Deopura; Manish

Patent Applications and Registrations

Patent applications and USPTO patent grants for Deopura; Manish.The latest application filed is for "customized polishing pads for cmp and methods of fabrication and use thereof".

Company Profile

1.11.14

Deopura; Manish - Sunnyvale CA
Deopura; Manish - Cambridge MA
Deopura; Manish - North Bethesda MD

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Customized polishing pads for CMP and methods of fabrication and use thereof Grant 10,220,487 - Roy , et al.	2019-03-05
Customized Polishing Pads For Cmp And Methods Of Fabrication And Use Thereof App 20160229025 - ROY; Pradip K. ; et al.	2016-08-11
Customized polishing pads for CMP and methods of fabrication and use thereof Grant 9,278,424 - Roy , et al. March 8, 2	2016-03-08
Methods For Producing In-situ Grooves In Chemical Mechanical Planarization (cmp) Pads, And Novel Cmp Pad Designs App 20150093977 - Deopura; Manish ; et al.	2015-04-02
Customized Polishing Pads For Cmp And Methods Of Fabrication And Use Thereof App 20150065020 - Roy; Pradip K. ; et al.	2015-03-05
Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs Grant 8,932,116 - Deopura , et al. January 13, 2	2015-01-13
Customized polishing pads for CMP and methods of fabrication and use thereof Grant 8,864,859 - Roy , et al. October 21, 2	2014-10-21
Customized polishing pads for CMP and methods of fabrication and use thereof Grant 8,715,035 - Roy , et al. May 6, 2	2014-05-06
Methods For Producing In-situ Grooves In Chemical Mechanical Planarization (cmp) Pads, And Novel Cmp Pad Designs App 20130059509 - Deopura; Manish ; et al.	2013-03-07
Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs Grant 8,287,793 - Deopura , et al. October 16, 2	2012-10-16
Ductile Multilayer Silicone Resin Films App 20110014482 - Zhu; Bizhong ; et al.	2011-01-20
Customized polishing pads for CMP and methods of fabrication and use thereof Grant 7,704,125 - Roy , et al. April 27, 2	2010-04-27
Customized Polishing Pads for CMP and Methods of Fabrication and Use Thereof App 20090053976 - Roy; Pradip K. ; et al.	2009-02-26
Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs App 20080211141 - Deopura; Manish ; et al.	2008-09-04
Customized polishing pads for CMP and methods of fabrication and use thereof App 20080207100 - Roy; Pradip K. ; et al.	2008-08-28
Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs Grant 7,377,840 - Deopura , et al. May 27, 2	2008-05-27
Customized polishing pads for CMP and methods of fabrication and use thereof App 20060276109 - Roy; Pradip K. ; et al.	2006-12-07
Customized polishing pads for CMP and methods of fabrication and use thereof App 20060189269 - Roy; Pradip K. ; et al.	2006-08-24
Methods for producing in-situ grooves in Chemical Mechanical Planarization (CMP) pads, and novel CMP pad designs App 20060019587 - Deopura; Manish ; et al.	2006-01-26

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