
Illumination system particularly for EUV lithography Grant 6,198,793 - Schultz , et al. March 6, 2	2001-03-06

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