| Patent | Date |
|---|
Lift Pin Mechanism
App 20220293452 - SULYMAN; Alexander ; et al. | 2022-09-15 |
Confinement Ring for Use in a Plasma Processing System
App 20220254614 - Dhindsa; Rajinder ; et al. | 2022-08-11 |
Wafer edge ring lifting solution
Grant 11,393,710 - Rice , et al. July 19, 2 | 2022-07-19 |
Confinement ring for use in a plasma processing system
Grant 11,342,166 - Dhindsa , et al. May 24, 2 | 2022-05-24 |
Method of controlling ion energy distribution using a pulse generator
Grant 11,284,500 - Dorf , et al. March 22, 2 | 2022-03-22 |
Pulsed-voltage Hardware Assembly For Use In A Plasma Processing System
App 20220037120 - DORF; Leonid ; et al. | 2022-02-03 |
Plasma Processing Assembly Using Pulsed-voltage And Radio-frequency Power
App 20220037119 - DORF; Leonid ; et al. | 2022-02-03 |
Plasma Processing Using Pulsed-voltage And Radio-frequency Power
App 20220037121 - DORF; Leonid ; et al. | 2022-02-03 |
Temperature and bias control of edge ring
Grant 11,232,933 - Rogers , et al. January 25, 2 | 2022-01-25 |
Rf Frequency Control And Ground Path Return In Semiconductor Process Chambers
App 20210391146 - FRANKLIN; Timothy Joseph ; et al. | 2021-12-16 |
Creating Ion Energy Distribution Functions (iedf)
App 20210343496 - DORF; LEONID ; et al. | 2021-11-04 |
Temperature And Bias Control Of Edge Ring
App 20210313156 - ROGERS; James ; et al. | 2021-10-07 |
Sheath And Temperature Control Of A Process Kit In A Substrate Processing Chamber
App 20210296098 - CHO; Jaeyong ; et al. | 2021-09-23 |
Peripheral RF feed and symmetric RF return for symmetric RF delivery
Grant 11,127,571 - Nam , et al. September 21, 2 | 2021-09-21 |
Methods And Apparatus For Conductance Liners In Semiconductor Process Chambers
App 20210285101 - FRANKLIN; TIMOTHY JOSEPH ; et al. | 2021-09-16 |
Condition Selectable Backside Gas
App 20210276056 - Prouty; Stephen D. ; et al. | 2021-09-09 |
Apparatus And Method For Controlling Edge Ring Variation
App 20210254957 - GHANTASALA; Sathyendra ; et al. | 2021-08-19 |
Creating ion energy distribution functions (IEDF)
Grant 11,069,504 - Dorf , et al. July 20, 2 | 2021-07-20 |
Universal process kit
Grant 11,049,760 - Joubert , et al. June 29, 2 | 2021-06-29 |
Methods And Apparatus For Processing A Substrate
App 20210193438 - DORF; Leonid ; et al. | 2021-06-24 |
Adjustable extended electrode for edge uniformity control
Grant 10,991,556 - Luere , et al. April 27, 2 | 2021-04-27 |
Plasma resistant coating of porous body by atomic layer deposition
Grant 10,975,469 - Firouzdor , et al. April 13, 2 | 2021-04-13 |
Apparatus and method of generating a pulsed waveform
Grant 10,923,321 - Dorf , et al. February 16, 2 | 2021-02-16 |
Apparatus and method of forming plasma using a pulsed waveform
Grant 10,916,408 - Dorf , et al. February 9, 2 | 2021-02-09 |
Temperature And Bias Control Of Edge Ring
App 20200402776 - ROGERS; James ; et al. | 2020-12-24 |
In-situ Atomic Layer Deposition Process
App 20200373149 - PARK; Sang Wook ; et al. | 2020-11-26 |
Method Of Controlling Ion Energy Distribution Using A Pulse Generator
App 20200352017 - DORF; Leonid ; et al. | 2020-11-05 |
Sensors And System For In-situ Edge Ring Erosion Monitor
App 20200335368 - PAN; Yaoling ; et al. | 2020-10-22 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,791,617 - Dorf , et al. September 29, 2 | 2020-09-29 |
Confinement Ring for Use in a Plasma Processing System
App 20200303171 - Dhindsa; Rajinder ; et al. | 2020-09-24 |
Temperature and bias control of edge ring
Grant 10,784,089 - Rogers , et al. Sept | 2020-09-22 |
Creating Ion Energy Distribution Functions (iedf)
App 20200266022 - DORF; LEONID ; et al. | 2020-08-20 |
Plasma resistant coating of porous body by atomic layer deposition
Grant 10,745,805 - Firouzdor , et al. A | 2020-08-18 |
Temperature And Bias Control Of Edge Ring
App 20200251313 - Kind Code | 2020-08-06 |
High Voltage Filter Assembly
App 20200243303 - MISHRA; Anurag Kumar ; et al. | 2020-07-30 |
Multi Zone Gas Injection Upper Electrode System
App 20200243307 - Bise; Ryan ; et al. | 2020-07-30 |
Methods for forming and etching structures for patterning processes
Grant 10,727,058 - Vidyarthi , et al. | 2020-07-28 |
Feedback loop for controlling a pulsed voltage waveform
App 20200234921 - DORF; Leonid ; et al. | 2020-07-23 |
Apparatus And Method Of Generating A Pulsed Waveform
App 20200234922 - DORF; Leonid ; et al. | 2020-07-23 |
Apparatus And Method Of Forming Plasma Using A Pulsed Waveform
App 20200234923 - DORF; Leonid ; et al. | 2020-07-23 |
Confinement ring for use in a plasma processing system
Grant 10,720,314 - Dhindsa , et al. | 2020-07-21 |
Pulsed Plasma Chamber In Dual Chamber Configuration
App 20200227237 - Marakhtanov; Alexei ; et al. | 2020-07-16 |
Integrated Cleaning Process For Substrate Etching
App 20200194242 - Zhou; Yi ; et al. | 2020-06-18 |
Creating ion energy distribution functions (IEDF)
Grant 10,685,807 - Dorf , et al. | 2020-06-16 |
Peripheral Rf Feed And Symmetric Rf Return For Symmetric Rf Delivery
App 20200161097 - Nam; Sang Ki ; et al. | 2020-05-21 |
Method Of Controlling Ion Energy Distribution Using A Pulse Generator With A Current-return Output Stage
App 20200154556 - DORF; Leonid ; et al. | 2020-05-14 |
Substrate Processing Chamber Component Assembly With Plasma Resistant Seal
App 20200152425 - FIROUZDOR; Vahid ; et al. | 2020-05-14 |
Delayed Pulsing For Plasma Processing Of Wafers
App 20200135458 - MEHROTRA; AKHIL ; et al. | 2020-04-30 |
System for coordinating pressure pulses and RF modulation in a small volume confined process reactor
Grant 10,636,625 - Dhindsa , et al. | 2020-04-28 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20200118798 - LUERE; Olivier ; et al. | 2020-04-16 |
Systems and methods for controlling a plasma edge region
Grant 10,622,190 - Marakhtanov , et al. | 2020-04-14 |
Multi zone gas injection upper electrode system
Grant 10,622,195 - Bise , et al. | 2020-04-14 |
Multi-radiofrequency impedance control for plasma uniformity tuning
Grant 10,593,516 - Marakhtanov , et al. | 2020-03-17 |
Peripheral RF feed and symmetric RF return for symmetric RF delivery
Grant 10,586,686 - Nam , et al. | 2020-03-10 |
Methods For Forming And Etching Structures For Patterning Processes
App 20200058503 - VIDYARTHI; Vinay Shankar ; et al. | 2020-02-20 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,555,412 - Dorf , et al. Fe | 2020-02-04 |
Pulsed plasma chamber in dual chamber configuration
Grant 10,553,399 - Marakhtanov , et al. Fe | 2020-02-04 |
Adjustable extended electrode for edge uniformity control
Grant 10,553,404 - Luere , et al. Fe | 2020-02-04 |
In-situ Deposition Process
App 20200027717 - PARK; Sang Wook ; et al. | 2020-01-23 |
Adjustable extended electrode for edge uniformity control
Grant 10,504,702 - Luere , et al. Dec | 2019-12-10 |
Method Of Controlling Ion Energy Distribution Using A Pulse Generator With A Current-return Output Stage
App 20190350072 - DORF; Leonid ; et al. | 2019-11-14 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,448,494 - Dorf , et al. Oc | 2019-10-15 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage
Grant 10,448,495 - Dorf , et al. Oc | 2019-10-15 |
Creating Ion Energy Distribution Functions (iedf)
App 20190259562 - DORF; LEONID ; et al. | 2019-08-22 |
Processing With Powered Edge Ring
App 20190228952 - DORF; Leonid ; et al. | 2019-07-25 |
Methods for processing substrates using small plasma chambers
Grant 10,332,727 - Gottscho , et al. | 2019-06-25 |
Creating ion energy distribution functions (IEDF)
Grant 10,312,048 - Dorf , et al. | 2019-06-04 |
Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system
Grant 10,276,348 - Marakhtanov , et al. | 2019-04-30 |
Control of impedance of RF return path
Grant 10,249,476 - Marakhtanov , et al. | 2019-04-02 |
Negative ion control for dielectric etch
Grant 10,181,412 - Marakhtanov , et al. Ja | 2019-01-15 |
Apparatus for changing area ratio in a plasma processing system
Grant 10,161,042 - Dhindsa Dec | 2018-12-25 |
Control of impedance of RF delivery path
Grant 10,157,730 - Marakhtanov , et al. Dec | 2018-12-18 |
Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same
Grant 10,147,618 - Dhindsa De | 2018-12-04 |
Erosion Resistant Atomic Layer Deposition Coatings
App 20180337026 - Firouzdor; Vahid ; et al. | 2018-11-22 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20180315583 - LUERE; Olivier ; et al. | 2018-11-01 |
Adjustable extended electrode for edge uniformity control
Grant 10,103,010 - Luere , et al. October 16, 2 | 2018-10-16 |
Plasma Resistant Coating Of Porous Body By Atomic Layer Deposition
App 20180265973 - Firouzdor; Vahid ; et al. | 2018-09-20 |
Plasma Resistant Coating Of Porous Body By Atomic Layer Deposition
App 20180265972 - Firouzdor; Vahid ; et al. | 2018-09-20 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20180233334 - LUERE; Olivier ; et al. | 2018-08-16 |
Adjustable Extended Electrode For Edge Uniformity Control
App 20180218933 - LUERE; Olivier ; et al. | 2018-08-02 |
Remote plasma and electron beam generation system for a plasma reactor
Grant 10,032,604 - Dhindsa July 24, 2 | 2018-07-24 |
Creating Ion Energy Distribution Functions (iedf)
App 20180166249 - DORF; Leonid ; et al. | 2018-06-14 |
Multi-radiofrequency Impedance Control For Plasma Uniformity Tuning
App 20180166256 - Marakhtanov; Alexei ; et al. | 2018-06-14 |
Methods for Processing Substrates Using Small Plasma Chambers
App 20180144906 - Gottscho; Richard ; et al. | 2018-05-24 |
Endpoint Gas Line Filter For Substrate Processing Equipment
App 20180122655 - FIROUZDOR; Vahid ; et al. | 2018-05-03 |
Adjustable extended electrode for edge uniformity control
Grant 9,947,517 - Luere , et al. April 17, 2 | 2018-04-17 |
Methods for preventing plasma un-confinement events in a plasma processing chamber
Grant 9,928,995 - Fischer , et al. March 27, 2 | 2018-03-27 |
Small plasma chamber systems and methods
Grant 9,911,578 - Gottscho , et al. March 6, 2 | 2018-03-06 |
Plasma Screen For Plasma Processing Chamber
App 20180061618 - NICHOLS; Michael Thomas ; et al. | 2018-03-01 |
Showerhead electrode assemblies for plasma processing apparatuses
Grant 9,899,228 - Stevenson , et al. February 20, 2 | 2018-02-20 |
Multi-radiofrequency impedance control for plasma uniformity tuning
Grant 9,881,772 - Marakhatanov , et al. January 30, 2 | 2018-01-30 |
Substrate Processing Chamber Component Assembly With Plasma Resistant Seal
App 20180019104 - FIROUZDOR; Vahid ; et al. | 2018-01-18 |
Ion To Neutral Control For Wafer Processing With Dual Plasma Source Reactor
App 20180005852 - Dhindsa; Rajinder ; et al. | 2018-01-04 |
Systems And Methods For Controlling A Voltage Waveform At A Substrate During Plasma Processing
App 20170358431 - DORF; LEONID ; et al. | 2017-12-14 |
Confinement Ring for Use in a Plasma Processing System
App 20170330735 - Dhindsa; Rajinder ; et al. | 2017-11-16 |
Ion to neutral control for wafer processing with dual plasma source reactor
Grant 9,793,126 - Dhindsa , et al. October 17, 2 | 2017-10-17 |
Plasma processing chamber with dual axial gas injection and exhaust
Grant 9,793,128 - Dhindsa , et al. October 17, 2 | 2017-10-17 |
Radio frequency (RF) ground return arrangements
Grant 9,779,916 - Dhindsa , et al. October 3, 2 | 2017-10-03 |
Composite edge ring
Grant D797,691 - Joubert , et al. September 19, 2 | 2017-09-19 |
Universal Process Kit
App 20170256435 - JOUBERT; Olivier ; et al. | 2017-09-07 |
Ion To Neutral Control For Wafer Processing With Dual Plasma Source Reactor
App 20170213747 - Dhindsa; Rajinder ; et al. | 2017-07-27 |
Wafer Edge Ring Lifting Solution
App 20170213758 - RICE; Michael R. ; et al. | 2017-07-27 |
Multifrequency Capacitively Coupled Plasma Etch Chamber
App 20170213734 - Marakhtanov; Alexei ; et al. | 2017-07-27 |
Remote Plasma And Electron Beam Generation System For A Plasma Reactor
App 20170092467 - DHINDSA; Rajinder | 2017-03-30 |
Method and apparatus for DC voltage control on RF-powered electrode
Grant 9,536,711 - Dhindsa , et al. January 3, 2 | 2017-01-03 |
Atomic layer etch process using an electron beam
Grant 9,520,294 - Agarwal , et al. December 13, 2 | 2016-12-13 |
Plasma-enhanced Etching In An Augmented Plasma Processing System
App 20160358784 - Hudson; Eric A. ; et al. | 2016-12-08 |
Plasma processing chamber with flexible symmetric RF return strap
Grant 9,508,530 - Dhindsa , et al. November 29, 2 | 2016-11-29 |
Control Of Impedance Of Rf Delivery Path
App 20160307738 - Marakhtanov; Alexei ; et al. | 2016-10-20 |
Systems And Methods For Controlling A Plasma Edge Region
App 20160307737 - Marakhtanov; Alexei ; et al. | 2016-10-20 |
Plasma processing system including a symmetrical remote plasma source for minimal ion energy
Grant 9,449,796 - Agarwal , et al. September 20, 2 | 2016-09-20 |
Plasma-enhanced etching in an augmented plasma processing system
Grant 9,418,859 - Hudson , et al. August 16, 2 | 2016-08-16 |
Control of Impedance of RF Return Path
App 20160233058 - Marakhtanov; Alexei ; et al. | 2016-08-11 |
Control of impedance of RF delivery path
Grant 9,401,264 - Marakhtanov , et al. July 26, 2 | 2016-07-26 |
Heat transfer plate for a showerhead electrode assembly of a capacitively coupled plasma processing apparatus
Grant 9,396,910 - Nam , et al. July 19, 2 | 2016-07-19 |
Systems and methods for controlling a plasma edge region
Grant 9,396,908 - Marakhtanov , et al. July 19, 2 | 2016-07-19 |
System, Method and Apparatus for Generating Pressure Pulses in Small Volume Confined Process Reactor
App 20160204007 - Dhindsa; Rajinder ; et al. | 2016-07-14 |
Methods And Apparatus For A Hybrid Capacitively-coupled And An Inductively-coupled Plasma Processing System
App 20160155615 - MARAKHTANOV; Alexei ; et al. | 2016-06-02 |
Pulsed Plasma Chamber In Dual Chamber Configuration
App 20160148786 - Marakhtanov; Alexei ; et al. | 2016-05-26 |
Control of impedance of RF return path
Grant 9,337,000 - Marakhtanov , et al. May 10, 2 | 2016-05-10 |
Methods for Controlling Plasma Constituent Flux and Deposition During Semiconductor Fabrication and Apparatus for Implementing the Same
App 20160126115 - Dhindsa; Rajinder | 2016-05-05 |
System, method and apparatus for generating pressure pulses in small volume confined process reactor
Grant 9,330,927 - Dhindsa , et al. May 3, 2 | 2016-05-03 |
Plasma Processing System Including A Symmetrical Remote Plasma Source For Minimal Ion Energy
App 20160118223 - Agarwal; Ankur ; et al. | 2016-04-28 |
Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control
App 20160079039 - Dhindsa; Rajinder ; et al. | 2016-03-17 |
Heat Transfer Plate For A Showerhead Electrode Assembly Of A Capacitively Coupled Plasma Processing Apparatus
App 20160079041 - NAM; Sang Ki ; et al. | 2016-03-17 |
Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system
Grant 9,287,096 - Marakhtanov , et al. March 15, 2 | 2016-03-15 |
Atomic Layer Etch Process Using An Electron Beam
App 20160064244 - Agarwal; Ankur ; et al. | 2016-03-03 |
Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same
Grant 9,267,208 - Dhindsa February 23, 2 | 2016-02-23 |
Movable Ground Ring For Movable Substrate Support Assembly Of A Plasma Processing Chamber
App 20160050781 - Kellogg; Michael C. ; et al. | 2016-02-18 |
Dual zone temperature control of upper electrodes
Grant 9,263,240 - Marakhtanov , et al. February 16, 2 | 2016-02-16 |
System for Coordinating Pressure Pulses and RF Modulation in a Small Volume Confined Process Reactor
App 20160042921 - Dhindsa; Rajinder ; et al. | 2016-02-11 |
Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate
Grant 9,251,999 - Dhindsa , et al. February 2, 2 | 2016-02-02 |
Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system
Grant 9,245,720 - Marakhtanov , et al. January 26, 2 | 2016-01-26 |
Showerhead electrode assembly in a capacitively coupled plasma processing apparatus
Grant 9,245,718 - Nam , et al. January 26, 2 | 2016-01-26 |
Methods and apparatus for correcting for non-uniformity in a plasma processing system
Grant 9,230,779 - Nam , et al. January 5, 2 | 2016-01-05 |
System and method for heating plasma exposed surfaces
Grant 9,224,583 - Povolny , et al. December 29, 2 | 2015-12-29 |
Method to increase mask selectivity in ultra-high aspect ratio etches
Grant 9,224,618 - Indrakanti , et al. December 29, 2 | 2015-12-29 |
Negative Ion Control For Dielectric Etch
App 20150357209 - Marakhtanov; Alexei ; et al. | 2015-12-10 |
Unitized Confinement Ring Arrangements And Methods Thereof
App 20150325414 - Dhindsa; Rajinder ; et al. | 2015-11-12 |
Apparatus and methods for edge ring implementation for substrate processing
Grant 9,184,074 - Dhindsa , et al. November 10, 2 | 2015-11-10 |
System, method and apparatus for coordinating pressure pulses and RF modulation in a small volume confined process reactor
Grant 9,184,029 - Dhindsa , et al. November 10, 2 | 2015-11-10 |
Dual plasma volume processing apparatus for neutral/ion flux control
Grant 9,184,028 - Dhindsa , et al. November 10, 2 | 2015-11-10 |
Consumable isolation ring for movable substrate support assembly of a plasma processing chamber
Grant 9,171,702 - Kellogg , et al. October 27, 2 | 2015-10-27 |
Tunable Rf Feed Structure For Plasma Processing
App 20150243483 - Chen; Zhigang ; et al. | 2015-08-27 |
Negative ion control for dielectric etch
Grant 9,117,767 - Marakhatanov , et al. August 25, 2 | 2015-08-25 |
Gas feed insert in a plasma processing chamber and methods therefor
Grant 9,111,731 - de la Llera , et al. August 18, 2 | 2015-08-18 |
Small plasma chamber systems and methods
Grant 9,111,729 - Gottscho , et al. August 18, 2 | 2015-08-18 |
Apparatus and method for controlling plasma potential
Grant 9,111,724 - Keil , et al. August 18, 2 | 2015-08-18 |
Showerhead electrode assembly with gas flow modification for extended electrode life
Grant 9,093,483 - Augustino , et al. July 28, 2 | 2015-07-28 |
Plasma-enhanced Etching In An Augmented Plasma Processing System
App 20150206775 - Hudson; Eric A. ; et al. | 2015-07-23 |
Showerhead Electrode Assembly In A Capacitively Coupled Plasma Processing Apparatus
App 20150194291 - Nam; Sang Ki ; et al. | 2015-07-09 |
Method of processing a semiconductor substrate in a plasma processing apparatus
Grant 9,064,909 - Dhindsa June 23, 2 | 2015-06-23 |
Plasma-enhanced etching in an augmented plasma processing system
Grant 9,039,911 - Hudson , et al. May 26, 2 | 2015-05-26 |
Showerhead electrode assembly in a capacitively coupled plasma processing apparatus
Grant 9,018,022 - Nam , et al. April 28, 2 | 2015-04-28 |
Control of Impedance of RF Delivery Path
App 20150091441 - Marakhtanov; Alexei ; et al. | 2015-04-02 |
Control of Impedance of RF Return Path
App 20150091440 - Marakhtanov; Alexei ; et al. | 2015-04-02 |
Ion To Neutral Control For Wafer Processing With Dual Plasma Source Reactor
App 20150083582 - Dhindsa; Rajinder ; et al. | 2015-03-26 |
Pressure controlled heat pipe temperature control plate
Grant 8,975,817 - Kellogg , et al. March 10, 2 | 2015-03-10 |
System, Method and Apparatus for Generating Pressure Pulses in Small Volume Confined Process Reactor
App 20150064920 - Dhindsa; Rajinder ; et al. | 2015-03-05 |
System, Method and Apparatus for Coordinating Pressure Pulses and RF Modulation in a Small Volume Confined Process Reactor
App 20150060404 - Dhindsa; Rajinder ; et al. | 2015-03-05 |
Methods for Selectively Modifying RF Current Paths in a Plasma Processing System
App 20150053644 - Nam; Sang Ki ; et al. | 2015-02-26 |
Plasma Processing Chamber with Dual Axial Gas Injection and Exhaust
App 20150004793 - Dhindsa; Rajinder ; et al. | 2015-01-01 |
Integrated capacitive and inductive power sources for a plasma etching chamber
Grant 8,911,590 - Dhindsa , et al. December 16, 2 | 2014-12-16 |
Plasma-enhanced substrate processing method and apparatus
Grant 8,911,637 - Dhindsa , et al. December 16, 2 | 2014-12-16 |
Methods and apparatus for selectively modifying RF current paths in a plasma processing system
Grant 8,911,588 - Nam , et al. December 16, 2 | 2014-12-16 |
Plasma processing chamber having electrodes for cleaning chamber
Grant 8,906,197 - Dhindsa December 9, 2 | 2014-12-09 |
Chuck assembly for plasma processing
Grant 8,898,889 - Nam , et al. December 2, 2 | 2014-12-02 |
Local plasma confinement and pressure control arrangement and methods thereof
Grant 8,900,398 - Dhindsa , et al. December 2, 2 | 2014-12-02 |
Plasma unconfinement sensor and methods thereof
Grant 8,894,804 - Booth , et al. November 25, 2 | 2014-11-25 |
Plasma processing chamber with dual axial gas injection and exhaust
Grant 8,869,742 - Dhindsa , et al. October 28, 2 | 2014-10-28 |
System, method and apparatus for detecting DC bias in a plasma processing chamber
Grant 8,872,525 - Marakhtanov , et al. October 28, 2 | 2014-10-28 |
Cold Spray Barrier Coated Component Of A Plasma Processing Chamber And Method Of Manufacture Thereof
App 20140315392 - Xu; Lin ; et al. | 2014-10-23 |
Movable grounding arrangements in a plasma processing chamber and methods therefor
Grant 8,847,495 - de la Llera , et al. September 30, 2 | 2014-09-30 |
Apparatus including showerhead electrode and heater for plasma processing
Grant 8,846,539 - Dhindsa , et al. September 30, 2 | 2014-09-30 |
System and Method for Heating Plasma Exposed Surfaces
App 20140263177 - Povolny; Henry ; et al. | 2014-09-18 |
C-shaped confinement ring for a plasma processing chamber
Grant 8,826,855 - Kellogg , et al. September 9, 2 | 2014-09-09 |
Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
Grant 8,822,345 - Dhindsa , et al. September 2, 2 | 2014-09-02 |
Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
Grant 8,784,948 - Dhindsa , et al. July 22, 2 | 2014-07-22 |
Showerhead Electrode Assembly With Gas Flow Modification For Extended Electrode Life
App 20140187049 - Augustino; Jason ; et al. | 2014-07-03 |
Small Plasma Chamber Systems and Methods
App 20140151333 - Gottscho; Richard ; et al. | 2014-06-05 |
Showerhead Electrode Assemblies For Plasma Processing Apparatuses
App 20140154888 - Stevenson; Tom ; et al. | 2014-06-05 |
Palladium Plated Aluminum Component Of A Plasma Processing Chamber And Method Of Manufacture Thereof
App 20140127911 - Shih; Hong ; et al. | 2014-05-08 |
Upper electrode backing member with particle reducing features
Grant 8,709,202 - De La Llera , et al. April 29, 2 | 2014-04-29 |
Tungsten Carbide Coated Metal Component Of A Plasma Reactor Chamber And Method Of Coating
App 20140113453 - Shih; Hong ; et al. | 2014-04-24 |
Showerhead electrode assembly with gas flow modification for extended electrode life
Grant 8,702,866 - Augustino , et al. April 22, 2 | 2014-04-22 |
Pressure Controlled Heat Pipe Temperature Control Plate
App 20140103806 - Kellogg; Michael C. ; et al. | 2014-04-17 |
Showerhead Electrode Assembly In A Capacitively Coupled Plasma Processing Apparatus
App 20140087488 - Nam; Sang Ki ; et al. | 2014-03-27 |
Showerhead electrode assemblies for plasma processing apparatuses
Grant 8,679,288 - Stevenson , et al. March 25, 2 | 2014-03-25 |
Gas distribution system having fast gas switching capabilities
Grant 8,673,785 - Huang , et al. March 18, 2 | 2014-03-18 |
Rf Ground Return In Plasma Processing Systems And Methods Therefor
App 20140060739 - Dhindsa; Rajinder ; et al. | 2014-03-06 |
Protective Coating For A Plasma Processing Chamber Part And A Method Of Use
App 20140065835 - Kadkhodayan; Bobby ; et al. | 2014-03-06 |
Plasma-enhanced Etching In An Augmented Plasma Processing System.
App 20140054269 - Hudson; Eric A. ; et al. | 2014-02-27 |
Triode reactor design with multiple radiofrequency powers
Grant 8,652,298 - Dhindsa , et al. February 18, 2 | 2014-02-18 |
Apparatus For Plasma Processing System With Tunable Capacitance
App 20140034243 - Dhindsa; Rajinder ; et al. | 2014-02-06 |
Methods for Controlling Plasma Constituent Flux and Deposition During Semiconductor Fabrication and Apparatus for Implementing the Same
App 20140034609 - Dhindsa; Rajinder | 2014-02-06 |
Cam lock electrode clamp
Grant 8,628,268 - Kellogg , et al. January 14, 2 | 2014-01-14 |
Methods And Apparatus For Detecting Azimuthal Non-uniformity In A Plasma Processing System
App 20130327481 - Marakhtanov; Alexei ; et al. | 2013-12-12 |
Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same
Grant 8,591,755 - Dhindsa November 26, 2 | 2013-11-26 |
Showerhead electrode
Grant 8,573,152 - de la Llera , et al. November 5, 2 | 2013-11-05 |
Composite Showerhead Electrode Assembly For A Plasma Processing Apparatus
App 20130280914 - Dhindsa; Rajinder | 2013-10-24 |
Methods and arrangements for plasma processing system with tunable capacitance
Grant 8,563,619 - Dhindsa , et al. October 22, 2 | 2013-10-22 |
Multi-radiofrequency Impedance Control For Plasma Uniformity Tuning
App 20130260567 - Marakhtanov; Alexei ; et al. | 2013-10-03 |
Methods And Apparatus For Selectively Modifying Rf Current Paths In A Plasma Processing System
App 20130240482 - Nam; Sang Ki ; et al. | 2013-09-19 |
Methods And Apparatus For Selectively Modulating Azimuthal Non-uniformity In A Plasma Processing System
App 20130240147 - Nam; Sang Ki ; et al. | 2013-09-19 |
Methods And Apparatus For Correcting For Non-uniformity In A Plasma Processing System
App 20130240145 - Nam; Sang Ki ; et al. | 2013-09-19 |
Protective coating for a plasma processing chamber part and a method of use
Grant 8,522,716 - Kadkhodayan , et al. September 3, 2 | 2013-09-03 |
Hybrid Plasma Processing Systems
App 20130220975 - Dhindsa; Rajinder | 2013-08-29 |
Arrangements For Controlling Plasma Processing Parameters
App 20130206337 - Dhindsa; Rajinder ; et al. | 2013-08-15 |
Plasma confinement rings having reduced polymer deposition characteristics
Grant 8,500,952 - Dhindsa , et al. August 6, 2 | 2013-08-06 |
Etch With Increased Mask Selectivity
App 20130180951 - INDRAKANTI; Ananth ; et al. | 2013-07-18 |
Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus
Grant 8,484,846 - Dhindsa July 16, 2 | 2013-07-16 |
Movable ground ring for a plasma processing chamber
Grant 8,485,128 - Kellogg , et al. July 16, 2 | 2013-07-16 |
Plasma Processing Devices With Corrosion Resistant Components
App 20130160948 - Shih; Hong ; et al. | 2013-06-27 |
Wiggling control for pseudo-hardmask
Grant 8,470,126 - Sheu , et al. June 25, 2 | 2013-06-25 |
Plasma Processing Chamber With Flexible Symmetric RF Return Strap
App 20130133834 - Dhindsa; Rajinder | 2013-05-30 |
Gas Feed Insert In A Plasma Processing Chamber And Methods Therefor
App 20130134138 - de la Llera; Anthony ; et al. | 2013-05-30 |
Movable Grounding Arrangements In A Plasma Processing Chamber And Methods Therefor
App 20130134876 - de la Llera; Anthony ; et al. | 2013-05-30 |
Temperature controlled hot edge ring assembly
Grant 8,449,679 - Dhindsa May 28, 2 | 2013-05-28 |
Method and apparatus for inducing DC voltage on wafer-facing electrode
Grant 8,450,635 - Dhindsa , et al. May 28, 2 | 2013-05-28 |
Dual Zone Temperature Control Of Upper Electrodes
App 20130126476 - Marakhtanov; Alexei ; et al. | 2013-05-23 |
Peripheral Rf Feed And Symmetric Rf Return With Rf Strap Input
App 20130127124 - Nam; Sang Ki ; et al. | 2013-05-23 |
System, Method And Apparatus For Detecting Dc Bias In A Plasma Processing Chamber
App 20130127476 - Marakhtanov; Alexei ; et al. | 2013-05-23 |
Peripheral RF Feed and Symmetric RF Return for Symmetric RF Delivery
App 20130128409 - Nam; Sang Ki ; et al. | 2013-05-23 |
Triode Reactor Design With Multiple Radiofrequency Powers
App 20130126475 - Dhindsa; Rajinder ; et al. | 2013-05-23 |
Systems And Methods For Controlling A Plasma Edge Region
App 20130126513 - Marakhtanov; Alexei ; et al. | 2013-05-23 |
Temperature Control Modules For Showerhead Electrode Assemblies For Plasma Processing Apparatuses
App 20130126518 - Dhindsa; Rajinder | 2013-05-23 |
Multi Zone Gas Injection Upper Electrode System
App 20130126486 - Bise; Ryan ; et al. | 2013-05-23 |
Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses
Grant 8,443,756 - Fischer , et al. May 21, 2 | 2013-05-21 |
System, Method And Apparatus For Plasma Sheath Voltage Control
App 20130122711 - Marakhtanov; Alexei ; et al. | 2013-05-16 |
Apparatus for Changing Area Ratio In A Plasma Processing System
App 20130062321 - Dhindsa; Rajinder | 2013-03-14 |
Apparatus Including Gas Distribution Member Supplying Process Gas And Radio Frequency (rf) Power For Plasma Processing
App 20130065396 - Dhindsa; Rajinder ; et al. | 2013-03-14 |
Pulsed Plasma Chamber in Dual Chamber Configuration
App 20130059448 - Marakhtanov; Alexei ; et al. | 2013-03-07 |
Wiggling Control For Pseudo-hardmask
App 20130020026 - Sheu; Ben-Li ; et al. | 2013-01-24 |
Negative Ion Control for Dielectric Etch
App 20130023064 - Marakhtanov; Alexei ; et al. | 2013-01-24 |
Fast gas switching plasma processing apparatus
Grant 8,343,876 - Sadjadi , et al. January 1, 2 | 2013-01-01 |
Methods and apparatus for changing area ratio in a plasma processing system
Grant 8,342,122 - Dhindsa January 1, 2 | 2013-01-01 |
Plasma Confinement Rings Having Reduced Polymer Deposition Characteristics
App 20120325407 - Dhindsa; Rajinder ; et al. | 2012-12-27 |
Methods for plasma cleaning an internal peripheral region of a plasma processing chamber
Grant 8,337,623 - Dhindsa December 25, 2 | 2012-12-25 |
Plasma-enhanced Substrate Processing Method And Apparatus
App 20120312780 - Dhindsa; Rajinder ; et al. | 2012-12-13 |
Apparatus For Processing A Substrate Using Plasma
App 20120312475 - Dhindsa; Rajinder ; et al. | 2012-12-13 |
Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
Grant 8,317,968 - Dhindsa , et al. November 27, 2 | 2012-11-27 |
Temperature control modules for showerhead electrode assemblies for plasma processing apparatuses
Grant 8,313,610 - Dhindsa November 20, 2 | 2012-11-20 |
Clamped showerhead electrode assembly
Grant 8,313,805 - Kadkhodayan , et al. November 20, 2 | 2012-11-20 |
Plasma Processing Chamber Having Electrodes for Cleaning Chamber
App 20120279659 - Dhindsa; Rajinder | 2012-11-08 |
Wiggling control for pseudo-hardmask
Grant 8,304,262 - Sheu , et al. November 6, 2 | 2012-11-06 |
Apparatus and method for controlling plasma density profile
Grant 8,299,390 - Dhindsa , et al. October 30, 2 | 2012-10-30 |
Methods and apparatus for wafer area pressure control in an adjustable gap plasma chamber
Grant 8,290,717 - Dhindsa , et al. October 16, 2 | 2012-10-16 |
Plasma confinement rings having reduced polymer deposition characteristics
Grant 8,262,922 - Dhindsa , et al. September 11, 2 | 2012-09-11 |
Plasma-enhanced substrate processing method and apparatus
Grant 8,262,847 - Dhindsa , et al. September 11, 2 | 2012-09-11 |
Wiggling Control For Pseudo-hardmask
App 20120214310 - Sheu; Ben-Li ; et al. | 2012-08-23 |
Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
Grant 8,222,157 - Marakhtanov , et al. July 17, 2 | 2012-07-17 |
Cam-locked Showerhead Electrode And Assembly
App 20120175062 - de la Llera; Anthony ; et al. | 2012-07-12 |
Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body
Grant 8,216,486 - Dhindsa , et al. July 10, 2 | 2012-07-10 |
Composite Showerhead Electrode Assembly For A Plasma Processing Apparatus
App 20120171871 - Dhindsa; Rajinder | 2012-07-05 |
Clamped Showerhead Electrode Assembly
App 20120171872 - Kadkhodayan; Babak ; et al. | 2012-07-05 |
Methods and arrangements for controlling plasma processing parameters
Grant 8,211,324 - Dhindsa , et al. July 3, 2 | 2012-07-03 |
Showerhead electrode
Grant 8,206,506 - Kadkhodayan , et al. June 26, 2 | 2012-06-26 |
Clamped showerhead electrode assembly
Grant 8,161,906 - Kadkhodayan , et al. April 24, 2 | 2012-04-24 |
Composite showerhead electrode assembly for a plasma processing apparatus
Grant 8,147,648 - Dhindsa April 3, 2 | 2012-04-03 |
Temperature Control Module Using Gas Pressure To Control Thermal Conductance Between Liquid Coolant And Component Body
App 20120070914 - Dhindsa; Rajinder ; et al. | 2012-03-22 |
Methods for Controlling Plasma Constituent Flux and Deposition During Semiconductor Fabrication and Apparatus for Implementing the Same
App 20120061350 - Dhindsa; Rajinder | 2012-03-15 |
Showerhead Electrode
App 20120055632 - de la Llera; Anthony ; et al. | 2012-03-08 |
Showerhead Electrodes And Showerhead Electrode Assemblies Having Low-particle Performance For Semiconductor Material Processing Apparatuses
App 20120045902 - Fischer; Andreas ; et al. | 2012-02-23 |
Plasma Processing Chamber with Dual Axial Gas Injection and Exhaust
App 20120034786 - Dhindsa; Rajinder ; et al. | 2012-02-09 |
Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control
App 20120031559 - Dhindsa; Rajinder ; et al. | 2012-02-09 |
Methods And Apparatuses For Controlling Gas Flow Conductance In A Capacitively-coupled Plasma Processing Chamber
App 20120028379 - Dhindsa; Rajinder ; et al. | 2012-02-02 |
Process tuning gas injection from the substrate edge
Grant 8,097,120 - Dhindsa , et al. January 17, 2 | 2012-01-17 |
C-shaped Confinement Ring For A Plasma Processing Chamber
App 20120000608 - Kellogg; Michael C. ; et al. | 2012-01-05 |
Consumable Isolation Ring For Movable Substrate Support Assembly Of A Plasma Processing Chamber
App 20120000605 - Kellogg; Michael C. ; et al. | 2012-01-05 |
Movable Ground Ring For A Plasma Processing Chamber
App 20120003836 - Kellogg; Michael C. ; et al. | 2012-01-05 |
Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body
Grant 8,083,855 - Dhindsa , et al. December 27, 2 | 2011-12-27 |
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
Grant 8,080,760 - Dhindsa , et al. December 20, 2 | 2011-12-20 |
Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses
Grant 8,069,817 - Fischer , et al. December 6, 2 | 2011-12-06 |
Fast Gas Switching Plasma Processing Apparatus
App 20110281435 - Sadjadi; S. M. Reza ; et al. | 2011-11-17 |
Methods for Plasma Cleaning an Internal Peripheral Region of a Plasma Processing Chamber
App 20110277784 - Dhindsa; Rajinder | 2011-11-17 |
Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
Grant 8,043,430 - Dhindsa , et al. October 25, 2 | 2011-10-25 |
Plasma processing reactor with multiple capacitive and inductive power sources
Grant 8,012,306 - Dhindsa September 6, 2 | 2011-09-06 |
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same
Grant 8,000,082 - Dhindsa , et al. August 16, 2 | 2011-08-16 |
Small Plasma Chamber Systems And Methods
App 20110132874 - Gottscho; Richard ; et al. | 2011-06-09 |
Electrostatic Chuck With An Angled Sidewall
App 20110126852 - Dhindsa; Rajinder ; et al. | 2011-06-02 |
Plasma Unconfinement Sensor And Methods Thereof
App 20110128017 - Booth; Jean-Paul ; et al. | 2011-06-02 |
Local Plasma Confinement And Pressure Control Arrangement And Methods Thereof
App 20110108524 - Dhindsa; Rajinder ; et al. | 2011-05-12 |
Radio Frequency (rf) Ground Return Arrangements
App 20110100552 - Dhindsa; Rajinder ; et al. | 2011-05-05 |
Multi-peripheral Ring Arrangement For Performing Plasma Confinement
App 20110100553 - Dhindsa; Rajinder ; et al. | 2011-05-05 |
Upper Electrode Backing Member With Particle Reducing Features
App 20110086513 - De La Llera; Anthony ; et al. | 2011-04-14 |
Unitized Confinement Ring Arrangements And Methods Thereof
App 20110073257 - Dhindsa; Rajinder ; et al. | 2011-03-31 |
Apparatus And Methods For Edge Ring Implementation For Substrate Processing
App 20110070743 - Dhindsa; Rajinder ; et al. | 2011-03-24 |
Hybrid Rf Capacitively And Inductively Coupled Plasma Source Using Multifrequency Rf Powers And Methods Of Use Thereof
App 20110059615 - Marakhtanov; Alexei ; et al. | 2011-03-10 |
Cam Lock Electrode Clamp
App 20110042879 - Kellogg; Michael C. ; et al. | 2011-02-24 |
Light-up Prevention In Electrostatic Chucks
App 20110024049 - Stevenson; Tom ; et al. | 2011-02-03 |
Apparatus and Method for Controlling Plasma Potential
App 20110024046 - Keil; Douglas ; et al. | 2011-02-03 |
Apparatus and Method for Controlling Plasma Potential
App 20110024045 - Keil; Douglas ; et al. | 2011-02-03 |
Apparatus For Adjusting An Edge Ring Potential During Substrate Processing
App 20110011534 - Dhindsa; Rajinder | 2011-01-20 |
Methods And Arrangements For Controlling Plasma Processing Parameters
App 20110011535 - Dhindsa; Rajinder ; et al. | 2011-01-20 |
Upper electrode backing member with particle reducing features
Grant 7,854,820 - De La Llera , et al. December 21, 2 | 2010-12-21 |
Magnetic enhancement for mechanical confinement of plasma
Grant 7,838,086 - Keil , et al. November 23, 2 | 2010-11-23 |
Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
Grant 7,837,826 - Marakhtanov , et al. November 23, 2 | 2010-11-23 |
Edge ring arrangements for substrate processing
Grant 7,837,827 - Dhindsa , et al. November 23, 2 | 2010-11-23 |
Multifrequency Capacitively Coupled Plasma Etch Chamber
App 20100252199 - Marakhtanov; Alexei ; et al. | 2010-10-07 |
Methods For Preventing Plasma Un-confinement Events In A Plasma Processing Chamber
App 20100251529 - Fischer; Andreas ; et al. | 2010-10-07 |
Composite showerhead electrode assembly for a plasma processing apparatus
App 20100184298 - Dhindsa; Rajinder | 2010-07-22 |
Methods and apparatus for substrate processing
Grant 7,758,764 - Dhindsa , et al. July 20, 2 | 2010-07-20 |
High aspect ratio etch using modulation of RF powers of various frequencies
Grant 7,749,353 - Rusu , et al. July 6, 2 | 2010-07-06 |
Gas Distribution System Having Fast Gas Switching Capabilities
App 20100159707 - Huang; Zhisong ; et al. | 2010-06-24 |
Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber
Grant 7,740,736 - Fischer , et al. June 22, 2 | 2010-06-22 |
Apparatus Including Showerhead Electrode And Heater For Plasma Processing
App 20100151687 - Dhindsa; Rajinder ; et al. | 2010-06-17 |
Cleaning fixtures and methods of cleaning electrode assembly plenums
Grant 7,736,441 - Outka , et al. June 15, 2 | 2010-06-15 |
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
Grant 7,732,728 - Dhindsa , et al. June 8, 2 | 2010-06-08 |
Apparatus and Method for Controlling Plasma Density Profile
App 20100126847 - Dhindsa; Rajinder ; et al. | 2010-05-27 |
Apparatuses For Adjusting Electrode Gap In Capacitively-coupled Rf Plasma Reactor
App 20100124822 - Dhindsa; Rajinder ; et al. | 2010-05-20 |
Apparatus including showerhead electrode and heater for plasma processing
Grant 7,712,434 - Dhindsa , et al. May 11, 2 | 2010-05-11 |
Gas distribution system having fast gas switching capabilities
Grant 7,708,859 - Huang , et al. May 4, 2 | 2010-05-04 |
Apparatus and method for controlling plasma density profile
Grant 7,683,289 - Dhindsa , et al. March 23, 2 | 2010-03-23 |
Temperature controlled hot edge ring assembly
App 20100040768 - Dhindsa; Rajinder | 2010-02-18 |
Clamped showerhead electrode assembly
App 20100003824 - Kadkhodayan; Babak ; et al. | 2010-01-07 |
Showerhead electrode
App 20100000683 - Kadkhodayan; Babak ; et al. | 2010-01-07 |
Showerhead electrode assemblies for plasma processing apparatuses
App 20090305509 - Stevenson; Tom ; et al. | 2009-12-10 |
Methods And Arrangements For Plasma Processing System With Tunable Capacitance
App 20090223810 - Dhindsa; Rajinder ; et al. | 2009-09-10 |
Methods And Apparatus For Wafer Area Pressure Control In An Adjustable Gap Plasma Chamber
App 20090204342 - Dhindsa; Rajinder ; et al. | 2009-08-13 |
Apparatus and methods for adjusting an edge ring potential substrate processing
Grant 7,572,737 - Dhindsa August 11, 2 | 2009-08-11 |
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same
Grant 7,525,787 - Dhindsa , et al. April 28, 2 | 2009-04-28 |
Magnetic enhancement for mechanical confinement of plasma
Grant 7,455,748 - Keil , et al. November 25, 2 | 2008-11-25 |
Plasma confinement ring assemblies having reduced polymer deposition characteristics
Grant 7,430,986 - Dhindsa , et al. October 7, 2 | 2008-10-07 |
RF ground switch for plasma processing system
Grant 7,393,432 - Dhindsa , et al. July 1, 2 | 2008-07-01 |
| 