Delaney; William F.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Delaney; William F..The latest application filed is for "fabricating optical elements using a photoresist formed from proximity printing of a gray level mask".
- Delaney; William F. - Charlotte NC
- Delaney; William F. - Millville MA
| Patent | Date |
|---|---|
| Fabricating optical elements using a photoresist formed using of a gray level mask Grant 6,638,667 - Suleski , et al. October 28, 2 | 2003-10-28 |
| Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask App 20020146627 - Suleski, Thomas J. ; et al. | 2002-10-10 |
| Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask Grant 6,420,073 - Suleski , et al. July 16, 2 | 2002-07-16 |
| Fabricating optical elements using a photoresist formed from contact printing of a gray level mask Grant 6,071,652 - Feldman , et al. June 6, 2 | 2000-06-06 |
| Device and method for the alignment of masks Grant 5,160,959 - Everett , et al. November 3, 1 | 1992-11-03 |
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