| Patent | Date |
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Integrated etch/clean for dielectric etch applications
Grant 9,396,961 - Arghavani , et al. July 19, 2 | 2016-07-19 |
Integrated Etch/clean For Dielectric Etch Applications
App 20160181117 - Arghavani; Reza ; et al. | 2016-06-23 |
Methodology for cleaning of surface metal contamination from an upper electrode used in a plasma chamber
Grant 9,079,228 - Shih , et al. July 14, 2 | 2015-07-14 |
Etching high K dielectrics with high selectivity to oxide containing layers at elevated temperatures with BC13 based etch chemistries
Grant 8,722,547 - Mani , et al. May 13, 2 | 2014-05-13 |
Methods For High Temperature Etching A High-k Gate Structure
App 20130344701 - LIU; Wei ; et al. | 2013-12-26 |
Methodology For Cleaning Of Surface Metal Contamination From An Upper Electrode Used In A Plasma Chamber
App 20110146704 - Shih; Hong ; et al. | 2011-06-23 |
Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structures
Grant 7,771,606 - Kim , et al. August 10, 2 | 2010-08-10 |
Process for etching tungsten silicide overlying polysilicon particularly in a flash memory
Grant 7,754,610 - Lee , et al. July 13, 2 | 2010-07-13 |
Pulsed-plasma system for etching semiconductor structures
Grant 7,737,042 - Kim , et al. June 15, 2 | 2010-06-15 |
Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
Grant 7,718,538 - Kim , et al. May 18, 2 | 2010-05-18 |
Pulsed-plasma System For Etching Semiconductor Structures
App 20080206900 - KIM; TAE WON ; et al. | 2008-08-28 |
Pulsed-plasma System With Pulsed Reaction Gas Replenish For Etching Semiconductor Structures
App 20080206901 - KIM; TAE WON ; et al. | 2008-08-28 |
Pulsed-plasma System With Pulsed Sample Bias For Etching Semiconductor Substrates
App 20080197110 - Kim; Tae Won ; et al. | 2008-08-21 |
Process for etching tungsten silicide overlying polysilicon particularly in a flash memory
App 20070281477 - Lee; Kyeong-Tae ; et al. | 2007-12-06 |
Process including silo-chloro passivation for etching tungsten silicide overlying polysilicon
App 20070281479 - Lee; Kyeong-Tae ; et al. | 2007-12-06 |
ETCHING OF SiO2 WITH HIGH SELECTIVITY TO Si3N4 AND ETCHING METAL OXIDES WITH HIGH SELECTIVITY TO SiO2 AT ELEVATED TEMPERATURES WITH BCl3 BASED ETCH CHEMISTRIES
App 20070249182 - Mani; Radhika ; et al. | 2007-10-25 |
Controlled polymerization on plasma reactor wall
Grant 7,122,125 - Deshmukh , et al. October 17, 2 | 2006-10-17 |
Method and system for realtime CD microloading control
Grant 6,924,088 - Mui , et al. August 2, 2 | 2005-08-02 |
Method and apparatus for endpoint detection during an etch process
App 20050070103 - Deshmukh, Shashank C. ; et al. | 2005-03-31 |
Controlled polymerization on plasma reactor wall
App 20040084409 - Deshmukh, Shashank C. ; et al. | 2004-05-06 |
Method and system for realtime CD microloading control
App 20040038139 - Mui, David S.L. ; et al. | 2004-02-26 |
Method For Enhancing Critical Dimension Uniformity After Etch
App 20040018741 - Deshmukh, Shashank C. ; et al. | 2004-01-29 |
Method for controlling the extent of notch or undercut in an etched profile using optical reflectometry
App 20040018647 - Jones, Steven J. ; et al. | 2004-01-29 |
Methods for etching using building blocks
App 20040018739 - Abooameri, Farid ; et al. | 2004-01-29 |
Electrostatic chuck having a thermal transfer regulator pad
Grant 5,978,202 - Wadensweiler , et al. November 2, 1 | 1999-11-02 |
Apparatus for measuring pedestal temperature in a semiconductor wafer processing system
Grant 5,893,643 - Kumar , et al. April 13, 1 | 1999-04-13 |
Method for etching transistor gates using a hardmask
Grant 5,851,926 - Kumar , et al. December 22, 1 | 1998-12-22 |
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