Demand; Marc

Patent Applications and Registrations

Patent applications and USPTO patent grants for Demand; Marc.The latest application filed is for "use of f-based gate etch to passivate the high-k/metal gate stack for deep submicron transistor technologies".

Company Profile

0.4.5

Demand; Marc - Saint-Jean-Geest BE
Demand; Marc - Jandrain-Jandrenouille BE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Use of F-based gate etch to passivate the high-k/metal gate stack for deep submicron transistor technologies Grant 8,319,295 - Collaert , et al. November 27, 2	2012-11-27
Plasma composition for selective high-k etch Grant 7,598,184 - Shamiryan , et al. October 6, 2	2009-10-06
Selective removal of rare earth based high-k materials in a semiconductor device Grant 7,521,369 - Shamiryan , et al. April 21, 2	2009-04-21
Use Of F-based Gate Etch To Passivate The High-k/metal Gate Stack For Deep Submicron Transistor Technologies App 20080164539 - Collaert; Nadine ; et al.	2008-07-10
Patterning of doped poly-silicon gates Grant 7,390,708 - Demand , et al. June 24, 2	2008-06-24
Patterning Of Doped Poly-silicon Gates App 20080096372 - Demand; Marc ; et al.	2008-04-24
Selective Removal Of Rare Earth Based High-k Materials In A Semiconductor Device App 20080096374 - Shamiryan; Denis ; et al.	2008-04-24
Plasma composition for selective high-k etch App 20070099403 - Shamiryan; Denis ; et al.	2007-05-03
Plasma for patterning advanced gate stacks App 20070099428 - Shamiryan; Denis ; et al.	2007-05-03

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