DellaGuardia; Ronald A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for DellaGuardia; Ronald A..The latest application filed is for "providing gaps in capping layer to reduce tensile stress for beol fabrication of integrated circuits".

Company Profile

0.7.4

DellaGuardia; Ronald A. - Poughkeepsie NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method to remove beol sacrificial materials and chemical residues by irradiation Grant 7,598,169 - Lin , et al. October 6, 2	2009-10-06
Providing Gaps In Capping Layer To Reduce Tensile Stress For Beol Fabrication Of Integrated Circuits App 20080315347 - Bonilla; Griselda ; et al.	2008-12-25
Method To Remove Beol Sacrificial Materials And Chemical Residues By Irradiation App 20080200034 - Lin; Qinghuang ; et al.	2008-08-21
Reducing damage to ulk dielectric during cross-linked polymer removal Grant 7,253,100 - DellaGuardia , et al. August 7, 2	2007-08-07
Integrated Lithography And Etch For Dual Damascene Structures App 20070166648 - Ponoth; Shom ; et al.	2007-07-19
Reducing Damage To Ulk Dielectric During Cross-linked Polymer Removal App 20070111466 - DellaGuardia; Ronald A. ; et al.	2007-05-17
Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups Grant 6,303,263 - Chen , et al. October 16, 2	2001-10-16
Approach to formulating irradiation sensitive positive resists Grant 6,103,447 - Chen , et al. August 15, 2	2000-08-15
Copolymers and photoresist compositions comprising copolymer resin binder component Grant 6,042,997 - Barclay , et al. March 28, 2	2000-03-28
Copolymers and photoresist compositions comprising copolymer resin binder component Grant 5,861,231 - Barclay , et al. January 19, 1	1999-01-19
Resist development endpoint detection for X-ray lithography Grant 5,264,328 - DellaGuardia , et al. November 23, 1	1993-11-23

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