Dier; Oliver

Patent Applications and Registrations

Patent applications and USPTO patent grants for Dier; Oliver.The latest application filed is for "optical system, in particular for a microlithographic projection exposure apparatus".

Company Profile

6.9.13

Dier; Oliver - Lauchheim DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus Grant 11,328,831 - Grasse , et al. May 10, 2	2022-05-10
Optical system, in particular for a microlithographic projection exposure apparatus Grant 10,520,827 - Enkisch , et al. Dec	2019-12-31
Optical System, In Particular For A Microlithographic Projection Exposure Apparatus App 20190212659 - ENKISCH; Hartmut ; et al.	2019-07-11
Mirror, in particular for a microlithographic projection exposure apparatus Grant 10,331,048 - Dier , et al.	2019-06-25
Optical Element And Optical Assembly Comprising Same App 20190064405 - GRASSE; Christian ; et al.	2019-02-28
EUV mirror and optical system comprising EUV mirror Grant 10,203,435 - Schicketanz , et al. Feb	2019-02-12
Method For Treating A Reflective Optical Element For The Euv Wavelength Range, Method For Producing Same, And Treating Apparatus App 20190035512 - Grasse; Christian ; et al.	2019-01-31
Method and arrangement for determining the heating condition of a mirror in an optical system Grant 10,161,808 - Vogt , et al. Dec	2018-12-25
Mirror, In Particular For A Microlithographic Projection Exposure Apparatus App 20180217507 - DIER; Oliver ; et al.	2018-08-02
EUV-mirror, optical system with EUV-mirror and associated operating method Grant 9,997,268 - Dinger , et al. June 12, 2	2018-06-12
Surface correction of mirrors with decoupling coating Grant 9,921,483 - Dier , et al. March 20, 2	2018-03-20
Reflective optical element, and optical system of a microlithographic projection exposure apparatus Grant 9,915,873 - Enkisch , et al. March 13, 2	2018-03-13
Euv-mirror, Optical System With Euv-mirror And Associated Operating Method App 20160379730 - DINGER; Udo ; et al.	2016-12-29
Euv Mirror And Optical System Comprising Euv Mirror App 20160327702 - SCHICKETANZ; Thomas ; et al.	2016-11-10
Reflective Optical Element, And Optical System Of A Microlithographic Projection Exposure Apparatus App 20160266499 - ENKISCH; Hartmut ; et al.	2016-09-15
EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method Grant 9,442,383 - Dinger , et al. September 13, 2	2016-09-13
Surface Correction Of Mirrors With Decoupling Coating App 20160209750 - DIER; Oliver ; et al.	2016-07-21
Optical Elements Comprising Magnetostrictive Material App 20150043060 - Huber; Peter ; et al.	2015-02-12
Euv-mirror Arrangement, Optical System With Euv-mirror Arrangement And Associated Operating Method App 20140285783 - DINGER; Udo ; et al.	2014-09-25
Method and arrangement for determining the heating condition of a mirror in an optical system App 20130230073 - Vogt; Peter ; et al.	2013-09-05
Projection Exposure Apparatus App 20130176545 - Ehm; Dirk Heinrich ; et al.	2013-07-11

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